METHOD OF PREPARING SILVER NANOPARTICLES FOR USE AS INK

    公开(公告)号:WO2021246858A1

    公开(公告)日:2021-12-09

    申请号:PCT/MY2020/050181

    申请日:2020-11-30

    Applicant: MIMOS BERHAD

    Abstract: The present invention discloses a method of preparing silver nanoparticles colloidal solution to be used as conductive ink. The solution is prepared by mixing silver, water, surface coating agent and silver reducing agent into a silver colloidal mixture. The silver mixture is sonicated with ultrasonic waves using low temperature heating. Polar solvent is added to the mixture. The silver mixture is centrifuged which forms precipitate. The precipitate is grinded to obtain coated silver nanoparticles. The silver nanoparticles is processed into ink and inserted in an inkjet cartridge. The inkjet cartridge can be operated with a printer below 50°C. The overall process involves minimal heat. The surface coating agent is selected from the group consisting of carboxyl, carbonyl, carboxylate and acrylic-based polymer. A single layer of printed conductive pattern can be obtained by using the prepared ink.

    RADIO FREQUENCY MEMS SWITCH
    13.
    发明申请

    公开(公告)号:WO2009057988A3

    公开(公告)日:2009-05-07

    申请号:PCT/MY2008/000122

    申请日:2008-10-22

    Abstract: There is disclosed a method of fabricating radio frequency surface microelectromechanical (MEMS) switch. The method utilizes four masks, each configured through photolithography process at different stages that resulted in substantially planar silicon dioxide, critical in providing better mechanical performance of the RF MEMS switch. The steps include, among others, depositing silicon on glass liquid to fill small holes for a smooth silicon oxide surface, employing back etch process and performing wet etching by using chemical solution called Pad Etch. An RF MEMS switch that comprise of a lower electrode (30) formed on the surface of a silicon substrate (31), an aluminum membrane (32) suspended over the electrode and a dielectric layer (33) covering the lower electrode fabricated through the process is also disclosed.

Patent Agency Ranking