-
公开(公告)号：AT287082T
公开(公告)日：2005-01-15
申请号：AT99914933
申请日：1999-03-17
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JIANG LICAI
IPC: G01N23/20 , G01N23/207
Abstract: An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.
-
公开(公告)号：DE60015346D1
公开(公告)日：2004-12-02
申请号：DE60015346
申请日：2000-08-01
Applicant: OSMIC INC
Inventor： JIANG LICAI , VERMAN BORIS
Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.
-
公开(公告)号：DE69908311D1
公开(公告)日：2003-07-03
申请号：DE69908311
申请日：1999-02-18
Applicant: OSMIC INC
Inventor： GUTMAN GEORGE , JIANG LICAI , VERMAN BORIS
IPC: G21K1/06
Abstract: An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein the x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.
-
公开(公告)号：CA2380922C
公开(公告)日：2008-12-09
申请号：CA2380922
申请日：2000-08-01
Applicant: OSMIC INC
Inventor： JIANG LICAI , VERMAN BORIS
Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.
-
公开(公告)号：CA2366801A1
公开(公告)日：2000-10-19
申请号：CA2366801
申请日：2000-04-07
Applicant: OSMIC INC
Inventor： JOENSEN KARSTEN DAN , BONGLEA KIM , VERMAN BORIS , JIANG LICAI
Abstract: A modular x-ray lens system for use is directing x-rays comprising a radiati on source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
-
Patent Agency Ranking
公开(公告)号：AU3356999A
公开(公告)日：1999-10-25
申请号：AU3356999
申请日：1999-03-17
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JIANG LICAI
IPC: G01N23/20 , G01N23/207
Abstract: An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.
-
公开(公告)号：AU3295099A
公开(公告)日：1999-09-06
申请号：AU3295099
申请日：1999-02-18
Applicant: OSMIC INC
Inventor： GUTMAN GEORGE , JIANG LICAI , VERMAN BORIS
IPC: G21K1/06
Abstract: An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein the x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.
-
公开(公告)号：CA2321289A1
公开(公告)日：1999-08-26
申请号：CA2321289
申请日：1999-02-18
Applicant: OSMIC INC
Inventor： GUTMAN GEORGE , VERMAN BORIS , JIANG LICAI
Abstract: An X-ray reflecting system comprising a Kirkpatrick-Baez side-by-side optic in a single corner configuration having multi-layer Bragg X-ray reflective surfaces.
-
公开(公告)号：DE602004012562T2
公开(公告)日：2009-04-16
申请号：DE602004012562
申请日：2004-06-10
Applicant: OSMIC INC
Inventor： VERMAN BORIS , HARADA JIMPEI
Abstract: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or depth grading, or both.
-
公开(公告)号：DE602004012562D1
公开(公告)日：2008-04-30
申请号：DE602004012562
申请日：2004-06-10
Applicant: OSMIC INC
Inventor： VERMAN BORIS , HARADA JIMPEI
Abstract: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or depth grading, or both.
-
-
-
-
-
-
-
-
-
Search Results
37
records
(took 0.02 seconds)
