Abstract:
PURPOSE:To prevent an Si nitride film from being deteriorated, and to exactly attain an insulation, by providing Al which becomes the electrode of a semiconductor ion sensor, on the Si nitride film through an Si oxide film. CONSTITUTION:On a sapphire substrate 1, p-type Si 2, source and drain areas 3, 4 of high impurity density n-type Si, and an earth area 5 of high impurity density p-type Si are formed, thereafter, an Si oxide film 6 which becomes the insulating gate film of an FET is formed, on which an Si nitride film 7 is vapor-deposited. Subsequently, an Si oxide film 8 for protecting the film 7 is formed, thereafter, a contact hole is bored, an Al film 9 is vapor-deposited, and by etching it, an electrode 9a is formed. Next, the Si oxide film 8 existing in an area containing a sensor part is eliminated by etching. In such way, the deterioration of the Si nitride film 7 which works as an ion sensitive film and insulating film can be prevented, and the insulating property is improved.
Abstract:
PURPOSE:To obtain a sensor which permits mass production at a low cost by sticking a semiconductor wafer provided with an ISFET (semiconductor field effect type ion sensor) to an insulator wafer, further providing grooves arriving at the insulator wafer from the front side of the semiconductor wafer and filling the grooves with a water-resistant resin for insulation. CONSTITUTION:An impurity is diffused into the P-type silicon wafer 1 to form N-type regions 2, 3 of a high impurity concn. and a P-type region 4 of a high impurity concn. and thereafter a silicon oxide film 5 and a silicon nitride film 6 are formed thereon to make the ISFET in the wafer. The glass wafer 7 contg. alkali metal ions is stuck to the rear surface. The grooves 9 arriving at least at the wafer 7 from the front side of the wafer 2 are provided and a photosensitive resin 8 is coated on the surface. The chip-shaped ISFET obtd. by dicing the groove parts is peripherally enclosed by the insulator and is, therefore, already electrically insulated. The sensor is completed simply by connecting lead wires thereto.
Abstract:
PURPOSE:To obtain a minute semiconductor multi-biosensor, by providing a semiconductor electric field effect type ion sensor having a plurality of biologically related substances provided to the surface thereof and MOSFET tone end part of an insulating substrate so as to form a pair. CONSTITUTION:Plural pairs of semiconductor electric field effect type ion sensors (ISFETs) and MOSFETs are formed to one end of the monocrystalline silicon film on an elongated sapphire substrate 1 and the source regions of ISFETs and the drain regions MOSFETs form a common region. A plurality of ISFETs have a common drain and this drain region is extended to the other end of the substrate 1 to form a metal electrode 24 while a plurality of MOSFETs have a common source regions and this source region is extended to the other end of the substrate 1 to form a metal electrode 22. Further, the gate electrodes of MOSFETs are respectively covered with an insulator and extended to the other end of the substrate 1 to form metal electrodes 20. Be cause the drain region is common and also the source regions of respective ISFETs are common even if a plurality of ISFETs are integrated on one chip, an element area does not largely increase.
Abstract:
PURPOSE:To detect the concentration of several chemical substances in a sample solution simultaneously with a high sensitivity, by providing an FE type ion sensor having an enzyme immobilized membrane on the surface of an insulation substrate while an electrode having an enzyme immobilized membrane is provided on the other surface thereof. CONSTITUTION:This composite type enzyme electrode is made up of two ion sensitive FETs (ISFET) and two kinds of enzyme immobilized membranes provided on the top surface of a sapphire substrate insulator. An FE type ion sensor is made up of a p-type silicon substrate layer 2, an n-type high impurities density source region 3, an n-type high impurities density drain region 4, a p-type high impurities density earth region, a silicon oxide film 6, a silicon nitride film 7 and an ion sensitive film. Two precious metal electrodes 10 and 11 are provided on the undersurface of the substrate 1 and a second enzyme immobilized membrane is formed on the surface of one electrode 11. When measuring urea and glucolse, a urease immobilized membrane and a glucose oxidase immobilized membrane are used for the first and second enzyme immobilized membranes respectively.
