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    Method of electroless deposition of metals with improved sensitizer
    12.
    发明授权
    Method of electroless deposition of metals with improved sensitizer 失效
    具有改善的敏感剂的金属沉积的方法

    公开(公告)号：US3666527A

    公开(公告)日：1972-05-30

    申请号：US3666527D

    申请日：1970-07-31

    Applicant: RCA CORP

    Inventor： FELDSTEIN NATHAN ,  STEPHEN THOMAS

    IPC: C23C18/28 ,  B44D1/092 ,  C23C17/02

    CPC classification number: C23C18/285

    Abstract: METHOD FOR AUTOCATALYTICALLY ELECTROLESSLY PLATING A DIELECTRIC SURFACE WITH A METAL SUCH AS NICKEL, COBALT OR COPPER COMPRISING SENSITIZING THE SURFACE WITH AN IMPORVED SENSITIZING SOLUTION COMPRISING BOTH DIVALENT TIN ION AND TETRAVALENT TIN ION, THE SOLUTION HAVING A PH LESS THAN ABOUT 1.5, TREATING THE SENSITIZED SURFACE WITH A CATALYZING SOLUTION TO PROVIDE CATALYTIC NUCLEATING CENTERS, AND PLATING THE METAL ON THE CATALYZED SURFACE. THE IMPROVED SENSITIZING SOLUTION PERMITS PLATING ON SMOOTH, DENSE, WATER REPELLENT PLASTIC SURFACES SUCH AS TEFLON, LUCITE, SILICONE RUBBERS AND MYLAR.

    Method for photodepositing smaller size image screen areas for cathode ray tube from larger size mask apertures
    15.
    发明授权
    Method for photodepositing smaller size image screen areas for cathode ray tube from larger size mask apertures 失效
    用于从较大尺寸掩模孔径对阴极射线管轻微沉积图像屏幕的方法

    公开(公告)号：US3661581A

    公开(公告)日：1972-05-09

    申请号：US3661581D

    申请日：1969-12-30

    Applicant: RCA CORP

    Inventor： FELDSTEIN NATHAN

    IPC: H01J9/14 ,  H01J9/227 ,  G03C5/00

    CPC classification number: H01J9/144

    Abstract: A method for producing a color kinescope having an image screen and a color selection mask having final-size apertures that are temporarily reduced in size for use as a photographic master in producing the image screen. The method includes providing a substrate having apertures of final size; providing at one surface of the substrate a perforated layer of electroless deposition-initiating material, portions of the layer partially extending across the apertures; electrolessly depositing a suitable material at these portions of the layer to produce opaque light-barriers that define respective light-transmitting corridors; providing the image screen by photographic exposure through the corridors; removal of the light-barriers to restore the apertures to their original condition and provide the final mask; and incorporation of the mask and image screen into a kinescope.

    Abstract translation: 一种用于制造具有图像屏幕的彩色显像管和具有最终尺寸孔径的颜色选择掩模的方法，所述最终尺寸孔径在生产图像屏幕时用作照相母版，其尺寸被暂时缩小。 该方法包括提供具有最终尺寸的孔的基底; 在所述基板的一个表面处提供无电沉积起始材料的穿孔层，所述层的部分部分地延伸穿过所述孔; 在层的这些部分无电沉积合适的材料以产生限定相应的透光走廊的不透明光阻; 通过走廊通过摄影曝光提供图像屏幕; 去除光栅以将孔恢复到其原始状态并提供最终的掩模; 并将掩模和图像屏幕结合到显像管中。

    Room temperature electroless nickel plating bath
    16.
    发明授权
    Room temperature electroless nickel plating bath 失效
    室温电镀镍镀层浴

    公开(公告)号：US3574664A

    公开(公告)日：1971-04-13

    申请号：US3574664D

    申请日：1967-10-26

    Applicant: RCA CORP

    Inventor： FELDSTEIN NATHAN

    IPC: C23C18/36 ,  C23C3/02

    CPC classification number: C23C18/36

    Abstract: A PROCESS FOR DEPOSITING NICKEL ONTO A SUBSTRATE FROM A ROOM TEMPERATURE ELECTROLESS PLATING BATH; THE BATH INITIALLY INCLUDES (I) A NICKEL SALT, (II) SODIUM HYPOPHOSPHITE, (III) SODIUM PYROPHOSPHATE, AND (IV) AMMONIUM HYDROXIDE. THE CONCENTRATION OF AMMONIUM HYDROXIDE IS CHOSEN SO AS TO ADJUST THE PH OF THE BATH TO AN INITIAL VALUE (BETWEEN 9.0 AND 11.5) CORRESPONDING TO THE DESIRED PLATING RATE. A STRONG BASE SUCH AS SODIUM HYDROXIDE IS THEN ADDED TO INCREASE THE PH OF THE BATH ABOVE THE INITIAL VALUE WITHOUT SUBSTANTIALLY AFFECTING THE PLATING RATE. IN USE, THE PH OF THE BATH DECREASES, BUT THE PLATING RATE REMAINS RELATIVELY UNAFFECTED SO LONG AS THE PH DOES NOT DROP BELOW THE INITIAL VALUE SET BY THE AMMONIUM HYDROXIDE. THIS PERMITS WIDER TOLERANCES IN PH CONTROL OF THE BATH AND ALLEVIATES THE NEED FOR ADDING AN ACCURATELY CONTROLLED AMOUNT OF HYDROXYL ION WHEN THE BATH IS REGENERATED.

    METHOD OF DEPOSITING A PATTERN OF METAL PLATED AREAS
    17.
    发明专利
    METHOD OF DEPOSITING A PATTERN OF METAL PLATED AREAS 未知

    公开(公告)号：CA987789A

    公开(公告)日：1976-04-20

    申请号：CA188005

    申请日：1973-12-12

    Applicant: RCA CORP

    Inventor： FELDSTEIN NATHAN

    IPC: H05K3/00 ,  C23F1/00 ,  G03F1/54 ,  G03F1/68 ,  H01L21/027 ,  H05K1/03 ,  H05K3/10

    Abstract: 1452116 Photomasks RCA CORPORATION 18 Dec 1973 [29 Dec 1972] 58555/73 Heading G2X [Also in Division C7] A photomask is formed by depositing a Ni or Ni alloy layer by vapour or electroless deposition or by sputtering on a glass or plastics substrate, applying a pattern of a photo-resist, electrolessly depositing a Ni, Co or Cu layer and then heating in air to form Ni oxides and make the first layer at least 70% transparent to visible or ultraviolet light.

    20.
    发明专利
    未知

    公开(公告)号：DE2363516A1

    公开(公告)日：1974-07-04

    申请号：DE2363516

    申请日：1973-12-20

    Applicant: RCA CORP

    Inventor： FELDSTEIN NATHAN

    IPC: H05K3/00 ,  C23F1/00 ,  G03F1/54 ,  G03F1/68 ,  H01L21/027 ,  H05K1/03 ,  H05K3/10 ,  G03F1/00 ,  C03C17/06 ,  C23C5/00

    Abstract: 1452116 Photomasks RCA CORPORATION 18 Dec 1973 [29 Dec 1972] 58555/73 Heading G2X [Also in Division C7] A photomask is formed by depositing a Ni or Ni alloy layer by vapour or electroless deposition or by sputtering on a glass or plastics substrate, applying a pattern of a photo-resist, electrolessly depositing a Ni, Co or Cu layer and then heating in air to form Ni oxides and make the first layer at least 70% transparent to visible or ultraviolet light.

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