公开(公告)号：JP2008226745A

公开(公告)日：2008-09-25

申请号：JP2007066075

申请日：2007-03-15

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： GAMO YASUNORI ,  TSUCHIYA ISAMU

IPC: H01J29/28 ,  H01J9/22 ,  H01J31/12

Abstract: PROBLEM TO BE SOLVED: To form a fluorescent screen having a smooth metal back layer excelling in reflectivity to improve luminance of an image display device. SOLUTION: In this fluorescent screen with a metal back, voids of 1-10 μm are formed between a metal film and a phosphor layer constituting the metal back layer. The fluorescent surface with a metal back can be provided by forming a light absorption layer thicker than the phosphor layer, and forming the metal film tightly on the upper surface of the light absorption layer through a smooth resin layer. The voids can be formed by forming a resistance adjustment layer formed of heat-resistant inorganic fine particles on the light absorption layer, and forming the metal film tightly on the upper surface of the resistance adjustment layer through the smooth resin layer. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：形成具有优异的反射率的光滑金属背层的荧光屏，以提高图像显示装置的亮度。 解决方案：在具有金属背的荧光屏中，在金属膜和构成金属背层的荧光体层之间形成1-10μm的空隙。 具有金属背的荧光表面可以通过形成比荧光体层厚的光吸收层，并通过光滑的树脂层紧密地在光吸收层的上表面上形成金属膜来提供。 可以通过在光吸收层上形成由耐热无机细颗粒形成的电阻调节层，并且通过光滑树脂层在电阻调节层的上表面上紧密地形成金属膜来形成空隙。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007234230A

公开(公告)日：2007-09-13

申请号：JP2006050568

申请日：2006-02-27

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： HIRAHARA SACHIKO ,  KAWAMURA NOBUO ,  GAMO YASUNORI ,  NAKAMURA AKIYOSHI ,  KASE MASAYUKI

IPC: H01J31/12 ,  H01J29/32 ,  H01J29/86

CPC classification number: H01J29/86 ,  H01J2329/00

Abstract: PROBLEM TO BE SOLVED: To provide a flat panel display device that has excellent display quality by improving luminance without affecting a service lifetime of a phosphor, and to provide its manufacturing method.
SOLUTION: An image display device has a first substrate 11 in which phosphor layers R are formed on the inner face, a second substrate arranged oppositely to the first substrate while being spaced apart at a prescribed interval and provided with a plurality of electron emission sources for exciting the phosphor layers, and a spacer provided between the first/second substrates. The first substrate is composed so that at least the surface of a part where the phosphor layers are formed is formed into a concavoconvex shape, and its surface roughness is set in the range from Ra 0.3 μm to 10 μm.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决的问题：提供一种通过提高亮度而不影响荧光体的使用寿命而具有优异显示质量的平板显示装置，并提供其制造方法。 解决方案：图像显示装置具有第一基板11，其中在内表面上形成有荧光体层R，第二基板以与规定间隔隔开的方式与第一基板相对布置并且设置有多个电子 用于激发荧光体层的发射源和设置在第一/第二基板之间的间隔物。 第一基板被构成为至少使形成有荧光体层的部分的表面形成为凹凸形状，其表面粗糙度设定在Ra0.3μm〜10μm的范围内。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006093024A

公开(公告)日：2006-04-06

申请号：JP2004280073

申请日：2004-09-27

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： TANAKA HAJIME ,  ITO TAKEO ,  GAMO YASUNORI

IPC: H01J31/12 ,  H01J9/22 ,  H01J9/227 ,  H01J29/28 ,  H01J29/32

CPC classification number: H01J9/20 ,  H01J29/085 ,  H01J31/127

Abstract: PROBLEM TO BE SOLVED: To provide an image display device capable of suppressing the peak value of a discharge current even if discharge occurs between an electron source side and a phosphor screen side and of achieving high productivity, and to provide a manufacturing method for the image display device.
SOLUTION: A field emission display (FED) 1 of this invention has a phosphor screen 31 on which phosphor layers 32, 33, 34 are arranged in a predetermined order, the phosphor layers 32, 33, 34 having a metal back layer 37 that is electrically non-continuous because of irregularities formed due to manifestation of the particle shape of the phosphor or partial removal of a smoothing layer 36.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供即使在电子源侧和荧光屏侧发生放电并且实现高生产率的能够抑制放电电流的峰值的图像显示装置，并且提供制造方法 用于图像显示装置。 解决方案：本发明的场发射显示器（FED）1具有荧光屏31，荧光体层32,33,34以预定顺序布置在其上，具有金属背层的荧光体层32,33,34 37由于荧光体的颗粒形状的显现或部分去除平滑层36而形成的不规则性是电不连续的。（C）2006年，JPO＆NCIPI

