公开(公告)号：US20040183033A1

公开(公告)日：2004-09-23

申请号：US10790178

申请日：2004-03-02

Inventor： Kunio Moriyama ,  Akihiko Maeda ,  Yoshikatsu Yasue ,  Takahide Nakayama

IPC: A61N005/10 ,  H01J033/00

CPC classification number: A61N5/1079 ,  A61N5/10 ,  A61N2005/1087

Abstract: A particle beam therapy system transports an ion beam emitted from an accelerator to one of a plurality of treatment rooms. When preparations for irradiation of the ion beam to patients in the plurality of treatment rooms are completed, irradiation ready signals are outputted from treatment (operator) consoles provided respectively in the treatment rooms. A first-come, first-served basis controller decides the sequence of introducing the ion beam to the treatment rooms based on the order in which the respective irradiation ready signals have been inputted. Beam paths for introducing the ion beam emitted from the accelerator to respective irradiation units in the treatment rooms are formed in accordance with the decided sequence.

Abstract translation: 粒子束治疗系统将从加速器发射的离子束输送到多个治疗室中的一个。 当完成对多个处理室中的患者照射离子束的准备时，分别在处理室中设置的治疗（操作者）控制台输出照射准备信号。 先到先得的基准控制器根据已经输入各个照射准备信号的顺序来决定将离子束引入治疗室的顺序。 根据所确定的顺序形成用于将从加速器发射的离子束引入治疗室中的各个照射单元的光束路径。

公开(公告)号：US20030062488A1

公开(公告)日：2003-04-03

申请号：US10262997

申请日：2002-10-02

Inventor： Richard Lee Fink ,  Leif H. Thuesen

IPC: H01J033/00

CPC classification number: H01J33/00 ,  H01J2201/304

Abstract: By using a large area cathode, an electron source can be made that can irradiate a large area more uniformly and more efficiently than currently available devices. The electron emitter can be a carbon film cold cathode, a microtip or some other emitter. It can be patterned. The cathode can be assembled with electrodes for scanning the electron source.

Abstract translation: 通过使用大面积阴极，可以制造能够比现有的装置更均匀，更有效地照射大面积的电子源。 电子发射体可以是碳膜冷阴极，微尖端或其他一些发射极。 它可以被图案化。 阴极可以与用于扫描电子源的电极组装。

公开(公告)号：US20010017514A1

公开(公告)日：2001-08-30

申请号：US09730581

申请日：2000-12-07

Inventor： Kenji Toda ,  Keiji Ono ,  Susumu Miyazaki

IPC: H01J033/00 ,  C09K011/08

CPC classification number: C09K11/7774 ,  C09K11/774 ,  C09K11/7769 ,  C09K11/7775 ,  C09K11/7787 ,  C09K11/7792 ,  C09K11/7793

Abstract: A phosphor for a vacuum ultraviolet excited light emitting device, obtained by adding Eu or Tb as an activating agent to a substrate comprising a compound represented by the general formula M1M2M3O4, wherein M1 represents at least one elements selected from Na and Li, M2 represents at least one elements selected from Gd and Y, and M3 represents at least one elements selected from Ge and Si.

Abstract translation: 通过将Eu或Tb作为活化剂添加到包含由通式M1M2M3O4表示的化合物的基材中获得的真空紫外激发发光器件的荧光体，其中M1表示选自Na和Li中的至少一种元素，M2表示为 至少一种选自Gd和Y的元素，M3表示选自Ge和Si中的至少一种元素。

公开(公告)号：US20040149934A1

公开(公告)日：2004-08-05

申请号：US10760422

申请日：2004-01-21

Inventor： Masaki Yanagisawa ,  Hiroshi Akiyama ,  Koji Matsuda ,  Hisataka Fujimaki

IPC: H01J033/00 ,  A61N005/10

CPC classification number: A61N5/1042 ,  A61N2005/1087 ,  A61N2005/1095 ,  G21K1/10 ,  G21K5/04

Abstract: The present invention provides an increased degree of uniformity of radiation dose distribution for the interior of a diseased part. A particle beam therapy system includes a charged particle beam generation apparatus and an irradiation apparatus. An ion beam is generated by the charged particle beam generation apparatus. The irradiation apparatus exposes a diseased part to the generated ion beam. A scattering device, a range adjustment device, and a Bragg peak spreading device are installed upstream of a first scanning magnet and a second scanning magnet. The scattering device and the range adjustment device are combined together and moved along a beam axis, whereas the Bragg peak spreading device is moved independently along the beam axis. The scattering device moves to adjust the degree of ion beam scattering. The range adjustment device moves to adjust ion beam scatter changes caused by an absorber thickness adjustment. The Bragg peak spreading device moves to adjust ion beam scatter changes arising out of an SOBP device. These adjustments provide uniformity of radiation dose distribution for the diseased part.

