Abstract:
Compensation power electronic device (30) integrated on a semiconductor substrate (100) of a first type of conductivity comprising a plurality of elemental units, each elemental unit comprising:
a body region (40) of a second type of conductivity realised on a semiconductor layer (20) of the first type of conductivity formed on the semiconductor substrate (100), a column region (50) of the second type of conductivity realised in said semiconductor layer (20) below the body region (40),
wherein the semiconductor layer (20) comprises a plurality of semiconductor layers (21,22,23,24), overlapped on each other, wherein the resistivity of each layer is different from that of the other layers and in that said column region (50) comprises a plurality of doped sub-regions (51,52,53,54), each realised in one of said semiconductor layers (21,22,23,24), wherein the dopant concentration of each doped sub-region (51,52,53,54) is such as to realise a balance between the total amount of charge of a first conductivity type and of a second conductivity type in each couple of layers and subregions.