公开(公告)号：US10527952B2

公开(公告)日：2020-01-07

申请号：US15576602

申请日：2017-10-24

Applicant: KLA-Tencor Corporation

Inventor： Tzahi Grunzweig ,  Jordan Pio ,  Alexander Svizher

IPC: G03F7/20 ,  H01L23/544 ,  H01L21/66

Abstract: Scatterometry overlay targets and measurement methods are provided, which are configured to detect and eliminate process-related errors and illumination-related errors from overlay measurements of the targets. Targets comprise at least three cells associated with a measurement direction, wherein at least two of the cells comprise periodic structures at different target layers, having a same pitch and opposite offsets between the two cells, and at least an additional cell comprises a periodic structure with the same pitch at only one of the target layers. The additional cell(s) are used to detect irregularities in the respective periodic structure(s), enable estimation of process quality, provide reference images, enhance metrology simulations and provide mitigation of errors in critical process steps. Measurement methods incorporate scatterometry measurements ion the additional cell(s) for these purposes.

公开(公告)号：US09903711B2

公开(公告)日：2018-02-27

申请号：US15090389

申请日：2016-04-04

Applicant: KLA-Tencor Corporation

Inventor： Ady Levy ,  Daniel Kandel ,  Michael E. Adel ,  Leonid Poslavsky ,  John Robinson ,  Tal Marciano ,  Barak Bringoltz ,  Tzahi Grunzweig ,  Dana Klein ,  Tal Itzkovich ,  Nadav Carmel ,  Nuriel Amir ,  Vidya Ramanathan ,  Janay Camp ,  Mark Wagner

IPC: G01B11/14 ,  G01B11/27 ,  G01N21/95 ,  G03F7/20 ,  G01N21/21 ,  G01N21/31 ,  G01N21/41 ,  G01N21/47 ,  G01N21/64

CPC classification number: G01B11/272 ,  G01N21/211 ,  G01N21/31 ,  G01N21/41 ,  G01N21/4738 ,  G01N21/4788 ,  G01N21/6489 ,  G01N21/9501 ,  G01N2021/213 ,  G03F7/705 ,  G03F7/70525 ,  G03F7/70533 ,  G03F7/70616

Abstract: A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.

公开(公告)号：US09719920B2

公开(公告)日：2017-08-01

申请号：US14497439

申请日：2014-09-26

Applicant: KLA-Tencor Corporation

Inventor： Tzahi Grunzweig ,  Andrew Hill ,  Barry Loevsky

IPC: G01B11/24 ,  G01N21/47 ,  G03F7/20

CPC classification number: G01N21/4788 ,  G01B2210/48 ,  G01N2201/06113 ,  G03F7/701 ,  G03F7/70633

Abstract: Scatterometry measurement systems, illumination configurations and respective methods are provided, which comprise illumination beams that have vertical projections on a target plane comprising both a parallel component and a perpendicular component, with respect to a target measurement direction. The illumination beams propagate at an angle to the plane defined by the measurement direction and a normal to the targets surface and generate diffraction images which are off-center at the imaging pupil plane. The eccentric diffraction images are spatially arranged to avoid overlaps and to correspond to measurement requirements such as spot sizes, number of required diffraction orders and so forth. The illumination beams may be implemented using illumination pupil masks, which provide a simple way to increase scatterometry measurements throughput.

公开(公告)号：US20160209327A1

公开(公告)日：2016-07-21

申请号：US15083946

申请日：2016-03-29

Applicant: KLA-Tencor Corporation

Inventor： Tzahi Grunzweig ,  Alexander Svizher

IPC: G01N21/47 ,  G06F17/50

Abstract: A scatterometry metrology system, configured to measure diffraction signals from at least one target having respective at least one measurement direction, the scatterometry metrology system having at least one field stop having edges which are slanted with respect to the at least one measurement direction.

Abstract translation: 散射测量系统，被配置为测量来自具有相应的至少一个测量方向的至少一个目标的衍射信号，所述散射测量计量系统具有至少一个具有相对于所述至少一个测量方向倾斜的边缘的场停止。

公开(公告)号：US20150022822A1

公开(公告)日：2015-01-22

申请号：US14497439

申请日：2014-09-26

Applicant: KLA-Tencor Corporation

Inventor： Tzahi Grunzweig ,  Andrew Hill ,  Barry Loevsky

IPC: G01B11/24 ,  G01N21/47

CPC classification number: G01N21/4788 ,  G01B2210/48 ,  G01N2201/06113 ,  G03F7/701 ,  G03F7/70633

Abstract: Scatterometry measurement systems, illumination configurations and respective methods are provided, which comprise illumination beams that have vertical projections on a target plane comprising both a parallel component and a perpendicular component, with respect to a target measurement direction. The illumination beams propagate at an angle to the plane defined by the measurement direction and a normal to the targets surface and generate diffraction images which are off-center at the imaging pupil plane. The eccentric diffraction images are spatially arranged to avoid overlaps and to correspond to measurement requirements such as spot sizes, number of required diffraction orders and so forth. The illumination beams may be implemented using illumination pupil masks, which provide a simple way to increase scatterometry measurements throughput.

Abstract translation: 提供散射测量系统，照明配置和各自的方法，其包括相对于目标测量方向在包括平行分量和垂直分量的目标平面上具有垂直投影的照明光束。 照明光束以与测量方向限定的平面成一角度传播，并且与目标表面垂直的方向传播，并产生在成像光瞳平面处偏心的衍射图像。 偏心衍射图像在空间上排列以避免重叠并且对应于测量要求，例如光斑尺寸，所需衍射级数等。 照明光束可以使用照明光瞳屏蔽来实现，其提供了增加散射测量吞吐量的简单方法。