公开(公告)号：CA2203904C

公开(公告)日：2002-02-12

申请号：CA2203904

申请日：1995-10-30

Applicant: SAES PURE GAS INC

Inventor： LORIMER D ARCY H ,  KRUEGER GORDON P

IPC: C23C14/54 ,  C23C14/56 ,  F04B37/02 ,  F04B37/08 ,  F04B37/16 ,  H01L21/02 ,  H01L21/20 ,  H01L21/00

Abstract: A wafer processing system including a processing chamber, a low pressure pum p coupled to the processing chamber for pumping noble and non-noble gases, a valve mechanism coupling a source of noble gas to the processing chamber, an in situ getter pump disposed within the processing chamber which pumps certa in non-noble gases during the flow of the noble gas into the chamber, and a processing mechanism for processing a wafer disposed within the processing chamber. Preferably, the in situ getter pump can be operated at a number of different temperatures to preferentially pump different species of gas at those temperatures. A gas analyzer is used to automatically control the temperature of the getter pump to control the species of gases that are pump ed from the chamber. A method for processing a wafer of the present invention includes the steps of placing a wafer within a processing chamber and sealin g the chamber, flowing a noble gas into the chamber while simultaneously pumpi ng the chamber with an external low pressure pump and with an in situ getter pu mp disposed within the chamber which pumps non-noble gases, and processing the wafer within the chamber while the noble gas continues to flow. The method also preferably includes the steps of monitoring the composition of the gas within the chamber and controlling the temperature of the getter material based upon the analysis of the composition.

公开(公告)号：AT207189T

公开(公告)日：2001-11-15

申请号：AT95943637

申请日：1995-11-30

Applicant: SAES PURE GAS INC

Inventor： KRUEGER GORDON P ,  LORIMER D ARCY H ,  CARELLA SERGIO ,  CONTE ANDREA

IPC: C23C14/54 ,  C23C14/56 ,  F04B37/02 ,  F04B37/08 ,  F04B37/14 ,  F04B37/16 ,  H01J9/38 ,  H01L21/00 ,  H01L21/02 ,  H01L21/20

Abstract: A getter pump module includes a number of getter disks provided with axial holes, and a heating element which extends through the holes to support and heat the getter disks. The getter disks are preferably solid, porous, sintered getter disks that are provided with a titanium hub that engages the heating element. A thermally isolating shield is provided to shield the getter disks from heat sources and heat sinks within the chamber, and to aid in the rapid regeneration of the getter disks. In certain embodiments of the present invention the heat shields are fixed, and in other embodiments the heat shield is movable. In one embodiment, a focus shield is provided to reflect thermal energy to the getter material from an external heater element and provide high pumping speeds. An embodiment of the present invention also provides for a rotating getter element to enhance getter material utilization.

公开(公告)号：MX9704048A

公开(公告)日：1998-01-31

申请号：MX9704048

申请日：1995-11-30

Applicant: SAES PURE GAS INC

Inventor： KRUEGER GORDON P ,  LORIMER D ARCY H ,  CARELLA SERGIO ,  CONTE ANDREA

Abstract: Un modulo de bomba de adsorcion incluye una cantidad de discos de adsorcion que se proporcionan con orificios axiales y un elemento de calentamiento que se extiende a través de los orificios para soportar y calentar los discos de adsorcion. Los discos de adsorcion de preferencia son discos de adsorcion sinterizados porosos solidos que se proporcionan con un cubo de titanio que acopla el elemento de calentamiento. Un blindaje aislante térmicamente se proporciona para blindar los elementos de adsorcion contra fuentes térmicas y colectores térmicos dentro de la cámara, y para auxiliar en la rápida regeneracion de los discos de adsorcion. En ciertas modalidades de la presente invencion, los blindajes térmicos se fijan y en otras modalidades, el blindaje térmico es movil. En una modalidad, un blindaje de foco se proporciona para reflejar la energía térmica el material de adsorcion desde un elemento calentador externo y proporciona altas velocidades de bombeo. Una modalidad de la presente invencion también proporciona un elemento de adsorcion giratorio para mejorar el empleo del material de adsorcion.

