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    뉴트럴라이저 형태의 고주파 전자 소스
    12.
    发明授权
    뉴트럴라이저 형태의 고주파 전자 소스 有权
    뉴트럴라이저형태的고주파전자소스

    公开(公告)号：KR100876052B1

    公开(公告)日：2008-12-26

    申请号：KR1020030021789

    申请日：2003-04-08

    Applicant: 에어버스 데에스 게엠베하

    Inventor： 샤트너,칼-하인즈 ,  로엡,호르스트 ,  라이터,한스-쥬르겐 ,  하르만,한스-피터

    IPC: H01J27/16

    CPC classification number: H01J3/025

    Abstract: The high frequency electron source has a discharge chamber (11) with at least one gas inlet (14) for a gas to be ionized and at least one extraction opening (16) for electrons. The discharge chamber is at least partly enclosed by at least one electrode (12a) and a keeper electrode (12b) and a high frequency field is applied between the electrodes. The discharge chamber can be enclosed by a plasma chamber.

    Abstract translation: 高频电子源具有放电室（11），其具有至少一个用于待离子化的气体的气体入口（14）和至少一个用于电子的抽取开口（16）。 放电室至少部分地由至少一个电极（12a）和保持电极（12b）包围，并且在电极之间施加高频场。 放电室可以被等离子体室封闭。

    LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICATIONS OF ELECTRON SOURCES
    13.
    发明申请
    LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICATIONS OF ELECTRON SOURCES 审中-公开
    线性电子源，使用线性电子源的蒸发器，以及电子源的应用

    公开(公告)号：WO2009080411A1

    公开(公告)日：2009-07-02

    申请号：PCT/EP2008/065703

    申请日：2008-11-17

    Applicant: APPLIED MATERIALS, INC. ,  KLEMM, Guenter ,  HACKER, Volker ,  LOTZ, Hans-Georg

    Inventor： KLEMM, Guenter ,  HACKER, Volker ,  LOTZ, Hans-Georg

    IPC: H01J3/02 ,  H01J37/077 ,  H01J37/305 ,  C23C14/30 ,  G21K5/04 ,  B32B37/00 ,  H01J1/32

    CPC classification number: H01J37/077 ,  H01J3/025 ,  H01J37/3053

    Abstract: A linear plasma electron source (100) is provided. The linear plasma electron source includes a housing (112) acting as a first electrode, the housing having side walls (312), a slit opening (114) in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode (110) being arranged within the housing and having a first side (413) facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply (70) for providing a gas into the housing.

    Abstract translation: 提供线性等离子体电子源（100）。 线性等离子体电子源包括用作第一电极的壳体（112），壳体具有侧壁（312），壳体中用于侵入电子束的狭缝开口（114），狭缝开口限定长度方向 所述源极，第二电极（110）布置在所述壳体内并且具有面向所述狭缝开口的第一侧面（413），所述第一侧面与所述狭缝开口间隔开第一距离，其中所述电子源的长度在 长度方向为第一距离的至少5倍，以及用于将气体提供到壳体中的至少一个气体供应源（70）。

    A PLASMA EMITTER AND METHODS UTILIZING THE SAME
    14.
    发明申请
    A PLASMA EMITTER AND METHODS UTILIZING THE SAME 审中-公开
    一种等离子体发射器及其使用方法

    公开(公告)号：WO2007023489A1

    公开(公告)日：2007-03-01

    申请号：PCT/IL2006/000957

    申请日：2006-08-17

    Applicant: PORAT, Zvi

    Inventor： PORAT, Zvi

    IPC: H01J37/32 ,  H01J27/14

    CPC classification number: H01J37/32055 ,  H01J3/025

    Abstract: The present invention discloses in cathodic arc plasma, a system of obtaining a high current emission of hot electrons having temperature equivalent to 10 eV to 15 eV, by an Arc Plasma Emitter and method utilizing the same. The system is especially adapted for polishing gemstone, and growing a 3D crystal by the same.

