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    Method of producing anti-reflection film
    11.
    发明申请
    Method of producing anti-reflection film 失效
    防反射膜的制造方法

    公开(公告)号：US20040180138A1

    公开(公告)日：2004-09-16

    申请号：US10804073

    申请日：2004-03-19

    Applicant: BRIDGESTONE CORPORATION

    Inventor： Mitsuhiro Nishida ,  Yukihiro Kusano ,  Nobuko Kato

    IPC: B05D005/06

    CPC classification number: G02B1/115 ,  G02B1/116 ,  G02B1/16 ,  Y10T428/24942 ,  Y10T428/256 ,  Y10T428/259

    Abstract: A method of producing an anti-reflection film includes forming a first layer on a transparent substrate, forming a second layer on the first layer, and forming the third layer on the second layer. When an optical admittance Y at a surface of the second layer is represented by, 1 Y = H E = ( x + iy ) where i is the imaginary number unit, thicknesses and reflective indexes of the substrate, first layer, second layer, and third layer are selected so that x and y satisfy the following formula, 0.9xnull(n2nulln02)/2n0null2

    Abstract translation: 防反射膜的制造方法包括在透明基板上形成第一层，在第一层上形成第二层，在第二层上形成第三层。 当第二层表面的光导纳Y表示为， 1 MI> = （ x + iy ） MROW> 其中i是虚数单位，衬底的厚度和反射指数，第一层 选择第二层和第三层，使得x和y满足下式：0.9x {（n 2 -n0 2）/ 2n0} 2 <{X-（n 2 + n 0 其中n是第三层的折射率，n0是一个第二层的折射率，n0是一个 抗反射膜外侧的外部区域的折射率。

      Method for forming multilayer thin film and apparatus thereof
      12.
      发明申请
      Method for forming multilayer thin film and apparatus thereof 审中-公开
      多层薄膜的形成方法及其装置

      公开(公告)号：US20040159283A1

      公开(公告)日：2004-08-19

      申请号：US10450607

      申请日：2003-11-26

      Inventor： Jinpei Harada ,  Atsushi Onoma ,  Yukihiro Kawai

      IPC: C23C016/00 ,  B05D005/06 ,  B05D001/36

      CPC classification number: C23C14/547 ,  C23C14/24

      Abstract: The invention relates to a method for forming a multilayer thin film and an apparatus thereof, which are able to form a thin layer at an accuracy of 0.5 nanometers or less on at least a specified layer during formation on a substrate (W) and to increase the yield of multilayer thin film products. X-rays are irradiated from X-ray irradiating means (6) onto the surface of a multilayer thin film during formation on the substrate (W) at angles from 0 to 1.5 degrees, and the obtained reflected X-rays are measured by X-ray measuring means (7) while varying the incident angle null, wherein reflectivity curve depicting the intensities of the reflected X-rays are obtained with respect to the scattering angle 2null, and the reflectivity curve, whose scattering angles exist in a range of 0 to 1 degree, of the reflectivity curve is analyzed. Herein, the thickness of a thin layer during formation is estimated, and a thin layer having a prescribed thickness is formed by controlling the thickness of a layer during formation, utilizing the estimated results.

      Abstract translation: 本发明涉及一种用于形成多层薄膜的方法及其装置，其能够在基板（W）上形成期间至少在特定层上形成0.5纳米或更小的精度的薄层并增加 多层薄膜产品的产量。 X射线从X射线照射装置（6）照射到基板（W）上形成的多层薄膜的表面上，角度为0〜1.5度，所得到的反射X射线用X- 射线测量装置（7），同时改变入射角θ，其中针对散射角2θ获得描绘反射X射线强度的反射率曲线，其反射率曲线的散射角存在于0至 1度，反映曲线进行分析。 这里，估计在形成期间的薄层的厚度，并且利用估计的结果，通过在形成期间控制层的厚度来形成具有规定厚度的薄层。

      UV-reflective interference layer system
      13.
      发明申请
      UV-reflective interference layer system 有权
      UV反射干涉层系统

      公开(公告)号：US20040156984A1

      公开(公告)日：2004-08-12

      申请号：US10775010

      申请日：2004-02-09

      Applicant: Schott Spezialglas GmbH

      Inventor： Bruno Vitt ,  Juergen Blankenburg ,  Werner J. Behr ,  Karl-Heinz Dasecke ,  Birgit Lintner

      IPC: B05D005/06 ,  B05D001/36

      CPC classification number: G02B5/283 ,  C03C17/3417

      Abstract: There is provided a UV-reflective interference layer system for transparent substrates with broadband anti-reflection properties in the visible wavelength range. The interference layer system includes at least four individual layers. Successive layers have different refractive indices and the individual layers contain UV and temperature-stable inorganic materials.

      Abstract translation: 在可见光波长范围内提供具有宽带抗反射特性的透明基板的UV反射干涉层系统。 干涉层系统包括至少四个单独的层。 连续层具有不同的折射率，各层含有UV和温度稳定的无机材料。

      Durable nano-structured optical surface
      14.
      发明申请
      Durable nano-structured optical surface 失效
      耐用的纳米结构光学表面

      公开(公告)号：US20040137221A1

      公开(公告)日：2004-07-15

      申请号：US10746070

      申请日：2003-12-24

      Inventor： Eitan Zeira ,  Lee Batchelder ,  Louis M. Scarmoutzos

      IPC: B32B009/00 ,  B05D005/06

      CPC classification number: G02B1/14 ,  G02B1/105 ,  G02B1/111 ,  G02B1/118 ,  Y10T428/261

      Abstract: The durability and abrasion resistance of nano-structured optical surfaces, particularly those formed of or on polymeric substrate, are enhanced by at least one of adhering to it a fluorinated carbon molecule or other reactive lube composition as a monolayer coating (or a thin and substantially uniform multi-layer coating) and by treatment with a surface-active cross-linking agent.

