MULTI-CHANNEL BACKSIDE WAFER INSPECTION

    公开(公告)号:EP3087593B1

    公开(公告)日:2018-10-03

    申请号:EP14874432.9

    申请日:2014-12-23

    Inventor: BOBROV, Yakov

    Abstract: A system for inspecting a backside surface of a wafer with multi-channel focus control includes a set of inspection sub-systems including a first inspection sub-system positioned and an additional inspection sub-system. The first and additional inspection sub-systems include an optical assembly, an actuation assembly, where the optical assembly is disposed on the actuation assembly, and a positional sensor configured to sense a position characteristic between a portion of the optical assembly and the backside surface of the wafer. The system also includes a controller configured to acquire one or more wafer profile maps of the backside surface of the wafer and adjust a first focus position of the first inspection sub-system or an additional focus position of the additional inspection sub-system based on the received one or more wafer profile maps.

    SUBSTRATE INSPECTION DEVICE AND SUBSTRATE INSPECTION METHOD
    195.
    发明公开
    SUBSTRATE INSPECTION DEVICE AND SUBSTRATE INSPECTION METHOD 审中-公开
    基板检查装置和基板检查方法

    公开(公告)号:EP3187861A1

    公开(公告)日:2017-07-05

    申请号:EP15822847.8

    申请日:2015-07-08

    Inventor: FUJIKURA Hajime

    Abstract: A wafer inspection apparatus including a light emitter configured to emit light onto a to-be-inspected surface of a wafer, an imaging unit configured to obtain an image formed by the light emitted from the light emitter and reflected by the to-be-inspected surface, a moving unit configured to move a to-be-inspected position on the to-be-inspected surface by controlling a position of one of the wafer and the light emitter, and an inspecting unit configured to inspect the to-be-inspected surface by detecting a scatter image formed by the light that is emitted from the light emitter and scattered by a defect of the to-be-inspected surface, where the scatter image is formed outside an outline of the image formed by the light emitted from the light emitter.

    Abstract translation: 1。一种晶片检查装置,其特征在于,具备:发光部,其对晶片的被检查面照射光;摄像部,其获取由所述发光部射出并被所述被检查部反射的光形成的图像 通过控制晶圆和发光体中的一方的位置来移动被检查面上的被检查位置的移动单元以及检查被检查单元的检查单元 通过检测由光发射器发射并被待检查表面的缺陷散射的光形成的散射图像,其中散射图像形成在由从光发射器发射的光形成的图像的轮廓外部 光发射器。

    FLOW ANALYZER FOR HARSH ENVIRONMENTS
    197.
    发明公开
    FLOW ANALYZER FOR HARSH ENVIRONMENTS 审中-公开
    流量分析仪用于恶劣环境

    公开(公告)号:EP3056893A3

    公开(公告)日:2016-12-07

    申请号:EP16152478.0

    申请日:2016-01-22

    Abstract: A flow analyzer includes a flow body having a single-piece construction. The flow body includes a flow path extending through the flow body along a flow direction between opposing inlet and outlet ports and an enclosed wiring conduit extending substantially transverse to the flow direction between a first side of the flow body and a second side of the flow body. The enclosed wiring conduit is isolated from the flow path. An illumination unit is disposed on the first side of the flow body and configured to illuminate fluid within the flow path. An observation unit is disposed on the second side of the flow body and configured to visually observe the fluid within the flow path.

    Abstract translation: 流量分析仪包括具有单件结构的流动体。 流动体包括沿相对的入口和出口端口之间的流动方向延伸穿过流动体的流动路径以及基本上横向于流动方向在流动体的第一侧和流动体的第二侧之间延伸的封闭布线管道 。 封闭的接线导管与流路隔离。 照明单元设置在流动体的第一侧上并且构造成照射流动路径内的流体。 观察单元设置在流动体的第二侧上,并被配置为目视观察流动路径内的流体。

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