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公开(公告)号:US4681615A
公开(公告)日:1987-07-21
申请号:US642606
申请日:1984-08-20
Applicant: Motoyuki Toki , Sadao Kanbe , Satoru Miyashita , Tetsuhiko Takeuchi
Inventor: Motoyuki Toki , Sadao Kanbe , Satoru Miyashita , Tetsuhiko Takeuchi
CPC classification number: C03C1/006 , C03B19/12 , C03C3/06 , C03C2201/02 , C03C2203/26 , C03C2203/34 , Y02P40/57 , Y10S65/901
Abstract: A process for forming monolithic silica glass articles is provided. The process includes the steps of hydrolyzing silicon alkoxide to form a hydrolyzed solution, adding fumed silica to the hydrolyzed silicon alkoxide solution to yield a sol solution, gelling the sol solution to a gel, and drying and sintering the gel to obtain the monolithic silica glass articles.
Abstract translation: PCT No.PCT / JP83 / 00450 Sec。 1984日期1984年8月20日 102(e)日期1984年8月20日PCT提交1983年12月22日PCT公布。 第WO84 / 02519号公报 日期1984年7月5日。一种用于形成整体式二氧化硅玻璃制品的方法。 该方法包括水解硅烷醇以形成水解溶液的步骤,向水解的硅醇盐溶液中加入热解二氧化硅以产生溶胶溶液,将溶胶溶胶凝胶化,并干燥并烧结凝胶以获得单片石英玻璃 文章。
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192.
公开(公告)号:US4397666A
公开(公告)日:1983-08-09
申请号:US315494
申请日:1981-10-27
Applicant: Michiharu Mishima , Yuji Yamamoto , Kensuke Makita , Sumio Sakka , Kanichi Kamiya
Inventor: Michiharu Mishima , Yuji Yamamoto , Kensuke Makita , Sumio Sakka , Kanichi Kamiya
IPC: C01B33/152 , B05D7/00 , B32B17/00 , C03B8/02 , C03B19/12 , C03B37/01 , C03C1/00 , C03C3/04 , C03C3/06 , C03C17/02 , C04B41/50 , C04B41/86 , C03B19/06 , C03B20/00
CPC classification number: C04B41/009 , C03B19/12 , C03B37/011 , C03C1/008 , C03C3/04 , C03C3/06 , C04B41/5022 , C04B41/86 , C03C2201/02 , C03C2201/40 , C03C2201/42 , C03C2203/26 , C03C2203/30 , Y02P40/57 , Y10S65/901
Abstract: In producing silica glass, which may contain additional metal(s) such as Ti or Zr, from a solution of a silicon alkoxide, mixed with alkoxide(s) of the additional metal(s) where necessary, in water and a hydrophilic organic solvent by shaping the solution into a desired form such as a coating film on a substrate, self-supporting film, fiber or lump when the solution exhibits a suitably high viscosity and sufficiently heating the shaped solution, a water-soluble organic polymeric substance is added to the solution as a viscosity adjusting agent to soon increase the viscosity of the solution to the desirable level. Therefore, shaping of the solution can be performed without awaiting the progress of hydrolysis of the alkoxide in the solution, and the glass can be obtained with improved uniformity of its properties. A cellulose ether is preferred as the viscosity adjusting agent, and hydroxypropyl cellulose is particularly preferable.
