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    Deposition Apparatus and Methods
    11.
    发明申请
    Deposition Apparatus and Methods 审中-公开

    公开(公告)号：US20190352768A1

    公开(公告)日：2019-11-21

    申请号：US16527250

    申请日：2019-07-31

    Applicant: United Technologies Corporation

    Inventor： Brian T. Hazel ,  Michael J. Maloney ,  James W. Neal ,  David A. Litton

    IPC: C23C14/30 ,  C23C14/24 ,  C23C14/22 ,  C23C14/50

    Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.

    THERMAL BARRIER COATING WITH REDUCED STABILIZER CONTENT
    14.
    发明申请
    THERMAL BARRIER COATING WITH REDUCED STABILIZER CONTENT 审中-公开

    公开(公告)号：US20200340100A1

    公开(公告)日：2020-10-29

    申请号：US16392003

    申请日：2019-04-23

    Applicant: United Technologies Corporation

    Inventor： Kaylan M. Wessels ,  Brian T. Hazel ,  Michael J. Maloney ,  David A. Litton ,  Elisa M. Zaleski

    IPC: C23C14/30 ,  C23C14/08

    Abstract: In accordance with the present disclosure, there is provided a process for limiting a critical stabilizer content in coatings comprising placing a source coating material in a crucible of a vapor deposition apparatus having a coating chamber, the source coating material having compositional range of LnO1.5 comprising a single cation mol % of 30-50% relative to zirconia (ZrO2), where Ln=La, Pr, Nd, Sm, Eu, Gd, and Tb and combinations thereof; energizing the source coating material with an electron beam that delivers a power density to the material in the crucible forming a vapor cloud from the source coating material; and depositing the source coating material as a coating system onto a surface of a work piece.

    FIXTURE FOR VAPOR DEPOSITION SYSTEM
    15.
    发明申请
    FIXTURE FOR VAPOR DEPOSITION SYSTEM 审中-公开

    公开(公告)号：US20200227234A1

    公开(公告)日：2020-07-16

    申请号：US16836337

    申请日：2020-03-31

    Applicant: United Technologies Corporation

    Inventor： James W. Neal ,  Michael J. Maloney ,  Kevin W. Schlichting ,  David A. Litton

    IPC: H01J37/30 ,  G01K1/14 ,  G01K7/02 ,  G01K13/08 ,  C23C14/50 ,  C23C14/24 ,  C23C14/54 ,  G01N25/00 ,  H01J37/317

    Abstract: A vapor deposition system fixture comprises an arm, a rake, a crown gear bearing assembly, a workpiece holder, a thermocouple, and a contact ring assembly. The crown gear bearing assembly is attached to and rotatably engaged with the rake and includes stationary portion and rotating portions. The workpiece holder is configured to rotate with the rotating portion. The thermocouple is configured to rotate with the workpiece holder. The contact ring assembly comprises a housing, a cover, first and second rotating contact rings, and first and second stationary contact rings. The housing is attached to at least one of the arm and the rake. The first and second rotating contact rings are electrically connected to the thermocouple. The first and second stationary contact rings surround the rotating ring. The first and second stationary contact rings are configured to receive an electrical signal from the first and second rotating contact rings.

    Deposition apparatus and methods
    16.
    发明授权
    Deposition apparatus and methods 有权

    公开(公告)号：US10385444B2

    公开(公告)日：2019-08-20

    申请号：US14774489

    申请日：2014-03-14

    Applicant: United Technologies Corporation

    Inventor： Brian T. Hazel ,  Michael J. Maloney ,  James W. Neal ,  David A. Litton

    IPC: C23C14/30 ,  C23C14/22 ,  C23C14/24 ,  C23C14/50

    Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.

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