Abstract:
An optical detection apparatus and method thereof is provided, which is applicable for detecting the image signals of a labeled sample. First, a laser module provides excitation light, and the excitation light is continuously reflected by a scan module for providing linear scanning light by changing a reflection angle. The carrier moves the light module in a direction nonparallel to the linear direction so as to provide a two-dimensional testing zone. The labeled sample placed in the testing zone is excited by the linear scanning light and generates emission light to be received by the light receiver. Therefore, the light receiver forms the image signals of the labeled sample corresponding to the emission light.
Abstract:
An optical detection apparatus and method thereof is provided, which is applicable for detecting the image signals of a labeled sample. First, a laser module provides excitation light, and the excitation light is continuously reflected by a scan module for providing linear scanning light by changing a reflection angle. The carrier moves the light module in a direction nonparallel to the linear direction so as to provide a two-dimensional testing zone. The labeled sample placed in the testing zone is excited by the linear scanning light and generates emission light to be received by the light receiver. Therefore, the light receiver forms the image signals of the labeled sample corresponding to the emission light.
Abstract:
The present invention concerns a confocal chromatic device for inspecting the surface of an object (10) such as a wafer, comprising a plurality of optical measurement channels (24) with collection apertures (14) arranged for collecting the light reflected by the object (10) through a chromatic lens (13) at a plurality of measurement points (15), said plurality of optical measurement channels (24) comprising optical measurement channels (24) with an intensity detector (20) for measuring a total intensity of the collected light. The present invention concerns also a method for inspecting the surface of an object (10) such as a wafer comprising tridimensional structures (11).
Abstract:
An analyzer of a component in a sample fluid includes an optical source and an optical detector defining a beam path of a beam, wherein the optical source emits the beam and the optical detector measures the beam after partial absorption by the sample fluid, a fluid flow cell disposed on the beam path defining an interrogation region in the a fluid flow cell in which the optical beam interacts with the sample fluid and a reference fluid; and wherein the sample fluid and the reference fluid are in laminar flow, and a scanning system that scans the beam relative to the laminar flow within the fluid flow cell, wherein the scanning system scans the beam relative to both the sample fluid and the reference fluid.
Abstract:
Described is a system for inducing and detecting multi-photon processes, in particular multi- photon fluorescence or higher harmonic generation in a sample. The system comprises a dynamically-controllable light source, said dynamically-controllable light source comprising a first sub-light source, said first sub-light source being electrically controllable such as to generate controllable time-dependent intensity patterns of light having a first wavelength, and at least one optical amplifier, thereby allowing for active time-control of creation of multi-photon-excitation. The system further comprises a beam delivery unit for delivering light generated by said dynamically-controllable light source to a sample site, and a detector unit or detector assembly for detecting signals indicative of said multi-photon process, in particular multi-photon fluorescence signals or higher harmonics signals.
Abstract:
Field curvature of an optical system is modified based on topography of the surface of a wafer such that an image of each of the segments of the surface is in focus across the segment. The wafer may be non-planar. The optical system may be a multi-element lens system connected to a controller that modifies the field curvature by changing position of the lens elements. The wafer may be held by a chuck, such as an edge grip chuck. Multiple optical systems may be arranged across a dimension of the wafer.