Abstract translation: 在可能含有另外的金属如Ti或Zr的二氧化硅玻璃中,从需要的金属醇盐与硅烷醇盐的溶液在水和亲水性有机溶剂中混合 通过将溶液成型为所需形状,例如基材上的涂膜,自支撑膜,纤维或块状物,当溶液表现出适当高的粘度并充分加热成型溶液时,将水溶性有机聚合物质加入 该溶液作为粘度调节剂,将溶液粘度迅速提高至理想水平。 因此,可以在不等待溶液中的醇盐的水解进行的情况下进行溶液的成形,并且可以获得具有改善的性能均匀性的玻璃。 优选纤维素醚作为粘度调节剂,特别优选羟丙基纤维素。
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公开(公告)号:US4340408A
公开(公告)日:1982-07-20
申请号:US256946
申请日:1981-04-23
Applicant: Peter W. McMillan , Ronald Maddison
Inventor: Peter W. McMillan , Ronald Maddison
CPC classification number: C03C17/23 , C03C3/06 , C03C3/061 , C03C2201/02 , C03C2203/10 , C03C2217/212 , C03C2218/152
Abstract: A fully dense high silica glass is made by taking a silica glass, causing it to phase separate into two inter-connecting phases, then removing one phase to leave a porous high silica glass, forming a layer of metal oxide over the surface of the pores of the glass and finally sintering the metal oxide-coated porous glass. Preferably a titanium oxide layer is formed by first producing a layer of titanium chloride and then hydrolysing this layer to form a surface layer of titanium oxide. The formation of a metal oxide layer on the pores of the glass allows a lower process temperature to be used, for sintering and providing the fully dense high silica glass.
Abstract translation: 通过采用二氧化硅玻璃制成完全致密的高硅石玻璃,使其相分离成两个相互连接的相,然后除去一相以留下多孔高的二氧化硅玻璃,在孔的表面上形成一层金属氧化物 并最后烧结金属氧化物涂覆的多孔玻璃。 优选地,通过首先生成一层氯化钛然后水解该层以形成氧化钛的表面层来形成氧化钛层。 在玻璃的孔上形成金属氧化物层可以使用较低的工艺温度,用于烧结和提供完全致密的高硅石玻璃。
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194.
公开(公告)号:US4038370A
公开(公告)日:1977-07-26
申请号:US616077
申请日:1975-09-23
Applicant: Tadashi Tokimoto , Yoshinobu Hiraishi
Inventor: Tadashi Tokimoto , Yoshinobu Hiraishi
CPC classification number: C01B33/183 , C03B19/1415 , C03B19/1453 , C03C3/06 , C01P2006/60 , C01P2006/80 , C03B2201/02 , C03B2201/04 , C03B2207/32 , C03B2207/36 , C03C2201/02 , C03C2201/20 , C03C2203/10 , C03C2203/20 , C03C2203/40
Abstract: A method of producing high-purity transparent vitreous silica by supplying to a burner a high-purity silane type gas, and an inert gas, hydrogen gas and oxygen gas to effect the flame hydrolysis, comprising growing highly pure transparent vitreous silica at a controlled atmosphere of said flame that may increase the oxygen defect concentration of the vitreous silica, and thereafter heat-treating said formed body.
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公开(公告)号:US12116692B2
公开(公告)日:2024-10-15
申请号:US17413925
申请日:2019-12-16
Applicant: SUMCO CORPORATION
Inventor: Takeshi Fujita , Ken Kitahara , Tomokazu Katano , Eriko Kitahara
CPC classification number: C30B15/10 , C03B19/095 , C03C3/06 , C03C4/10 , C03C2201/02 , C03C2204/00
Abstract: A quartz glass crucible 1 having a cylindrical side wall portion 10a, a bottom portion 10b, and a corner portion 10c connecting the side wall portion 10a and the bottom portion 10b to each other includes a transparent layer 11 made of quartz glass, and a bubble layer 12 made of quartz glass and formed outside the transparent layer 11. A ratio of an infrared transmittance of the corner portion 10c at a maximum thickness position of the corner portion 10c to an infrared transmittance of the side wall portion 10a is 0.3 or more and 0.99 or less, and an absolute value of a rate of change in infrared transmittance in a height direction along a wall surface of the crucible from a center of the bottom portion 10b toward an upper end of the side wall portion 10a is 3%/cm or less.
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196.
公开(公告)号:US20240279106A1
公开(公告)日:2024-08-22
申请号:US18290547
申请日:2022-02-09
Applicant: SUMCO Corporation
Inventor: Masami OHARA , Hiroshi KISHI , Eriko KITAHARA , Hideki FUJIWARA
CPC classification number: C03C3/06 , C03C17/004 , C30B15/10 , C30B29/06 , C03C2201/02 , C03C2218/112
Abstract: A quartz glass crucible includes a crucible base body having silica glass and a coating film containing a crystallization accelerator and formed on the inner surface of the crucible base body. The coating film has a peel strength of 0.3 kN/m or more.
