COMPOSITE PATTERNING DEVICES FOR SOFT LITHOGRAPHY
    11.
    发明申请
    COMPOSITE PATTERNING DEVICES FOR SOFT LITHOGRAPHY 审中-公开
    用于软平铺的复合图案设备

    公开(公告)号:WO2005104756A3

    公开(公告)日:2009-04-02

    申请号:PCT/US2005014449

    申请日:2005-04-27

    Abstract: The present invention provides methods, devices and device components for fabricating patterns on substrate surfaces, particularly patterns comprising structures having microsized and/or nanosized features of selected lengths in one, two or three dimensions. The present invention provides composite patterning devices comprising a plurality of polymer layers each having selected mechanical properties, such as Young's Modulus and flexural rigidity, selected physical dimensions, such as thickness, surface area and relief pattern dimensions, and selected thermal properties, such as coefficients of thermal expansion, to provide high resolution patterning on a variety of substrate surfaces and surface morphologies.

    Abstract translation: 本发明提供用于在衬底表面上制造图案的方法,装置和器件组件,特别是包括具有一维,二维或三维尺寸选定长度的微小尺寸和/或纳米尺寸特征的结构的图案。 本发明提供了包括多个聚合物层的复合图案形成装置,每个聚合物层各自具有选择的机械性质,例如杨氏模量和弯曲刚度,所选择的物理尺寸,例如厚度,表面积和浮雕图案尺寸,以及选定的热性能,例如系数 的热膨胀,以在各种基底表面和表面形态上提供高分辨率图案。

    METHODS AND DEVICES FOR FABRICATING THREE-DIMENSIONAL NANOSCALE STRUCTURES
    13.
    发明申请
    METHODS AND DEVICES FOR FABRICATING THREE-DIMENSIONAL NANOSCALE STRUCTURES 审中-公开
    用于制造三维纳米结构的方法和装置

    公开(公告)号:WO2005054119A2

    公开(公告)日:2005-06-16

    申请号:PCT/US2004040192

    申请日:2004-12-01

    Abstract: The present invention provides methods and devices for fabricating 3D structures and patterns of 3D structures on substrate surfaces, including symmetrical and asymmetrical patterns of 3D structures. Methods of the present invention provide a means of fabricating 3D structures having accurately selected physical dimensions, including lateral and vertical dimensions ranging from 10s of nanometers to 1000s of nanometers. In one aspect, methods are provided using a mask element comprising a conformable, elastomeric phase mask capable of establishing conformal contact with a radiation sensitive material undergoing photoprocessing. In another aspect, the temporal and/or spatial coherence of electromagnetic radiation using for photoprocessing is selected to fabricate complex structures having nanoscale features that do not extend entirely through the thickness of the structure fabricated.

    Abstract translation: 本发明提供用于在衬底表面上制造3D结构和3D结构图案的方法和设备,包括3D结构的对称和不对称图案。 本发明的方法提供了制造具有精确选择的物理尺寸的3D结构的手段,包括范围从10纳米到1000纳米的横向和垂直尺寸。 在一个方面,提供了使用掩模元件的方法,所述掩模元件包括能够与经受光处理的辐射敏感材料建立共形接触的适形的弹性体相位掩模。 在另一方面,选择用于光学处理的电磁辐射的时间和/或空间相干性以制造具有纳米级特征的复杂结构,所述纳米级特征不完全延伸穿过所制造的结构的厚度。

    MULTISPECTRAL PLASMONIC CRYSTAL SENSORS
    17.
    发明申请
    MULTISPECTRAL PLASMONIC CRYSTAL SENSORS 审中-公开
    多光谱PLASMONIC晶体传感器

    公开(公告)号:WO2008030666A3

    公开(公告)日:2008-10-09

    申请号:PCT/US2007074293

    申请日:2007-07-25

    CPC classification number: G01N21/554

    Abstract: The present invention provides plasmonic crystals comprising three-dimensional and quasi comprising three-dimensional distributions of metallic or semiconducting films, including multi-layered crystal structures comprising nanostructured films and film arrays. Plasmonic crystals of the present invention include precisely registered and deterministically selected nonplanar crystal geometries and spatial distributions providing highly coupled, localized plasmonic responses in thin film elements and/or nanostructures of the crystal. Coupling of plasmonic responses provided by three-dimensional and quasi-three dimensional plasmonic crystal geometries and structures of the present invention generates enhanced local plasmonic field distributions useful for detecting small changes in the composition of an external dielectric environment proximate to a sensing surface of the plasmonic crystal. Plasmonic crystal structures of the present invention are also useful for providing highly localized excitation and/or imaging of fluorophores proximate to the crystal surface.

    Abstract translation: 本发明提供包含三维和准包含金属或半导体膜的三维分布的等离子体激元晶体,包括包含纳米结构膜和膜阵列的多层晶体结构。 本发明的等离子体激元晶体包括精确配准和确定性选择的非平面晶体几何形状和空间分布,在晶体的薄膜元件和/或纳米结构中提供高度耦合的,局部等离子体激元响应。 由本发明的三维和准三维等离子体晶体几何形状和结构提供的等离子体激元响应的耦合产生增强的局部等离子体激元场分布,其可用于检测靠近等离子体激元的感测表面的外部电介质环境的组成的微小变化 水晶。 本发明的等离激元晶体结构也可用于提供靠近晶体表面的荧光团的高度局部激发和/或成像。

    DEVICES AND METHODS FOR PATTERN GENERATION BY INK LITHOGRAPHY
    18.
    发明申请
    DEVICES AND METHODS FOR PATTERN GENERATION BY INK LITHOGRAPHY 审中-公开
    用于通过油墨光刻产生图案的装置和方法

    公开(公告)号:WO2008055054A2

    公开(公告)日:2008-05-08

    申请号:PCT/US2007082633

    申请日:2007-10-26

    CPC classification number: G03F7/0002 B82Y10/00 B82Y40/00 G03F1/50 H01L51/0017

    Abstract: The present invention provides methods, devices and device components for fabricating patterns on substrate surfaces, particularly patterns comprising structures having microsized and/or nanosized features of selected lengths in one, two or three dimensions and including relief and recess features with variable height, depth or height and depth. Composite patterning devices comprising a plurality of polymer layers each having selected mechanical and thermal properties and physical dimensions provide high resolution patterning on a variety of substrate surfaces and surface morphologies. Gray-scale ink lithography photomasks for gray-scale pattern generation or molds for generating embossed relief features on a substrate surface are provided. The particular shape of the fabricated patterned can be manipulated by varying the three-dimensional recess pattern on an elastomeric patterning device which is brought into conformal contact with a substrate to localize patterning agent to the recess portion of the pattern.

    Abstract translation: 本发明提供用于在衬底表面上制造图案的方法,装置和设备部件,具体地说图案包括具有在一维,二维或三维中具有选定长度的微细化和/或纳米化特征的结构,并包括具有可变高度,深度或 高度和深度。 包含多个聚合物层的复合图案形成装置各自具有选定的机械和热性能以及物理尺寸,从而在各种衬底表面和表面形态上提供高分辨率图案。 提供用于灰度图案生成的灰度油墨光刻光掩模或用于在衬底表面上产生浮雕浮雕特征的模具。 所制造的图案的特定形状可以通过改变弹性图案形成装置上的三维凹陷图案来操纵,所述弹性图案形成装置与衬底保形接触以将图案形成剂定位到图案的凹陷部分。

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