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公开(公告)号:CA891678A
公开(公告)日:1972-01-25
申请号:CA891678D
Applicant: RCA CORP
Inventor: OGAWA HERBERT F , NICOLL FREDERICK H
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12.
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公开(公告)号:US3280357A
公开(公告)日:1966-10-18
申请号:US17671262
申请日:1962-03-01
Applicant: RCA CORP
Inventor: NICOLL FREDERICK H
IPC: H01J29/38
CPC classification number: H01J29/38
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公开(公告)号:US3042834A
公开(公告)日:1962-07-03
申请号:US54926755
申请日:1955-11-28
Applicant: RCA CORP
Inventor: NICOLL FREDERICK H
IPC: H05B33/12
CPC classification number: H05B33/12
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公开(公告)号:US2891169A
公开(公告)日:1959-06-16
申请号:US53225955
申请日:1955-09-02
Applicant: RCA CORP
Inventor: NICOLL FREDERICK H
CPC classification number: H01L31/14
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公开(公告)号:US2692218A
公开(公告)日:1954-10-19
申请号:US10209249
申请日:1949-06-29
Applicant: RCA CORP
Inventor: NICOLL FREDERICK H , EPSTEIN DAVID W
IPC: H01B3/08
CPC classification number: H01B3/082 , Y10T428/2949
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18.Method of depositing silica films and preparation of solutions therefor 失效
Title translation: 沉积二氧化硅薄膜的方法及其制备方法公开(公告)号:US2505629A
公开(公告)日:1950-04-25
申请号:US10226249
申请日:1949-06-30
Applicant: RCA CORP
Inventor: THOMSON SOREN M , NICOLL FREDERICK H
IPC: C03C17/25
CPC classification number: C03C17/25 , C03C2217/213 , C03C2217/23 , C03C2218/111 , Y10T428/261
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公开(公告)号:US2486431A
公开(公告)日:1949-11-01
申请号:US55008044
申请日:1944-08-18
Applicant: RCA CORP
Inventor: NICOLL FREDERICK H , WILLIAMS FERD E
IPC: G02B1/11
CPC classification number: G02B1/113
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公开(公告)号:US2295802A
公开(公告)日:1942-09-15
申请号:US40062641
申请日:1941-07-01
Applicant: RCA CORP
Inventor: NICOLL FREDERICK H
IPC: G02B17/08
CPC classification number: G02B17/086 , G02B17/08 , G02B17/0808 , G02B17/0888
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