公开(公告)号：JP2004303682A

公开(公告)日：2004-10-28

申请号：JP2003097853

申请日：2003-04-01

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： YOSHII MASAYUKI ,  ITO TAKEO ,  TANAKA HAJIME ,  GAMO YASUNORI ,  INAMURA MASAAKI ,  NAKAZAWA TOMOKO

IPC: H01J9/22 ,  H01J1/30 ,  H01J29/28

CPC classification number: H01J9/221 ,  H01J29/28

Abstract: PROBLEM TO BE SOLVED: To provide a fluorescent face with a metal back with excellent adhesiveness of a fluorescent material layer and a metal back layer and dielectric characteristics which can be form with a superior yield.
SOLUTION: A forming method of the fluorescent face with the metal back is provided with a process to form the fluorescent material layer in the inner face of a face plate, a transcription process to strip off a base film after arranging a transcription film on the base film so that a metallic film contacts with the fluorescent material layer through an adhesive layer, and adhering it by heating and pressing it by a transcription roller, and a press treatment process to heat and press the metal film transcribed on the fluorescent body layer by means of the press roller. The temperature of the pressing part of the transcription roller and the press roller are made to be 150 to 240°C, and a pressing speed is made to be 1.0 to 6.0 m/min.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2003178672A

公开(公告)日：2003-06-27

申请号：JP2001375571

申请日：2001-12-10

Applicant: TOSHIBA CORP

Inventor： GAMO YASUNORI

IPC: G03F7/09 ,  H01J9/14

Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing a shadow mask capable of manufacturing a high quality shadow mask by eliminating nonuniform quality of a photosensitive film, film thickness variation of the photosensitive film, generating in the manufacture, and in addition nonuniform failure, hole defects, and pore size failure, of the shadow mask. SOLUTION: The shadow mask is manufactured in such a way that the photosensitive film is applied to both sides of a long metal thin plate, the photosensitive film is exposed through a mask pattern to form a pattern corresponding to apertures of the shadow mask, the pattern parts are etched to form the apertures, and this manufacturing method comprises a process measuring an wetting index of a plurality of long metal thin plates and grouping the long metal thin plates every specified range of the wetting index, and a process putting the grouped long metal thin plates for the shadow mask every long metal thin plate belonging to the same group in a production line. COPYRIGHT: (C)2003,JPO

公开(公告)号：JPH07220627A

公开(公告)日：1995-08-18

申请号：JP1389194

申请日：1994-02-08

Applicant: TOSHIBA CORP

Inventor： KOIKE NORIO ,  TSUKAGOSHI HATSUO ,  GAMO YASUNORI

IPC: H01J9/14

Abstract: PURPOSE:To remove uneven aperture by defects micro dispersion of hole diameter so as to improve yield rate, regarding shadow masks on which electron beam passage holes are arranged with high accuracy with at minute pitches, by adding a specified sensitizer to a photosensitive agent. CONSTITUTION:A photosensitive film 21 is formed by applying a photosensitive agent, which has photosensitive resin and a cross linking agent as its main ingredients, on the board face of a shadow mask blank 20, and drying it. A resist film is formed by baking a specified pattern onto this photosensitive film 21, and developing it, and then and electron beam passage hole is formed etching it. At that time, a photosensitive agent is used, in which a sensitizer which has the peaks of transmissivity at 360+ or -10nm and 400+ or -10nm and the transmissivity of 450nm of which is one-fifth or less this peak value is added by 30-160wt.% to the above cross linking agent (ammonium dichromate. Uranium (curve 29) may be preferably used as the above sensitizer.