High silica glass
    193.
    发明授权
    High silica glass 失效
    高硅胶玻璃

    公开(公告)号:US4340408A

    公开(公告)日:1982-07-20

    申请号:US256946

    申请日:1981-04-23

    Abstract: A fully dense high silica glass is made by taking a silica glass, causing it to phase separate into two inter-connecting phases, then removing one phase to leave a porous high silica glass, forming a layer of metal oxide over the surface of the pores of the glass and finally sintering the metal oxide-coated porous glass. Preferably a titanium oxide layer is formed by first producing a layer of titanium chloride and then hydrolysing this layer to form a surface layer of titanium oxide. The formation of a metal oxide layer on the pores of the glass allows a lower process temperature to be used, for sintering and providing the fully dense high silica glass.

    Abstract translation: 通过采用二氧化硅玻璃制成完全致密的高硅石玻璃,使其相分离成两个相互连接的相,然后除去一相以留下多孔高的二氧化硅玻璃,在孔的表面上形成一层金属氧化物 并最后烧结金属氧化物涂覆的多孔玻璃。 优选地,通过首先生成一层氯化钛然后水解该层以形成氧化钛的表面层来形成氧化钛层。 在玻璃的孔上形成金属氧化物层可以使用较低的工艺温度,用于烧结和提供完全致密的高硅石玻璃。

    Quartz glass crucible
    195.
    发明授权

    公开(公告)号:US12116692B2

    公开(公告)日:2024-10-15

    申请号:US17413925

    申请日:2019-12-16

    Abstract: A quartz glass crucible 1 having a cylindrical side wall portion 10a, a bottom portion 10b, and a corner portion 10c connecting the side wall portion 10a and the bottom portion 10b to each other includes a transparent layer 11 made of quartz glass, and a bubble layer 12 made of quartz glass and formed outside the transparent layer 11. A ratio of an infrared transmittance of the corner portion 10c at a maximum thickness position of the corner portion 10c to an infrared transmittance of the side wall portion 10a is 0.3 or more and 0.99 or less, and an absolute value of a rate of change in infrared transmittance in a height direction along a wall surface of the crucible from a center of the bottom portion 10b toward an upper end of the side wall portion 10a is 3%/cm or less.

    Opaque quartz glass and a method for producing the same

    公开(公告)号:US11993538B2

    公开(公告)日:2024-05-28

    申请号:US18262842

    申请日:2021-01-30

    Abstract: A quartz glass provides an opaque quartz glass having high light-shielding property, excellent mechanical strength and excellent cleaning resistance against hydrofluoric acid. By setting the maximum width of the amorphous bubbles existing in the opaque quartz glass to an average of 3 to 15 μm and the density to 2.15 g/cm3 or more, the mechanical strength after baking and the cleaning resistance by hydrofluoric acid are improved. The opaque quartz glass has a whiteness at a thickness of 10 mm of 75 to 90%, the reflectance of light with a wavelength of 0.24 to 2.6 μm at a thickness of 4 mm is 60 to 85%, and the bending strength after baking is 95 MPa. In addition, a foaming agent may be mixed in the opaque quartz glass. An opaque quartz glass having cleaning resistance against acid can be obtained.

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