Abstract:
PURPOSE:To reduce the size of the constitution and to obtain a high extinction ratio by laminating a multiple quantum well sandwiched by 1st and 2nd semiconductor layers on a substrate having specific crystal structure and impressing an electric field of a prescribed direction thereto. CONSTITUTION:The semiconductor layers of N -GaAs2, N -AlGaAs3, P - AlGaAs5 and P -GaAs6 which are different in band gaps to sandwich the multiple quantum well guide 4 are laminated by an epitaxial method on the N -GaAs substrate 1 of (110) of the semiconductor belonging to a crystal point group (-43m) by which the optical modulator is formed. The electric field of the (11) direction is applied to the layer 4 when a reverse bias voltage is impressed between electrodes 7 and 9. An electrooptic effect and electric absorption effect are thereby acted and rotation is generated in the plane of polarization of incident light by the electrooptic effect as the substrate 1 is of the (110). The increased length of the absorption end is generated by the electric field absorption effect. The high extinction ratio is, therefore, obtd. by the small-sized constitution which does not required polarizers.
Abstract:
PURPOSE:To simply obtain a manufacture of a field effect transistor in high productivity by forming a selectively growing mask except a part to become a gate on an active layer on a semiconductor substrate, selectively growing a semiconductor layer of conductivity type different from that of the active layer so that a section becomes a reverse mesa shape, depositing a gate electrode metal and then removing the mask. CONSTITUTION:An n-type InGaAs active layer 12 is grown on a 100 semi- insulating InP substrate (Fe-dope) 11. Then, an SiO2 film 20 is formed on an whole n-type InGaAs layer, and a gap is formed in 011 direction. When a p type InGaAs is grown by a halide VPE method on the substrate, a reverse mesa shape p type InGaAs stripe 13 is obtained in the shape slightly riding on the SiO2. Then, a metal (gate, metal) 14 to become a gate electrode is deposited on the whole wafer, but no metal is attached to the mesa wall surface. Accordingly, when the film 20 is removed with HF, a gate metal on the film 20 is removed together, and an electrode is formed only on a gate. Thereafter, metal (Ti/Au) to become source, drain electrode 15 is deposited on the whole surface. Thus, an etching step necessary to precise control can be eliminated.
Abstract:
PURPOSE:To integrate numerous optical switches on one substrate, by constituting at least one of three channel waveguides in a gain guiding type waveguide which utilizes the gain difference between a section, into which carrier injection is performed, and non-injected section when partial carrier injection is performed into an active layer of a semiconductor material. CONSTITUTION:In a waveguide constitution of a gain guiding type which is constituted by closely arranging plural, for example, three channel waveguides having the same phase constant in parallel with each other at regular intervals, three channel waveguides 20a, 20b, and 20c are formed just below the (p) regions 9a, 9b, and 9c of an active layer 5 by the distribution of gains in the active layer 5, when forward bias is added between electrodes 11a, 11b, and 11c and an electrode 10 and the electrodes are biased to the vicinity of a threshold. That is to say, when electric current injection is performed into the electrodes 11a, 11b, and 11c, an 1-input and 3-output optical switch of the three channel waveguides is obtained.
Abstract:
PURPOSE:To decrease the absorption loss of light and to make possible the relative easy realization of various functions by providing patterned electrodes and optical waveguides for optical connection between optoelectrical function elements on the surface. CONSTITUTION:The 1st, 2nd and 3rd glass layers are successively formed by a CVD method on an Si substrate 1 and are removed except an optical branching device 8 and coupling device 9 by a photolithographic method. Electrodes 2, 3 for the optoelectric function elements, lead-out wires 4, 5, electrodes 6, 7 for bonding and an electrode 10 for grounding are formed of Cr and Sn. Since high resistance Si is used as the substrate in this stage, the sepn. between the electrodes is made possible by patterning the electrodes for the optoelectrical function elements. The optoelectrical function elements are fixed to such electrodes 2, 3 by thermal welding or ultrasonic press welding, etc. The hybrid optical integrated circuit is then formed.
