FLUORESCENCE DETECTION DEVICE
    231.
    发明申请
    FLUORESCENCE DETECTION DEVICE 有权
    荧光检测装置

    公开(公告)号:US20150276605A1

    公开(公告)日:2015-10-01

    申请号:US14438255

    申请日:2013-11-06

    Inventor: Ryohhei Kawamuki

    Abstract: A fluorescence detection device includes: a light source that emits excitation light in a first direction; a base unit (30) to which the light source is attached; an opening (30a) that is provided on a side in the first direction of the base unit (30) with respect to the light source; a cantilever (31) that is cantilevered to the base unit (30) to extend from an inner edge of the opening (30a) toward a center side of the opening (30a); an optical path conversion unit (20) that is fixed to a free end of the cantilever (31), converts a traveling direction of the excitation light emitted from the light source into a second direction different from the first direction, and irradiates a measurement object with the excitation light turned in the second direction; and a photodetection element that is disposed on a side of the opening (30a) opposite to the measurement object and detects fluorescence passing through the opening (30a) in fluorescence emitted from the measurement object irradiated with the excitation light. Accordingly, a loss in the fluorescence guided to the photodetection element can be reduced, and thus fluorescence detection efficiency can be improved.

    Abstract translation: 荧光检测装置包括:在第一方向上发射激发光的光源; 安装光源的基座单元(30); 相对于所述光源设置在所述基座单元(30)的所述第一方向的一侧的开口(30a) 悬臂(31),其悬臂连接到所述基座单元(30),以从所述开口(30a)的内边缘朝向所述开口(30a)的中心侧延伸; 固定到悬臂(31)的自由端的光路转换单元(20)将从光源发射的激发光的行进方向转换成与第一方向不同的第二方向,并且照射测量对象 激发光在第二个方向转动; 以及光检测元件,其设置在与所述测量对象相对的所述开口(30a)的一侧,并且检测从所述激发光照射的所述测量对象发出的荧光中穿过所述开口(30a)的荧光。 因此,可以降低引导到光检测元件的荧光的损失,从而可以提高荧光检测效率。

    Detection System Based on Modulation of Line Structured Laser Image of Glass
    232.
    发明申请
    Detection System Based on Modulation of Line Structured Laser Image of Glass 有权
    基于玻璃线结构激光图像调制的检测系统

    公开(公告)号:US20150226682A1

    公开(公告)日:2015-08-13

    申请号:US14422081

    申请日:2013-08-23

    Inventor: Yanbing Li Bin Liu

    Abstract: A detection system based on modulation of line structured laser image of glass comprises processing section (2), control system, and roller conveying mechanisms (5). Detection mechanism (6) provided over entrance of the processing section (201) comprises shell and camera (602) with laser (601) which emits beam on the surface of the glass in the gap between sliding rollers. Focal plane of the camera (602) corresponds to the beam irradiation surface, and signal output terminal of the camera (602) is connected with the control system in such a way that when glass passes the detection area, laser irradiates the glass surface and the line structured laser is modulated based on the glass to form laser modulation image with distribution of light and shade, staggered movement direction, or distorted laser lines. The camera (602) will transmit the captured glass information and parameters to the control system. In the system, the detection mechanism (6), with integral design and compact structure, can be easily fitted over the entrance of the processing section (201), has strong adaptation to other processing means, has no special requirements on incident angle of light and angle of detection surface during detection, and obtains highly accurate data through measurement.

    Abstract translation: 基于玻璃线结构激光图像调制的检测系统包括处理部分(2),控制系统和辊子输送机构(5)。 设置在处理部分201的入口处的检测机构(6)包括具有激光器(601)的外壳和照相机(602),其在滑动辊之间的间隙中在玻璃表面上发射光束。 照相机(602)的焦平面对应于光束照射面,照相机(602)的信号输出端子与控制系统连接,使得当玻璃通过检测区域时,激光照射玻璃表面和 基于玻璃调制线结构化激光,形成具有光阴分布,移动方向错位或激光线失真的激光调制图像。 相机(602)将捕获的玻璃信息和参数传送到控制系统。 在系统中,具有一体化设计和结构紧凑的检测机构(6)可以很容易地安装在加工部分(201)的入口处,具有很强的适应其他加工手段,对光入射角没有特殊要求 检测时的检测面角度,通过测量获得高精度的数据。

    OPTICAL UNIT, FLUORESCENCE DETECTION DEVICE, AND FLUORESCENCE DETECTION METHOD
    233.
    发明申请
    OPTICAL UNIT, FLUORESCENCE DETECTION DEVICE, AND FLUORESCENCE DETECTION METHOD 有权
    光学单元,荧光检测装置和荧光检测方法

