公开(公告)号：US20160124302A1

公开(公告)日：2016-05-05

申请号：US14531842

申请日：2014-11-03

Applicant: Texas Instruments Incorporated

Inventor： Patrick I. Oden ,  James C. Baker ,  Sandra Zheng ,  William C. McDonald ,  Lance W. Barron

IPC: G03F7/00

CPC classification number: G02B26/0841 ,  B81B3/00

Abstract: A method of forming a micro-electromechanical systems (MEMS) pixel, such as a DMD type pixel, by forming a substrate having a non-planar upper surface, and depositing a photoresist spacer layer upon the substrate. The spacer layer is exposed to a grey-scale lithographic mask to shape an upper surface of the spacer layer. A control member is formed upon the planarized spacer layer, and an image member is formed over the control member. The image member is configured to be positioned as a function of the control member to form a spatial light modulator (SLM). The spacer layer is planarized by masking a selected portion of the spacer layer with a grey-scale lithographic mask to remove binge in the selected portion.

Abstract translation: 通过形成具有非平面上表面的衬底以及在衬底上沉积光致抗蚀剂间隔层，形成诸如DMD型像素的微机电系统（MEMS）像素的方法。 将间隔层暴露于灰度级光刻掩模以形成间隔层的上表面。 在平坦化的间隔层上形成控制构件，并且在控制构件上形成图像构件。 图像构件被配置为根据控制构件定位以形成空间光调制器（SLM）。 通过用灰度光刻掩模掩蔽间隔层的选定部分来平坦化间隔层，以去除所选部分中的杂环。

公开(公告)号：US20160071725A1

公开(公告)日：2016-03-10

申请号：US14481813

申请日：2014-09-09

Applicant: Texas Instruments Incorporated

Inventor： Sandra Zheng ,  Mark James Smiley ,  Douglas Jay Levack ,  Ronald Dean Powell

IPC: H01L21/02

CPC classification number: H01L21/02282 ,  C23C18/00 ,  H01L21/02118 ,  H01L21/0273

Abstract: A method, which forms an air-bubble-free thin film with a high-viscosity fluid resin, initially dispenses the fluid resin on an outer region of a semiconductor wafer while the semiconductor wafer is spinning, and then dispenses the fluid resin onto the center of the semiconductor wafer after the semiconductor wafer has stopped spinning.

Abstract translation: 利用高粘度流体树脂形成无气泡的薄膜的方法，首先在半导体晶片旋转的同时在半导体晶片的外部区域分配流体树脂，然后将流体树脂分配到中心 在半导体晶片停止旋转之后的半导体晶片。