Laser marking method
    11.
    发明申请
    Laser marking method 有权
    激光打标法

    公开(公告)号:US20040090521A1

    公开(公告)日:2004-05-13

    申请号:US10692737

    申请日:2003-10-27

    Abstract: In a marking device, by illuminating a laser beam onto an X-ray film which is a light-photosensitive heat-developing photosensitive material, an inner portion of a surface layer is melted, a cavity is formed, and a dot, which projects a surface out in a convex shape, is formed. At this time, an illumination time of the laser beam is controlled in order to control melting of the surface layer. In the marking device, when conveying of an X-ray film is stopped, oscillation of a laser oscillating tube is continued until a predetermined period of time elapses. When stoppage is for a short time, control is carried out such that marking can be started quickly.

    Abstract translation: 在标记装置中,通过将激光束照射到作为光敏感光显影感光材料的X射线胶片上,表面层的内部部分熔化,形成腔体,并且点状突起 形成为凸出的表面。 此时,控制激光束的照明时间,以控制表面层的熔融。 在标记装置中,当X射线胶片的输送停止时,激光振荡管的振荡持续直到经过预定的时间。 当停机很短时间时,进行控制,使得可以快速开始标记。

    CHARGED PARTICLE BEAM IRRADIATION APPARATUS
    12.
    发明申请
    CHARGED PARTICLE BEAM IRRADIATION APPARATUS 有权
    充电颗粒光束辐射装置

    公开(公告)号:US20030160189A1

    公开(公告)日:2003-08-28

    申请号:US10253488

    申请日:2002-09-25

    Inventor: Koji Matsuda

    CPC classification number: H05H13/04 A61N2005/1087 A61N2005/1095 G21K5/04

    Abstract: An charged particle beam irradiation apparatus is provided which increases the width in a depth direction of a Bragg peak to be formed, by means of a simple construction. The charged particle beam irradiation apparatus includes a charged particle beam generation device and an irradiation field forming device. The charged particle beam generation device has a front accelerator and a synchrotron. An ion beam is guided to the irradiation field forming device from the synchrotron. The irradiation field forming device has a beam enlarging device, a Bragg peak enlarging device and a ridge filter. A pair of filter elements which constitute the Bragg peak enlarging device have a plurality of stick-shaped portions spaced apart from one another. The filter elements are disposed with their respective stick-shaped portions partly superposed to extend in mutually different directions. An ion beam that has passed through the Bragg peak enlarging device contains three ion beam components having different energies produced according to the difference between passed positions of each of the filter elements, whereby the width of a Bragg peak formed in the body of a patient is increased.

    Abstract translation: 提供一种带电粒子束照射装置,其通过简单的结构增加要形成的布拉格峰的深度方向的宽度。 带电粒子束照射装置包括带电粒子束产生装置和照射场形成装置。 带电粒子束产生装置具有前加速器和同步加速器。 离子束从同步加速器引导到照射场形成装置。 照射场形成装置具有光束放大装置,布拉格峰扩大装置和脊形滤波器。 构成布拉格峰扩大装置的一对滤波器元件具有彼此间隔开的多个棒状部分。 过滤元件设置成其各自的棒状部分被部分地重叠以在相互不同的方向上延伸。 已经通过布拉格峰值放大装置的离子束包含根据每个滤光元件的通过位置之间的差产生的具有不同能量的三个离子束分量,由此形成在患者体内的布拉格峰的宽度为 增加。

    Method for forming a passivation layer for organic light-emitting devices
    13.
    发明申请
    Method for forming a passivation layer for organic light-emitting devices 审中-公开
    用于形成有机发光器件的钝化层的方法

    公开(公告)号:US20030030369A1

    公开(公告)日:2003-02-13

    申请号:US10212162

    申请日:2002-08-06

    CPC classification number: H01L51/5237 H01L27/3283 H01L51/5253

    Abstract: A method for fabricating an organic light-emitting device comprises in turn the steps of: providing a substrate; forming a first electrode corresponding to a light emission area; forming a stripe-shaped photoresist layer on the substrate having the first electrode wherein the photoresist layer is above the substrate having the first electrode; depositing an organic light-emitting medium layer on the first electrode in the exposed areas between the stripe-shaped photoresist layers to form a plurality of first electrode areas including the organic light-emitting medium layer on the first electrode; forming a second electrode on the organic light-emitting medium; forming a stress-relief layer on the second electrode wherein the stress-relief layer is a thin film of silicon oxynitride or polymer; and forming a passivation layer on the stress-relief layer wherein the passivation layer is an amorphous silicon, an inorganic nitride or an inorganic oxide.

    Abstract translation: 一种制造有机发光器件的方法又包括以下步骤:提供衬底; 形成对应于发光区域的第一电极; 在具有第一电极的基板上形成条状光致抗蚀剂层,其中光致抗蚀剂层位于具有第一电极的基板之上; 在所述条形光致抗蚀剂层之间的暴露区域中的第一电极上沉积有机发光介质层,以在所述第一电极上形成包括所述有机发光介质层的多个第一电极区域; 在有机发光介质上形成第二电极; 在所述第二电极上形成应力消除层,其中所述应力消除层是氮氧化硅或聚合物的薄膜; 以及在所述应力消除层上形成钝化层,其中所述钝化层是非晶硅,无机氮化物或无机氧化物。

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