    公开(公告)号:US20150028226A1

    公开(公告)日:2015-01-29

    申请号:US14378674

    申请日:2013-02-20

    Inventor: Yukio Watanabe

    Abstract: Even when the distance from an objective lens to a sample differs, the distribution of light from the sample can be detected accurately.A first lens 23 for converting light from the objective lens into parallel light is composed of a concave lens part 32 having a concave curved face 32c in a center portion of a flat face 32a, and a convex lens part 33 having a convex curved face 33c around a flat face 33b. Further, the first lens 23 includes first and second regions for diverging light through the flat face 33b and the concave curved face 32c and a third region for collecting light through the convex curved face 33c and the concave curved face 32c. When the sample is placed on a sample table while being sealed in a two-dimensional electrophoresis substrate, light totally reflected by a side surface of the objective lens is caused to enter the second region. In contrast, when the sample is directly placed on the sample table, the light is caused to enter the third region. As a result, in any of the cases, the rays of light d emitted from the first lens 23 are nearly parallel to one another, and are nearly parallel to the optical axis.

    Abstract translation: 即使当从物镜到样品的距离不同时,可以准确地检测来自样品的光的分布。 用于将来自物镜的光转换成平行光的第一透镜23由在平面32a的中心部分具有凹曲面32c的凹透镜部32和具有凸曲面33c的凸透镜部33 围绕平面33b。 此外,第一透镜23包括用于使光通过平面33b和凹曲面32c发散的第一和第二区域,以及用于通过凸曲面33c和凹曲面32c收集光的第三区域。 当样品被放置在样品台上同时密封在二维电泳基片中时,由物镜的侧面全反射的光进入第二区域。 相反,当将样品直接放置在样品台上时,使光进入第三区域。 结果,在任何情况下,从第一透镜23发射的光线d几乎彼此平行,并且几乎平行于光轴。

    Large particle detection for multi-spot surface scanning inspection systems
    234.
    发明授权
    Large particle detection for multi-spot surface scanning inspection systems 有权
    用于多点表面扫描检测系统的大粒子检测

    公开(公告)号:US08755044B2

    公开(公告)日:2014-06-17

    申请号:US13565702

    申请日:2012-08-02

    Abstract: The illumination power density of a multi-spot inspection system is adjusted in response to detecting a large particle in the inspection path of an array of primary illumination spots. At least one low power, secondary illumination spot is located in the inspection path of an array of relatively high power primary illumination spots. Light scattered from the secondary illumination spot is collected and imaged onto one or more detectors without overheating the particle and damaging the wafer. Various embodiments and methods are presented to distinguish light scattered from secondary illumination spots. In response to determining the presence of a large particle in the inspection path of a primary illumination spot, a command is transmitted to an illumination power density attenuator to reduce the illumination power density of the primary illumination spot to a safe level before the primary illumination spot reaches the large particle.

    Abstract translation: 响应于检测主照明点阵列的检查路径中的大颗粒,调整多点检查系统的照明功率密度。 至少一个低功率次级照明点位于相对较高功率的初级照明点的阵列的检查路径中。 从二次照明点散射的光被收集并成像到一个或多个检测器上,而不会使颗粒过热并损坏晶片。 呈现各种实施例和方法来区分从二次照明点散射的光。 响应于确定主照明点的检查路径中的大颗粒的存在,将命令发送到照明功率密度衰减器,以将主照明点的照明功率密度降低到初级照明点之前的安全水平 到达大颗粒。

    SURFACE INSPECTING APPARATUS AND SURFACE INSPECTING METHOD
    235.
    发明申请
    SURFACE INSPECTING APPARATUS AND SURFACE INSPECTING METHOD 审中-公开
    表面检查装置和表面检查方法

    公开(公告)号:US20140009756A1

    公开(公告)日:2014-01-09

    申请号:US13929030

    申请日:2013-06-27

    Inventor: Shigeru MATSUI

    CPC classification number: G01N21/9501 G01N2201/103

    Abstract: A surface inspecting apparatus rotates a semiconductor wafer 100 (inspection object) as a main scan while translating the semiconductor wafer 100 as an auxiliary scan, illuminates the surface of the semiconductor wafer 100 with illuminating light 21, thereby forms an illumination spot 3 as the illumination area of the illuminating light 21, detects scattered or diffracted or reflected light from the illumination spot, and detects a foreign object existing on the surface of the semiconductor wafer 100 or in a part of the semiconductor wafer 100 in the vicinity of the surface based on the result of the detection. In the surface inspecting apparatus, the translation speed of the auxiliary scan is controlled according to the distance from the rotation center of the semiconductor wafer 100 in the main scan to the illumination spot. With this control, the inspection time can be shortened while the deterioration in the detection sensitivity and the increase in the thermal damage during the surface inspection are suppressed.