Abstract:
PURPOSE: To miniaturize and integrate an optical switching circuit and to switch the circuit at a high-speed with a low stroke, by constituting the optical switching circuit having a function which passes lights under a turned on condition and does not pass lights under a turned off condition of a semiconductor laser having a differentiated gain characteristic. CONSTITUTION: Optical signals from the input light transmitting paths 3a and 3b of an optical switching circuit are respectively coupled with star couplers 41a and 41b and branched into four lights. Optical signals from the couplers 41a and 41b are inputted in optical gate switches 42a and 42b and 42c and 42d. A switch controlling circuit 46 is connected with each switch 42a, 42b, 42c, and 42d. The switches 42a, 42b, 42c, and 42d using semiconductor lasers having differentiation characteristics are controlled by means of the control current of the control circuit 46. Then the switching circuit is miniaturized and integrated and switched at a high speed with a low stroke. COPYRIGHT: (C)1986,JPO&Japio
Abstract:
PURPOSE:To decrease inertion losses and to quicken the response speed by inserting an active waveguide path having P-N junction in an optical transmission line and amplifying propagated light with a forward bias normally to extract the optical signal as an electric signal at a reverse bias. CONSTITUTION:Laser light 1 for signal transmission is coupled with the active waveguide device 3 having the P-N junction via an optical system 2. In applying a forward bias across the P-N junction of the waveguide path 3, the laser light 1 is amplified and irradiated from the waveguide path 3 ad irradiated light 4. On the other hand, in applying a reverse bias across the waveguide path 3, the laser light 1 is absorbed while being travelled through the active waveguide path 3 and extracted externally as a light current. Thus, the light is amplified and irradiated to the next stage or the light is extracted as the electric signal by changing over the bias state of the waveguide path 3 in this way.
Abstract:
PURPOSE:To obtain an information signal as an electric signal in a branch to be connected, by reverse-biasing only an active waveguide corresponding to an output branch to be connected of an lX(m) optical switch, and forward-biasing the remaining waveguides. CONSTITUTION:Active waveguides (20a, 20c) (20b, 20d) corresponding to the number of output branches are placed in front of two input optical transmission lines 3a, 3b, respectively. In case each active waveguide is all biased in the forward direction, an optical signal outputted from the input light transmission line is amplified by each active waveguide and transmitted as a light. The active waveguide 20c, 20b are connected to reverse-biasing circuits 25a, 25b provided with a photoelectric detecting system, and when other active waveguides 20a, 20d are biased in the forward direction, the optical signal from the input light transmission line 3a is amplified by the active waveguide 20a, and made incident to the active waveguide 20c, but is absorbed in its waveguide, and a photocurrent is obtained in an output branch 8b by the reverse-biasing circuit 25b.
Abstract:
PURPOSE:To enable a passive optical guide and an active optical guide to connect with each other highly efficiently not interfering with a device on the passive optical guide and the operation of the active optical guide by a method wherein the active optical guide and the passive optical guide are connectedly formed aligning thier optical axes removing the connected part of each optical guide to form the ends opposing to each other almost in parallel. CONSTITUTION:An InGaAsP active optical guide layer 3, an InP clad layer 4 are formed on InP substrate 1 through the intermediary of an InP buffer layer 2 and said layers 3, 4 are selectively mesaetched to be crystal grown again thereon forming the second InGaAsP passive optical guide layer 5 of the low optical absorption loss composition and the second InP clad layer 6. Then the connected part of the active optical guide layer 3 and the passive optical guide 5 is removed by etching to form the ends of the active optical guide and the passive optical guide. In such a constitution, the light generated or amplified by the active optical guid may be connected to the passive optical guide at interval of extremely minute gap removed by etching.
Abstract:
PURPOSE:To obtain a composite optical integrated device with which control is easy and the increase in speed is simple by making the device controllable with the input electrical signal of a low voltage and decreasing the number of wirings between the same and an external part. CONSTITUTION:Optical waveguides 2-4 of titanium are formed on a CiNbO3 crystal substrate 1, and there are directional coupling 2X2 optical switching elements in the waveguides 2, 3 and a similar element 7 between the elements 5 and 6 thereby constituting a 3X3 matrix optical switch. Thin film electric circuits 15-17 connected to the control electrodes of the elements 5-7 are further formed on the same substrate 1. The incident light of the waveguides 3-4 can be emitted from any of exit terminals 12-14 by an arbitrary combination of respectively 0% or 100% degrees of coupling the elements 5-7. Since the optical control device and the semiconductor thin film electric circuits are provided on the same substrate 1, the device is controllable with the external input signal of a low voltage and the number of wirings between the same and an external electric circuit for control is decreased.
Abstract:
PURPOSE:To reduce the number of optical receivers and buffer memories to prepare for the output side by adopting the configuration that the connection state to output terminal of mX1 optical switches are continuously switched in the unit of mini-slots being 1-bit/m of an input signal synchronously with each other through the driving of the optical switches. CONSTITUTION:A cell signal being an electric signal is received by m-sets of input terminals 1-1 to 1-m. Each of discrimination circuits 2-1 to 2-m decodes a desired destination of each cell signal and it is converted into an optical signal by each of optical transmitters 3-1 to 3-m and the resulting signal is outputted. Each of 1Xn switches 4-1 to 4-m connecting to each optical transmitter connects the input signal to one desired output terminal among n-sets of output terminals based on the result of discrimination of the discrimination circuits 2-1 to 2-m. An optical receiver (7-1 or the like) is placed to each output terminal of each of mX1 optical switches (5-1 or the like) and converts the optical signal into an electric signal, and it is stored in a buffer memory (8-1 or the like). Thus, one hardware is enough for each mX1 optical switch.