Abstract:
Basic redundancy information is non volatily stored in a reserved area (that is an area of the array that is not addressable by the user of the device) of the addressable area of the array and is copied on volatile storage supports at every power-on of the memory device. The unpredictable though statistically inevitable presence of fail array elements also in such a reserved area of the memory array that would corrupt the basic redundancy information as established during the test-on wafer (EWS) phase of the fabrication process and thus increasing the number of rejects, lowering the yield of the fabrication process, is effectively overcome by writing the basic redundancy data in the reserved area of the array with an ECC technique, using a certain error correction code that may be chosen among so-called majority codes 3, 5, 7, 15 and the like or Hamming code for 1, 2, 3 or more errors, in function of the fail probability of a memory cell as determined by the testing on wafer of the devices during fabrication (fail probability of the specific fabrication process used). A significant area saving is achieved compared to the use of fuse arrays and other known approaches.
Abstract:
A method for operating a flash memory device ( 100 ) is proposed. The memory device includes a matrix of memory cells ( 110 ) each one having a programmable threshold voltage (V T ) defining a value stored in the memory cell. The method includes the steps of crasing a block ( 115 ) of memory cells, and compacting the threshold voltages of the memory cells of the block within a predefined compacting range, wherein the step of compacting includes: selecting at least one first memory cell (110 0e ) of the block for writing a target value; restoring the threshold voltage of a subset (110 0e ; 110 1o ) of the memory cells of the block to the compacting range, the subset consisting of the at least one first memory cell (110 0e ) and/or at least one second memory cell of the block (110 1o ) being adjacent to the at least one first memory cell; and at least partially writing the target value into the at least one first memory cell.
Abstract:
The evaluation time (Teval) of the programmed or erased state of a cell of the NAND memory array is set for the individual memory device in a way that at least partially compensates the generally large spread of parasitic capacitance values of the array bitlines in the mass production fabrication process of these devices.
Abstract:
A solid-state mass storage device (105, 100; 400, 415, 420) is provided. The solid-state mass storage device defines a storage area (100; 415) adapted to store data; the storage area is adapted to be exploited for storing data with a first storage density at a first data transfer speed. The storage area comprises at least a first storage area portion (120) and a second storage area portion (130). The solid-state mass storage device further includes accessing means (105; 420, 440) adapted to exploit the first storage area portion for storing data with a second storage density at a second data transfer speed, and adapted to exploit the second storage area portion for storing data with a third storage density and a third data transfer speed. The second storage density is lower than the third storage density, which is in turn lower than or equal to the first storage density; the second data transfer speed is higher than the third data transfer speed, which is in turn higher than or equal to the first data transfer speed.
Abstract:
The capacitive coupling between two adjacent bitlines of a NAND memory device is relevant and this may be exploited for boosting the voltage of bitlines that are not to be programmed in order to inhibit program operations on them. According to the disclosed method, first the even (odd) bitlines that include cells not to be programmed (BLE ,...,BLE ) are biased with a first voltage for inhibiting them from being programmed, typically the supply voltage (VDD), while the even (odd) bitlines that include cells to be programmed are grounded. Successively, the adjacent odd (even) bitlines (BLO ,...,BLO ) are biased at the supply voltage (VDD) or at an auxiliary voltage, for boosting the bias voltage of the even (odd) bitlines above the supply voltage. With this expedient, the bias voltage of the even (odd) bitlines that include cells not to be programmed is boosted because of the relevant parasitic coupling capacitances between adjacent bitlines. Therefore, no dedicated charge pump generator is needed.
Abstract:
A multilevel flash memory device of enhanced performance allows for a faster and more effective configuration of the operating parameters of the memory device, for performing the different functioning algorithms of the memory in the most efficient manner as possible. The identification of an optimal configuration of the operating parameters of the memory device during testing is simplified by allowing for a one-time processing of configuration bits into "algorithm-friendly" data that are stored in a purposely embedded ancillary random access memory at every power-on of the memory device by executing a specific power-on algorithm code stored in the ancillary read only memory of the embedded microprocessor. The ancillary random access memory capable of storing processed configuration data permits a further simplification and quickening of the trimming operations of the device that are performed during the testing phase of the single device being fabricated, by supporting a enhanced emulation of the many possible configurations and selectable test parameters for identifying optimal configuration and corresponding operating parameters of the memory device, before eventually conditioning (e.g. burning) the corresponding configuration fuses of the fabricated memory device.