公开(公告)号：US20040012328A1

公开(公告)日：2004-01-22

申请号：US10196105

申请日：2002-07-16

Applicant: Eastman Kodak Company

Inventor： Andrew D. Arnold ,  Ronald S. Cok

IPC: H01J001/62 ,  H01J033/00

CPC classification number: H01L51/5281 ,  H01L27/3244 ,  H01L51/0038 ,  H01L51/005 ,  H01L51/0059 ,  H01L51/0077 ,  H01L51/0081 ,  H01L51/5262 ,  H01L51/5278 ,  H01L51/529

Abstract: An OLED display having an ambient contrast ratio greater than ten at an ambient illumination greater than 6,000 lux at an average power of 100 milliwatts per centimeter squared.

Abstract translation: 在平均功率为100毫瓦每平方厘米的环境照度下，大于6,000勒克斯的环境对比度大于10的OLED显示器。

公开(公告)号：US20020135290A1

公开(公告)日：2002-09-26

申请号：US09813929

申请日：2001-03-21

Applicant: Advanced electron Beams, Inc.

Inventor： Tzvi Avnery

IPC: H01J033/00

CPC classification number: H01J33/04

Abstract: An exit window for an electron beam emitter through which electrons pass in an electron beam includes an exit window foil having an interior and an exterior surface. A corrosion resistant layer having high thermal conductivity is formed over the exterior surface of the exit window foil for resisting corrosion and increasing thermal conductivity.

Abstract translation: 电子束通过电子束的电子束发射器的出射窗包括具有内表面和外表面的出射窗箔。 在出口窗口的外表面上形成具有高导热性的耐腐蚀层，以抵抗腐蚀和增加导热性。

公开(公告)号：US20040169714A1

公开(公告)日：2004-09-02

申请号：US10376547

申请日：2003-02-28

Inventor： Bradley B. Rassatt ,  David J. McDaniel

IPC: B41J002/435 ,  G01D015/14 ,  H01J029/70 ,  H01J033/00

CPC classification number: G03D13/002

Abstract: A thermal processor having a contaminant removal system. The system includes a heated drum for heat developing exposed heat developable media which emit airborne contaminants during the development; a plurality of rollers located about a circumferential segment of the drum to hold an exposed media in contact with the drum; an enclosure for enclosing the heated drum and plurality of rollers, the enclosure including a first upper curved member spaced from and enclosing the rollers and the upper portion of the drum and a second lower curved member spaced from and enclosing the lower portion of the drum, the first and second curved members having first ends spaced from each other and defining a film entrance region, and further having second ends spaced from each other and defining a film exit region; wherein the first upper curved member includes a curved duct having a first opening above the rollers and a second opening configured to direct gaseous fluids away from the film exit from the drum. The system further includes a top condensation trap communicating with the second opening of the duct; a bottom condensation trap; and an air flow control system for drawing ambient air from outside the enclosure through the film entrance region, splitting the air flow into (a) a top flow stream which passes between the first member over the rollers, through the duct and through the top condensation trap where airborne contaminants are condensed and the air stream is cooled, and (b) a bottom flow stream which passes between the second member and the lower portion of the drum and through the bottom condensation trap where airborne contaminants are condensed and the bottom flow stream is cooled.