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公开(公告)号:US11993538B2
公开(公告)日:2024-05-28
申请号:US18262842
申请日:2021-01-30
Applicant: Tosoh Quartz Corporation
Inventor: Takashi Taniguchi , Chiemi Ito , Takaya Suzuki , Yuka Oba
CPC classification number: C03C3/06 , C03B19/063 , C03B19/066 , C03C4/02 , C03C2201/02 , C03C2204/04
Abstract: A quartz glass provides an opaque quartz glass having high light-shielding property, excellent mechanical strength and excellent cleaning resistance against hydrofluoric acid. By setting the maximum width of the amorphous bubbles existing in the opaque quartz glass to an average of 3 to 15 μm and the density to 2.15 g/cm3 or more, the mechanical strength after baking and the cleaning resistance by hydrofluoric acid are improved. The opaque quartz glass has a whiteness at a thickness of 10 mm of 75 to 90%, the reflectance of light with a wavelength of 0.24 to 2.6 μm at a thickness of 4 mm is 60 to 85%, and the bending strength after baking is 95 MPa. In addition, a foaming agent may be mixed in the opaque quartz glass. An opaque quartz glass having cleaning resistance against acid can be obtained.
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公开(公告)号:US20240166552A1
公开(公告)日:2024-05-23
申请号:US18284784
申请日:2022-03-23
Applicant: DENKA COMPANY LIMITED
Inventor: Yasuaki HATAYAMA , Takashi FUKUDA
CPC classification number: C03C12/00 , C03B19/1005 , C03B19/1095 , C03C3/06 , C03C2201/02 , C03C2201/80 , C03C2203/10 , H01L23/29
Abstract: A spherical inorganic oxide powder wherein a volume-based cumulative 50% diameter D50 is 4-55 μm; and in a cross-section of a cured body containing an epoxy resin and the spherical inorganic oxide powder at a mass ratio of 2:1, when a total of 5000 particles with a maximum diameter of 51 μm or larger are observed in a field of view at 100× magnification using a scanning electron microscope, a total number of air bubbles having a maximum diameter of 1 μm or larger and smaller than 10 μm is 40 or fewer and a total number of air bubbles having a maximum diameter of 10 μm or larger is 30 or fewer.
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公开(公告)号:US20240140863A1
公开(公告)日:2024-05-02
申请号:US18497527
申请日:2023-10-30
Applicant: Shin-Etsu Chemical Co., Ltd.
Inventor: Hajime ITOKAWA , Yusuke TAGUCHI , Ryunosuke NOMURA , Kazuaki URANAKA
CPC classification number: C03C25/68 , B32B5/024 , C03C3/06 , C03C3/091 , C03C13/00 , C08J5/248 , H05K1/0366 , B32B2260/021 , B32B2260/046 , B32B2262/101 , B32B2457/08 , C03C2201/02 , C03C2203/52 , H05K2201/029
Abstract: In a glass cloth made of glass filaments having a composition which is at least 50 wt % SiO2, the filaments have a diameter that is 0.5 μm or more and less than 3.0 μm. The glass cloth has a thickness of 15 μm or less and a weight of from 0.3 to 10 g/m2.
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公开(公告)号:US11927882B2
公开(公告)日:2024-03-12
申请号:US17046202
申请日:2019-03-25
Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.
Inventor: Tatsuya Mori , Akira Sato , Atsushi Shimada , Yuya Yokosawa , Nobumasa Yoshida
CPC classification number: G03F1/64 , C03B20/00 , C03C3/06 , C03C4/0085 , C03C8/24 , C03C27/10 , C03C2201/02
Abstract: A quartz glass plate has a quartz glass plate body and a quartz glass member adhered to the quartz glass plate body through an adhesive layer, where the adhesive layer contains silica, and a sum of concentrations of Li, Na, and K ions, being alkali metal ions and Ca ions, being alkaline earth metal ions contained in the adhesive layer is 10 ppm by mass or less. Consequently, a step with a uniform thickness can be formed, and a quartz glass plate is not easily damaged by irradiation with a light containing an ultraviolet ray.
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