    Abstract translation: 表面检查装置将作为辅助扫描的半导体晶片100作为主扫描旋转半导体晶片100(检查对象),用照明光21照射半导体晶片100的表面,从而形成照明点3作为照明 照射光21的区域,检测来自照明光点的散射或衍射或反射的光,并且基于以下方式检测存在于半导体晶片100的表面上的异物或半导体晶片100的表面附近的异物 检测结果。 在表面检查装置中,根据从主扫描中的半导体晶片100的旋转中心到照明点的距离来控制辅助扫描的平移速度。 通过该控制,可以在检测灵敏度的劣化和表面检查时的热损伤的增加被抑制的同时缩短检查时间。

    OPTICAL MEASURING DEVICE AND CALIBRATION DEVICE
    236.
    发明申请
    OPTICAL MEASURING DEVICE AND CALIBRATION DEVICE 审中-公开
    光学测量装置和校准装置

    公开(公告)号:US20110211192A1

    公开(公告)日:2011-09-01

    申请号:US12979138

    申请日:2010-12-27

    Abstract: There is provided an optical measuring device including: plural light-receiving units; a frame to which the respective light-receiving units are mounted on a same circumference whose axial center is a predetermined position, with optical axes of the light-receiving units being directed toward the axial center, an object of measurement being disposed at an axially central portion of the circumference; a measuring section that outputs measured values corresponding to received light amounts; a reference sample disposed, instead of the object of measurement, at the axially central portion of the circumference such that a longitudinal direction of the reference sample runs along an axis of the circumference; a reference light source that illuminates light of the predetermined wavelength toward the reference sample; and a calibrating section that calibrates the sensitivities of the plural light-receiving units at a time of measuring the object of measurement.

    Abstract translation: 提供了一种光学测量装置,包括:多个光接收单元; 将各光接收单元安装在轴心为规定位置的同一圆周上的框架,其中光接收单元的光轴朝向轴向中心,测量对象设置在轴向中心 圆周的一部分; 输出与接收到的光量对应的测量值的测量部; 参考样本,而不是测量对象,在圆周的轴向中心部分处,使得参考样本的纵向方向沿着圆周的轴线延伸; 将预定波长的光照射到参考样品的参考光源; 以及校准部,其在测量所述测量对象时校准所述多个光接收单元的灵敏度。

    Laser confocal microarray scanner
    237.
    发明授权
    Laser confocal microarray scanner 有权
    激光共焦微阵列扫描仪

    公开(公告)号:US07615758B2

    公开(公告)日:2009-11-10

    申请号:US11795660

    申请日:2005-06-02

    Abstract: The invention provides a laser microarray scanner for microarray scanning, comprising an optical system, a scanning platform, and a data processing system. During scanning, the optical system remains fixed, and the microarray placed on the scanning platform moves relative to the optical system. The microarray scanner disclosed herein has high scanning speed, high sensitivity, high resolution, and high signal-to-noise ratio, thus is ideal for use in microarray scanning

    Abstract translation: 本发明提供一种用于微阵列扫描的激光微阵列扫描器,包括光学系统,扫描平台和数据处理系统。 在扫描期间,光学系统保持固定,并且放置在扫描平台上的微阵列相对于光学系统移动。 本文公开的微阵列扫描器具有高扫描速度,高灵敏度,高分辨率和高信噪比,因此是理想的用于微阵列扫描

    Apparatus and method for inspecting a substrate
    238.
    发明授权
    Apparatus and method for inspecting a substrate 有权
    用于检查基板的装置和方法

    公开(公告)号:US07289661B2

    公开(公告)日:2007-10-30

    申请号:US10661633

    申请日:2003-09-15

    Abstract: An automated and integrated substrate inspecting apparatus for performing an EBR/EEW inspection, a defect inspection of patterns and reticle error inspection of a substrate includes a first stage for supporting a substrate; a first image acquisition unit for acquiring a first image of a peripheral portion of the substrate supported by the first stage; a second stage for supporting the substrate; a second image acquisition unit for acquiring a second image of the substrate supported by the second stage; a transfer robot for transferring the substrate between the first stage and the second stage; and a data processing unit, connected to the first image acquisition unit and the second image acquisition unit, for inspecting results of an edge bead removal process and an edge exposure process performed on the substrate using the first image, and for inspecting for defects of patterns formed on the substrate using the second image.

    Abstract translation: 用于执行EBR / EEW检查的自动化和一体化的基板检查装置,对基板的图案和掩模版错误检查的缺陷检查包括用于支撑基板的第一阶段; 第一图像获取单元,用于获取由所述第一平台支撑的所述基板的周边部分的第一图像; 用于支撑衬底的第二阶段; 第二图像获取单元,用于获取由第二平台支撑的基板的第二图像; 用于在第一阶段和第二阶段之间转移衬底的传送机器人; 以及数据处理单元,连接到第一图像获取单元和第二图像获取单元,用于检查使用第一图像在基板上执行的边缘珠去除处理和边缘曝光处理的结果,并且用于检查图案的缺陷 使用第二图像在基板上形成。

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