公开(公告)号：BR9509456A

公开(公告)日：1997-09-16

申请号：BR9509456

申请日：1995-10-30

Applicant: SAES PURE GAS INC

Inventor： LORIMER D ARCY H ,  KRUEGER GORDON P

IPC: C23C14/54 ,  C23C14/56 ,  F04B37/02 ,  F04B37/08 ,  F04B37/16 ,  H01L21/02 ,  H01L21/20 ,  H01L21/00 ,  C01B23/00

Abstract: A wafer processing system including a processing chamber, a low pressure pump coupled to the processing chamber for pumping noble and non-noble gases, a valve mechanism coupling a source of noble gas to the processing chamber, an in situ getter pump disposed within the processing chamber which pumps certain non-noble gases during the flow of the noble gas into the chamber, and a processing mechanism for processing a wafer disposed within the processing chamber. Preferably, the in situ getter pump can be operated at a number of different temperatures to preferentially pump different species of gas at those temperatures. A gas analyzer is used to automatically control the temperature of the getter pump to control the species of gasses that are pumped from the chamber. A method for processing a wafer of the present invention includes the steps of placing a wafer within a processing chamber and sealing the chamber, flowing a noble gas into the chamber while simultaneously pumping the chamber with an external low pressure pump and with an in situ getter pump disposed within the chamber which pumps non-noble gases, and processing the wafer within the chamber while the noble gas continues to flow. The method also preferably includes the steps of monitoring the composition of the gas within the chamber and controlling the temperature of the getter material based upon the analysis of the composition.

公开(公告)号：CA2206264A1

公开(公告)日：1996-06-06

申请号：CA2206264

申请日：1995-11-30

Applicant: SAES PURE GAS INC

Inventor： CONTE ANDREA ,  LORIMER D ARCY H ,  CARELLA SERGIO ,  KRUEGER GORDON P

IPC: C23C14/54 ,  C23C14/56 ,  F04B37/02 ,  F04B37/08 ,  F04B37/14 ,  F04B37/16 ,  H01J9/38 ,  H01L21/00 ,  H01L21/02 ,  H01L21/20 ,  H01L21/70

Abstract: A getter pump module includes a number of getter disks provided with axial holes, and a heating element which extends through the holes to support and heat the getter disks. The getter disks are preferably solid, porous, sintered getter disks that are provided with a titanium hub that engages the heating element. A thermally isolating shield is provided to shield the getter disks from heat sources and heat sinks within the chamber, and to aid in the rapid regeneration of the getter disks. In certain embodiments of the present invention, the heat shields are fixed, and in other embodiments the heat shield is movable. In one embodiment, a focus shield is provided to reflect thermal energy to the getter material from an external heater element and provide high pumping speeds. An embodiment of the present invention also provides for a rotating getter element to enhance getter material utilization.

公开(公告)号：MY121728A

公开(公告)日：2006-02-28

申请号：MYPI9804713

申请日：1998-10-15

Applicant: SAES PURE GAS INC

Inventor： MARCO SUCCI ,  GIORGIO VERGANI ,  LORIMER D ARCY H

IPC: B01D53/04 ,  B01D53/30 ,  B01D53/34 ,  B01D53/81 ,  C23C16/44

Abstract: A GAS PURIFICATION SYSTEM (10) WITH SAFETY DEVICE INCLUDES A GAS PURIFICATION UNIT (12) AND ONE OR MORE SAFETY DEVICES (20A/20B). THE GAS PURIFICATION UNIT INCLUDES AN ENCLOSURE (16) AND A PURIFICATION MATERIAL DISPOSED WITHIN THE ENCLOSURE THAT EXHIBITS AN EXOTHERMIC REACTION WHEN EXPOSED TO CERTAIN GAS CONTAMINANTS WHICH MAY BE PRESENT WITHIN SAID ENCLOSURE. THE GAS PURIFICATION UNIT HAS AN INLET (18) COUPLED TO A UNPURIFIED GAS INPUT LINE (24) AND AN OUTLET (20) COUPLED TO A PURIFIED GAS OUTPUT LINE (26). THE SAFETY DEVICE IS COUPLED TO ONE OF SAID UNPURIFIED GAS INPUT LINE AND SAID PURIFIED OUTPUT LINE, AND DEVELOPS AN ALARM SIGNAL (52/58) WHEN GAS CONTAMINANTS WITHIN SAID SAFETY DEVICE THAT ARE SIMILAR TO SAID CERTAIN GAS CONTAMINANTS WITHIN SAID GAS PURIFICATION UNIT ARE ABOVE A GIVEN CONCENTRATION LEVEL OVER A PERIOD OF TIME.