    Abstract translation: 本发明公开了一种通过电弧等离子体发射器获得具有相当于10eV至15eV的温度的热电子的高电流发射的系统，该方法利用该等离子体等离子体。 该系统特别适用于抛光宝石，并通过其生长3D晶体。

    ELECTRON BEAM TREATMENT APPARATUS
    15.
    发明申请
    ELECTRON BEAM TREATMENT APPARATUS 审中-公开
    电子束处理装置

    公开(公告)号：WO2005043599A2

    公开(公告)日：2005-05-12

    申请号：PCT/US2004/036406

    申请日：2004-10-29

    Applicant: APPLIED MATERIALS, INC. ,  DEMOS, Alexander, T. ,  PONNEKANTI, Hari, K. ,  ZHAO, Jun ,  ARMER, Helen, R.

    Inventor： DEMOS, Alexander, T. ,  PONNEKANTI, Hari, K. ,  ZHAO, Jun ,  ARMER, Helen, R.

    IPC: H01L

    CPC classification number: H01J37/317 ,  H01J3/025 ,  H01J37/077

    Abstract: One embodiment of the present invention is an electron beam treatment apparatus that includes: (a) a chamber; (b) a cathode having a surface of relatively large area that is exposed to an inside of the chamber; (c) an anode having holes therein that is disposed inside the chamber and spaced apart from the cathode by a working distance; (d) a wafer holder disposed inside the chamber facing the anode; (e) a source of negative voltage whose output is applied to the cathode to provide a cathode voltage; (f) a source of voltage whose output is applied to the anode; (g) a gas inlet adapted to admit gas into the chamber at an introduction rate; and (h) a pump adapted to exhaust gas from the chamber at an exhaust rate, the introduction rate and the exhaust rate providing a gas pressure in the chamber; wherein values of cathode voltage, gas pressure, and the working distance are such that there is no arcing between the cathode and anode and the working distance is greater than an electron mean free path.

    Abstract translation: 本发明的一个实施例是一种电子束处理装置，包括：（a）室; （b）具有暴露于所述室内部的相对较大面积的表面的阴极; （c）其中具有孔的阳极，其设置在室内并与阴极间隔开工作距离; （d）设置在面向阳极的腔室内的晶片保持器; （e）负电压源，其输出被施加到阴极以提供阴极电压; （f）其输出端施加到阳极的电压源; （g）气体入口，其适于以引入速率将气体进入腔室; 以及（h）适于以排气速度从所述室排出气体的泵，所述引入速率和排气速率在所述室中提供气体压力; 其中阴极电压，气体压力和工作距离的值使得阴极和阳极之间没有电弧，并且工作距离大于电子平均自由程。

    HIGH ELECTRIC FIELD, HIGH PRESSURE LIGHT SOURCE
    16.
    发明申请
    HIGH ELECTRIC FIELD, HIGH PRESSURE LIGHT SOURCE 审中-公开
    高电场，高压光源

    公开(公告)号：WO01011737A1

    公开(公告)日：2001-02-15

    申请号：PCT/US2000/021760

    申请日：2000-08-09

    IPC: G03F7/20 ,  H01J3/02 ,  H01J61/16 ,  H01J61/64 ,  H01J63/02 ,  H01J63/08 ,  H04R25/00 ,  H05G2/00 ,  H01S3/097

    CPC classification number: H01J63/08 ,  G03F7/70016 ,  H01J3/025 ,  H01J61/16 ,  H01J61/64 ,  H01J63/02 ,  H04R25/502 ,  H05G2/003

    Abstract: A method of generating light comprising the step of applying an electric field to an excimer-forming gas such as a gas mixture containing noble gases and hydrogen or halogen, and providing free electrons in the gas. The electric field is configured to accelerate electrons to at least the energy required to form excimers, but in at least one region of the electric field, the field does not substantially ionize the gas, so that the field does not induce arcing through the gas. For example, electrons can be injected from one or more field emission electrodes (18) such as one or more a metal needle tip conductors, whereas the electric field can be a field between the field emission electrodes and a counterelectrode (13).

    Abstract translation: 一种产生光的方法，包括将电场施加到准分子形成气体，例如含有惰性气体和氢气或卤素的气体混合物，并在气体中提供自由电子的步骤。 电场被配置为将电子加速至至少形成极化器所需的能量，但是在电场的至少一个区域中，场基本上不离子化气体，使得场不会引起通过气体的电弧。 例如，电子可以从一个或多个场致发射电极（18）注入，例如一个或多个金属针尖导体，而电场可以是场发射电极和反电极（13）之间的场。

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