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公开(公告)号：JP2012094531A
公开(公告)日：2012-05-17
申请号：JP2011279345
申请日：2011-12-21
Applicant: Osmic Inc , オスミック、インコーポレイテッド
Inventor： BONGLEA KIM
Abstract: PROBLEM TO BE SOLVED: To provide an X-ray from a single-spot micro-focusing x-ray source having the advantages of long service life and durability associated with a rotating anode and high luminance needed for advanced x-ray applications.SOLUTION: Emitted electrons travel towards a target 30 in parallel with a longitudinal axis extending between an electron-generation chamber 12 and a target chamber 14, and bombard the target to generate x-rays. The target is displaceable, while being bombarded with electrons, with respect to a support structure in at least one direction perpendicular to the longitudinal axis.
Abstract translation: 要解决的问题：为了提供来自单点微聚焦X射线源的X射线，其具有与旋转阳极相关联的长使用寿命和耐久性以及高级x射线应用所需的高亮度的优点 。 解决方案：发射的电子朝向与电子发生室12和目标室14之间延伸的纵轴平行的靶30行进，并且轰击靶以产生X射线。 在与垂直于纵向轴线的至少一个方向相对于支撑结构相对于电子轰击的目标是可置换的。 版权所有（C）2012，JPO＆INPIT
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公开(公告)号：AU4076600A
公开(公告)日：2000-11-14
申请号：AU4076600
申请日：2000-04-07
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JIANG LICAI , BONGLEA KIM , JOENSEN KARSTEN DAN
Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
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公开(公告)号：WO0062306A2
公开(公告)日：2000-10-19
申请号：PCT/US0009170
申请日：2000-04-07
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JIANG LICAI , BONGLEA KIM , JOENSEN KARSTEN DAN
CPC classification number: G21K1/06 , A61N2005/1091 , A61N2005/1095
Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
Abstract translation: 一种用于引导x射线的模块化X射线透镜系统，包括产生x射线的辐射源和引导x射线的透镜系统，其中x射线透镜系统可被配置为将x射线聚焦到 焦点并改变所述焦点的强度。
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公开(公告)号：DE602004010934D1
公开(公告)日：2008-02-07
申请号：DE602004010934
申请日：2004-11-19
Applicant: OSMIC INC
Inventor： BONGLEA KIM
Abstract: The present invention provides an x-ray source including an electron-generation chamber with an electron beam source that emits electrons and a target chamber with a support structure and a target positioned within the support structure. The emitted electrons travel in a direction substantially parallel to a longitudinal axis extending between the electron-generation chamber and the target chamber towards the target and bombard the target to generate x-rays. The target is movable, while being bombarded with electrons, with respect to the support structure in at least one direction perpendicular to a longitudinal axis.
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Patent Agency Ranking
公开(公告)号：CA2366801A1
公开(公告)日：2000-10-19
申请号：CA2366801
申请日：2000-04-07
Applicant: OSMIC INC
Inventor： JOENSEN KARSTEN DAN , BONGLEA KIM , VERMAN BORIS , JIANG LICAI
Abstract: A modular x-ray lens system for use is directing x-rays comprising a radiati on source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
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公开(公告)号：DE602004010934T2
公开(公告)日：2009-01-02
申请号：DE602004010934
申请日：2004-11-19
Applicant: OSMIC INC
Inventor： BONGLEA KIM
Abstract: The present invention provides an x-ray source including an electron-generation chamber with an electron beam source that emits electrons and a target chamber with a support structure and a target positioned within the support structure. The emitted electrons travel in a direction substantially parallel to a longitudinal axis extending between the electron-generation chamber and the target chamber towards the target and bombard the target to generate x-rays. The target is movable, while being bombarded with electrons, with respect to the support structure in at least one direction perpendicular to a longitudinal axis.
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公开(公告)号：DE60025341T2
公开(公告)日：2006-08-17
申请号：DE60025341
申请日：2000-04-07
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JIANG LICAI , BONGLEA KIM , JOENSEN DAN
Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
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公开(公告)号：DE60025341D1
公开(公告)日：2006-03-30
申请号：DE60025341
申请日：2000-04-07
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JIANG LICAI , BONGLEA KIM , JOENSEN DAN
Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
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公开(公告)号：AT315271T
公开(公告)日：2006-02-15
申请号：AT00920188
申请日：2000-04-07
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JIANG LICAI , BONGLEA KIM , JOENSEN KARSTEN DAN
Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
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