公开(公告)号：BR9509847A

公开(公告)日：1997-12-30

申请号：BR9509847

申请日：1995-11-30

Applicant: SAES PURE GAS INC

Inventor： KRUEGER GORDON P ,  LORIMER D ARCY H ,  CARELLA SERGIO ,  CONTE ANDREA

IPC: C23C14/54 ,  C23C14/56 ,  F04B37/02 ,  F04B37/08 ,  F04B37/14 ,  F04B37/16 ,  H01J9/38 ,  H01L21/00 ,  H01L21/02 ,  H01L21/20

Abstract: A getter pump module includes a number of getter disks provided with axial holes, and a heating element which extends through the holes to support and heat the getter disks. The getter disks are preferably solid, porous, sintered getter disks that are provided with a titanium hub that engages the heating element. A thermally isolating shield is provided to shield the getter disks from heat sources and heat sinks within the chamber, and to aid in the rapid regeneration of the getter disks. In certain embodiments of the present invention the heat shields are fixed, and in other embodiments the heat shield is movable. In one embodiment, a focus shield is provided to reflect thermal energy to the getter material from an external heater element and provide high pumping speeds. An embodiment of the present invention also provides for a rotating getter element to enhance getter material utilization.

公开(公告)号：AU2591297A

公开(公告)日：1997-10-17

申请号：AU2591297

申请日：1997-03-25

Applicant: SAES PURE GAS INC

Inventor： LORIMER D ARCY H

IPC: B01D8/00 ,  F04B37/02 ,  F04B37/08 ,  F04B37/16

Abstract: A combination cryopump/getter pump including a cryopump section having a cryopump inlet, a getter pump section having a getter pump inlet, and a mechanism for coupling the cryopump section and the getter pump section to a single port of a process chamber to be evacuated. Preferably, a cylindrical cryopump section surrounds a cylindrical getter pump section. Preferably, the cryopump section and the getter pump section are coupled to the common port of the process chamber by a gate valve mechanism. In one embodiment of the present invention, the gate valve mechanism isolates the cryopump inlet and the getter pump inlet when in a closed position, and in another embodiment of the present invention the gate valve does not isolate the cryopump inlet from the getter pump inlet when in a closed position. Preferably, thermal insulation is provided between the getter pump section and the cryopump section to thermally isolate the two sections. The cryopump section preferably includes both a 15 DEG K array and a 80 DEG K array.

公开(公告)号：CA2485918A1

公开(公告)日：1996-06-06

申请号：CA2485918

申请日：1995-11-30

Applicant: SAES PURE GAS INC

Inventor： LORIMER D ARCY H ,  KRUEGER GORDON P ,  CARELLA SERGIO ,  CONTE ANDREA

IPC: C23C14/54 ,  C23C14/56 ,  F04B37/02 ,  F04B37/08 ,  F04B37/14 ,  F04B37/16 ,  H01J9/38 ,  H01L21/00 ,  H01L21/02 ,  H01L21/20

Abstract: A getter pump module includes a number of getter disks provided with axial holes, and a heating element which extends through the holes to support and heat the getter disks. The getter disks are preferably solid, porous, sintered getter disks that are provided with a titanium hub that engages the heating element. A thermally isolating shield is provided to shield the getter disks from heat sources and heat sinks within the chamber, and to aid in the rapid regeneration of the getter disks. In certain embodiments of the present invention the heat shields are fixed, and in other embodiments the heat shield is movable. In one embodiment, a focus shield is provided to reflect thermal energy to the getter material from an external heater element and provide high pumping speeds. An embodiment of the present invention also provides for a rotating getter element to enhance getter material utilization.

公开(公告)号：AU4140896A

公开(公告)日：1996-05-23

申请号：AU4140896

申请日：1995-10-30

Applicant: SAES PURE GAS INC

Inventor： LORIMER D ARCY H ,  KRUEGER GORDON P

IPC: C23C14/54 ,  C23C14/56 ,  F04B37/02 ,  F04B37/08 ,  F04B37/16 ,  H01L21/02 ,  H01L21/20 ,  H01L21/00 ,  C01B23/00

Abstract: A wafer processing system including a processing chamber, a low pressure pump coupled to the processing chamber for pumping noble and non-noble gases, a valve mechanism coupling a source of noble gas to the processing chamber, an in situ getter pump disposed within the processing chamber which pumps certain non-noble gases during the flow of the noble gas into the chamber, and a processing mechanism for processing a wafer disposed within the processing chamber. Preferably, the in situ getter pump can be operated at a number of different temperatures to preferentially pump different species of gas at those temperatures. A gas analyzer is used to automatically control the temperature of the getter pump to control the species of gasses that are pumped from the chamber. A method for processing a wafer of the present invention includes the steps of placing a wafer within a processing chamber and sealing the chamber, flowing a noble gas into the chamber while simultaneously pumping the chamber with an external low pressure pump and with an in situ getter pump disposed within the chamber which pumps non-noble gases, and processing the wafer within the chamber while the noble gas continues to flow. The method also preferably includes the steps of monitoring the composition of the gas within the chamber and controlling the temperature of the getter material based upon the analysis of the composition.