Abstract:
PURPOSE:To form enzyme immobilizing films which are different from each other on the same chip by removing part of the photoresist coated on a semiconductor wafer then coating a protein soln. thereon and dissolving the photoresist. CONSTITUTION:The photoresist film 6 soluble in acetone is spin-coated on the front of a wafer constituted by forming semiconductor field effect type ion sensors ISFETs by using an island-shaped silicon layer on the front of a sapphire substrate 1 and depositing gold 10 by evaporation on the rear. The photoresist film 6 on the surface to be provided with the enzyme immobilizing film 9 is thereafter removed by photolithography using a photomask. A protein soln. contg. the 1st enzyme and crosslinking agent is then spin-coated to form an urease immobilizing film 7. The water is then immersed in acetone to dissolve the photoresist 6 and at the same time to remove the urease immobilizing film coated thereon. A glucose immobilizing film 9 is also formed by repeating the similar stage.
Abstract:
PROBLEM TO BE SOLVED: To provide an apparatus for supporting design of a printed board, which is provided with a design function to suppress electromagnetic radiation in a common mode from the printed board. SOLUTION: The apparatus for supporting design of the printed board, which uses an information processor, includes a means for provisionally placing electronic components on the printed board, a means for interconnecting the provisionally placed electronic components with a shortest route of wiring, and a means for re-placing the provisionally placed electronic components so as to minimize the length of the wirings of the interconnection in a long side direction of a ground plane. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a supporting device, a method and a program for design of a printed circuit board for suppressing radiation of unwanted electromagnetic waves regarding wiring between a power plane and a ground plane. SOLUTION: The supporting device for design of a printed circuit board is provided with a means 2 to input printed circuit board layout information comprising signal wiring, power plane structure, ground plane structure, mounting positions of active elements such as an LSI, IC and passive elements such as a decoupling capacitor, a means 3 to discriminate the signal wiring, the power plane and the ground plane from the inputted information, a means 4 to select prescribed signal wiring and to discriminate whether or not the signal wiring is wired in an internal layer sandwiched between the power plane and the ground plane and a means 5 to display a discrimination result. The radiation of unwanted electromagnetic wave is suppressed by specifying the signal wiring sandwiched between the power plane and the ground plane to be a factor of the radiation of the unwanted electromagnetic waves at high level. COPYRIGHT: (C)2003,JPO
Abstract:
PROBLEM TO BE SOLVED: To prevent ground structure, with which first and second ground planes are connected by a connector, from generating strong electromagnetic fields, with which radio communication is interfered. SOLUTION: Since the edge of a second ground plane 15 opposite to a connector 14 is connected to a first ground plane 11 by a resistance connecting means 41, Q value of resonance in the ground structure can be lowered by the resistance connecting means 41 and the strong electromagnetic field can be prevented from being generated by the electromagnetic field of a data processing circuit. Especially, when the resistance value of the resistance connecting means 41 is identical to the characteristic impedance of the ground structure, since the ground structure is matched and terminated, the electromagnetic field can be surely prevented from being generated by resonance.
Abstract:
PROBLEM TO BE SOLVED: To provide a data processing terminal that the 2nd ground plane of a slave circuit board does not generate interference electromagnetic field to wireless communication. SOLUTION: The 2nd ground plane 15 of nearly a rectangular shape is connected to a 1st ground plane 11 on which a data processing circuit is mounted and a wireless communication circuit 12 makes wireless communication with a communication wavelength λ. Part of the 2nd ground plane 15 from a ground connection means 14 at a consecutive edge of the plane 15 to a ground connection means 33 acts like an antenna, and since the largest interval (a) of a plurality of ground connection means 14, 33 at the consecutive edge of the 2nd ground plane 15 satisfies a relation of 'a