      Abstract translation: 纳米结构光学表面的耐久性和耐磨性，特别是由聚合物基材形成的或在聚合物基材上形成的耐久性和耐磨性通过将氟化碳分子或其它反应性润滑组合物粘附到单层涂层（或薄而基本上 均匀的多层涂层）和通过用表面活性交联剂处理。

      Method and an arrangement for preparation of optical fibers
      15.
      发明申请
      Method and an arrangement for preparation of optical fibers 有权
      光纤的制备方法和布置

      公开(公告)号：US20040109941A1

      公开(公告)日：2004-06-10

      申请号：US10470933

      申请日：2004-01-27

      Inventor： Magnus Larsson ,  Jan-Ake Engstrand

      IPC: B05D005/06 ,  B05D001/18

      CPC classification number: G02B6/241 ,  C03C25/16

      Abstract: The invention relates to a method and an arrangement for applying a coating on an end of an optical fiber by dipping said end into a unsolidified coating liquid. In a first sequence, the fiber end is moved towards the surface (18) of the liquid by a gripping means (11). The distance between the end face (26) of the fiber and the surface of the liquid is measured continuously by measuring means including a vision camera (23). The measured actual distance value is compared with a preset distance value and the first moving sequence is ended when the actual distance value is equal to the preset value. In a second sequence, the fiber end is dipped a predetermined depth in the liquid.

      Abstract translation: 本发明涉及一种通过将所述端部浸入未固化的涂覆液体中将涂层涂覆在光纤端部上的方法和装置。 在第一序列中，纤维端通过夹持装置（11）朝向液体的表面（18）移动。 通过包括视觉摄像机（23）的测量装置连续测量纤维的端面（26）与液体的表面之间的距离。 将测量的实际距离值与预设距离值进行比较，并且当实际距离值等于预设值时，第一移动序列结束。 在第二个顺序中，将纤维端浸入液体中预定的深度。

      Dip coating process for optical elements
      18.
      发明申请
      Dip coating process for optical elements 有权
      光学元件的浸涂工艺

      公开(公告)号：US20040096577A1

      公开(公告)日：2004-05-20

      申请号：US10632415

      申请日：2003-07-31

      Applicant: Vision-Ease Lens, Inc.

      Inventor： Tuyethoa T. Trinh ,  Mohamed-Shahih Smihi ,  Luben Koev ,  Richard E. Zielinski

      IPC: B05D001/18 ,  G02C007/02 ,  B05D005/06

      CPC classification number: G02B1/10 ,  B05D1/18 ,  G02B1/14

      Abstract: A dip coating process is disclosed that provides a coating on the surfaces of an optical element with more consistent coating thickness. The objectives of this invention are accomplished by holding the coated optical element so that a meniscus is created between the element and the surface of the coating solution. At such a position, the capillary force generated by the touching meniscus helps drain down excessive coating at the bottom of the substrate to quickly yield a consistent coating thickness over the coated surface.

      Abstract translation: 公开了一种浸涂工艺，其在光学元件的表面上提供具有更一致的涂层厚度的涂层。 通过保持涂覆的光学元件使得在元件和涂层溶液的表面之间产生弯液面来实现本发明的目的。 在这样的位置，由触摸的弯液面产生的毛细管力有助于排出基底底部的过度涂层，以在涂层表面上快速产生一致的涂层厚度。

      Method for applying a coating to an optical substrate by thermal vaporization of an organosilicon compound using a non-sintered porous inorganic oxide matrix material
      19.
      发明申请
      Method for applying a coating to an optical substrate by thermal vaporization of an organosilicon compound using a non-sintered porous inorganic oxide matrix material 审中-公开
      使用非烧结多孔无机氧化物基质材料通过有机硅化合物的热蒸发将涂层施加到光学基材上的方法

      公开(公告)号：US20040076750A1

      公开(公告)日：2004-04-22

      申请号：US10278251

      申请日：2002-10-22

      Applicant: Vision-Ease Lens, Inc.

      Inventor： Michael S. Boulineau ,  Thomas J. Moravec

      IPC: C23C016/00 ,  B05D005/06

      CPC classification number: B05D1/60 ,  B05D5/083 ,  C09D4/00 ,  C23C14/06 ,  C08G77/24 ,  C08G77/00

      Abstract: A method provides high-vacuum vapor coating methods, with the methods producing novel coating compositions with surprisingly increased performance levels over coatings produced from the same materials under different processing conditions. Compounds of the general formulae II, III and IV, defined herein, can be applied by vapor deposition from a merely compacted, rather than fused or sintered porous matrix source with improved performance, even where the same chemicals are used in the coating, at the same coating temperatures. The generally useful materials include silanes and siloxanes, and siloxazanes of various formulae I, II, III and IV.

      Abstract translation: 一种方法提供高真空蒸气涂覆方法，与不同加工条件下由相同材料生产的涂料相比，该方法产生新颖的涂料组合物，其性能水平惊人地增加。 本文定义的通式II，III和IV的化合物可以通过气相沉积从具有改进性能的仅压实而不是熔融或烧结的多孔基质源进行气相沉积，即使在涂层中使用相同的化学物质时， 相同的涂层温度。 通常有用的材料包括硅烷和硅氧烷，以及各种式I，II，III和IV的硅氧烷。

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