Abstract translation: 具有污染物去除系统的热处理器。 该系统包括用于在显影过程中散发暴露的可热显影介质的放热空气污染物的加热鼓; 围绕滚筒周向部分定位的多个滚子以保持暴露的介质与滚筒接触; 用于封闭加热的鼓和多个辊的外壳，所述外壳包括与所述滚子和所述滚筒的上部间隔开并且包围所述滚筒的第一上部弯曲构件以及与所述滚筒的下部隔开并且包围所述滚筒下部的第二下部弯曲构件， 所述第一和第二弯曲构件具有彼此间隔开的第一端并且限定膜入口区域，并且还具有彼此间隔开并限定膜出口区域的第二端; 其中所述第一上弯曲构件包括具有在所述辊上方的第一开口的弯曲管道，以及构造成将气态流体从所述膜出口远离所述滚筒的第二开口。 该系统还包括与导管的第二开口连通的顶部冷凝阱; 底部冷凝阱; 以及气流控制系统，用于通过膜入口区域从外壳外部抽取环境空气，将空气流分成（a）通过管道在第一构件之间通过管道的顶流流，并通过顶部冷凝 其中空气污染物被冷凝并且空气流被冷却，并且（b）底部流动流，其在第二构件和滚筒的下部之间通过底部冷凝器，其中空气传播的污染物被冷凝，并且底部流动流 被冷却。

公开(公告)号：US20040089820A1

公开(公告)日：2004-05-13

申请号：US10631678

申请日：2003-07-31

Inventor： Imtiaz Rangwalla ,  Harvey Clough ,  George Hannafin

IPC: H01J033/00

CPC classification number: B05D3/068 ,  B41M7/0045 ,  B41M7/0081 ,  G21K5/10 ,  H01J33/00 ,  H01J33/04

Abstract: Methods, and materials made by the methods, are provided herein for treating materials with a particle beam processing device. According to one illustrative embodiment, a method for treating a material with a particle beam processing device is provided that includes: providing a particle beam generating assembly including at least one filament for creating a plurality of particles; applying an operating voltage greater than about 110 kV to the filament to create the plurality of particles; causing the plurality of particles to pass through a thin foil having a thickness of about 10 microns or less; and treating a material with the plurality of particles.

Abstract translation: 本文提供了通过方法制备的方法和材料，用于使用粒子束处理装置处理材料。 根据一个示例性实施例，提供了一种用粒子束处理装置处理材料的方法，其包括：提供粒子束产生组件，其包括用于产生多个颗粒的至少一个细丝; 向灯丝施加大于约110kV的工作电压以产生多个颗粒; 使多个颗粒通过厚度为约10微米或更小的薄箔; 以及用多个颗粒处理材料。

公开(公告)号：US20030001108A1

公开(公告)日：2003-01-02

申请号：US10153622

申请日：2002-05-24

Applicant: Energy Sciences, Inc.

Inventor： Imtiaz Rangwalla ,  Harvey Clough ,  George Hannafin

IPC: H01J033/00

CPC classification number: B05D3/068 ,  B41M7/0045 ,  B41M7/0081 ,  G21K5/10 ,  H01J33/00 ,  H01J33/04

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency, and also directed to an application of such apparatus to treat a coating on a substrate of a treatable material, such as for flexible packaging. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, electrons are generated and accelerated to pass through the foil support assembly. In the flexible packaging application, the substrate is fed to the processing apparatus operating at a low voltage, such as 110 kVolts or below, and is exposed to the accelerated electrons to treat the coating on the substrate.

Abstract translation: 本发明涉及一种尺寸较小并以更高效率操作的粒子束加工装置，并且还针对这种装置的应用来处理可处理材料的基底上的涂层，例如用于柔性包装。 处理装置包括粒子束产生组件，箔支撑组件和处理组件。 在粒子束产生组件中，产生并加速电子以通过箔支撑组件。 在柔性封装应用中，将衬底馈送到在低电压（例如110kV或更低）下工作的处理设备，并暴露于加速电子以处理衬底上的涂层。

公开(公告)号：US20040183032A1

公开(公告)日：2004-09-23

申请号：US10765533

申请日：2004-01-27

Applicant: Nano-Proprietary, Inc.

Inventor： Richard Lee Fink ,  Leif H. Thuesen

IPC: H01J033/00

CPC classification number: H01J33/00 ,  H01J2201/304

Abstract: By using a large area cathode, an electron source can be made that can irradiate a large area more uniformly and more efficiently than currently available devices. The electron emitter can be a carbon film cold cathode, a microtip or some other emitter. It can be patterned. The cathode can be assembled with electrodes for scanning the electron source.