公开(公告)号：WO01047808A1

公开(公告)日：2001-07-05

申请号：PCT/JP2000/009357

申请日：2000-12-28

IPC: C01B33/16 ,  C03B8/02 ,  C03B19/10 ,  C03C1/00 ,  C01B33/18 ,  C03B20/00

CPC classification number: C03B19/1065 ,  C01B33/16 ,  C03B2201/03 ,  C03B2201/04 ,  C03C1/006

Abstract: A method for producing silica particles comprising freezing a hydrous silica gel, thawing the frozen gel and removing the water having been separated from the gel by thawing, to thereby dehydrate the hydrous silica gel and provide silica particles; a method for producing a synthetic quartz powder comprising washing and then burning the above silica particles; a method for producing a synthetic quartz powder comprising removing alkaline components from water glass, adding an oxidizing agent and an acid, passing the resultant mixture through a proton type cation exchange resin, and then gelating the resultant solution, followed by washing and firing; and a method for producing a quartz glass comprising holding a silica at 150 to 400 DEG C, 500 to 700 DEG C, and then 1100 to 1300 DEG C, for specific times, respectively.

Abstract translation: 一种生产二氧化硅颗粒的方法，包括冷冻含水硅胶，解冻冷冻凝胶并通过解冻除去已经从凝胶中分离的水，从而使含水硅胶脱水并提供二氧化硅颗粒; 一种制造合成石英粉末的方法，包括洗涤然后燃烧上述二氧化硅颗粒; 一种制造合成石英粉的方法，包括从水玻璃中除去碱性组分，加入氧化剂和酸，使所得混合物通过质子型阳离子交换树脂，然后使所得溶液凝胶化，然后进行洗涤和烧制; 以及石英玻璃的制造方法，其特征在于，在150〜400℃，500〜700℃，然后在1100〜1300℃下分别保持二氧化硅。

公开(公告)号：WO1996037434A1

公开(公告)日：1996-11-28

申请号：PCT/JP1996001362

申请日：1996-05-23

Applicant: MITSUBISHI CHEMICAL CORPORATION ,  KATSURO, Yoshio ,  KATSUKI, Yoshinobu ,  TAKAZAWA, Akihiro ,  KATO, Hanako ,  UTSUNOMIYA, Akira

Inventor： MITSUBISHI CHEMICAL CORPORATION

IPC: C01B33/18

CPC classification number: C03B19/095 ,  C01B33/18 ,  C01P2006/80 ,  C03B19/01 ,  C03B19/09 ,  C03B19/1065 ,  C03B2201/03 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/26 ,  Y10S65/08

Abstract: A process for producing a high purity synthetic quartz powder, which comprises producing the synthetic quartz with a sol-gel method using a tetramethoxysilane whose trimethoxymethylsilane content is not more than 0.3 % by weight.

Abstract translation: 一种高纯度合成石英粉的制造方法，其特征在于，使用三甲氧基甲基硅烷含量为0.3重量％以下的四甲氧基硅烷，通过溶胶 - 凝胶法制造合成石英。

公开(公告)号：EP3390308A1

公开(公告)日：2018-10-24

申请号：EP16822653.8

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： HÜNERMANN, Michael ,  HOFMANN, Achim ,  FABIAN, Heinz ,  OTTER, Matthias ,  KAYSER, Thomas

IPC: C03B20/00 ,  C03B37/012 ,  C03B19/10 ,  C03B19/06

CPC classification number: C03B37/01211 ,  C03B19/066 ,  C03B19/108 ,  C03B19/1095 ,  C03B2201/03 ,  C03B2201/04 ,  C03C1/026 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/32

Abstract: The invention relates to a light conductor having a sleeve M1 and one or more cores, wherein the sleeve M1 encloses the cores. Each core has a refraction index profile perpendicular to the maximum core expansion, wherein at least one refraction index
n
K of each refraction index profile is greater than the refraction index
n
M1 of the sleeve M1. The sleeve M1 consists of silicon dioxide and has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm, and an aluminum content of less than 200 ppb. The invention further relates to a silicon dioxide granulate I, characterized by a chlorine content of less than 200 ppm and an aluminum content of less than 200 ppb, each relative to the total weight of the silicon dioxide granulate I. The invention further relates to a silicon dioxide granulate II, characterized by a chlorine content of less than 500 ppm and an aluminum content of less than 200 ppb. The invention further relates to a method for producing silicon dioxide granulates I and II according to the invention and for producing a quartz glass body, a light conductor, and a fiber optic cable.

公开(公告)号：EP3390305A1

公开(公告)日：2018-10-24

申请号：EP16819871.1

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： OTTER, Matthias ,  LEHMANN, Walter ,  HÜNERMANN, Michael ,  NIELSEN, Nils Christian ,  WITTRIN, Mirko ,  WILDE, Markus

IPC: C03B20/00 ,  C03C3/06 ,  C03B19/10 ,  C03B37/012 ,  C03B17/04

CPC classification number: C03B20/00 ,  C03B17/04 ,  C03B19/108 ,  C03B19/1085 ,  C03B37/01211 ,  C03B2201/03 ,  C03B2201/07 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/32

Abstract: The invention relates to a method for producing a silica glass article, involving method steps i.) providing a silica granulate that can be obtained from a silica powder, the silica granulate having a larger particle size than the silica powder, ii.) forming a glass melt from the silica granulate, and iii.) forming a silica glass article from at least some of the glass melt, the melting crucible comprising at least one inlet and an outlet, at least some of the glass melt being removed through the outlet in the melting crucible. The invention further relates to a silica glass article that can be obtained by said method. The invention also relates to an optical waveguide, an illuminant and a molded article, each of which can be obtained by further processing the silica glass article.

公开(公告)号：EP3390292A1

公开(公告)日：2018-10-24

申请号：EP16809873.9

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： ARNDT, Martin ,  OTTER, Matthias ,  LEHMANN,Walter ,  HÜNERMANN, Michael ,  NIELSEN, Nils Christian ,  WHIPPEY, Nigel Robert ,  GROMANN, Boris ,  KPEBANE, Abdoul-Gafar

IPC: C03B20/00 ,  C03C3/06 ,  C03B19/06 ,  C03B19/10 ,  C03B19/09

CPC classification number: C03B19/1005 ,  C03B19/066 ,  C03B19/095 ,  C03B19/10 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/23 ,  C03C1/04 ,  C03C3/06 ,  C03C4/02 ,  C03C2203/10 ,  C03C2204/04

Abstract: The invention relates to a method for producing a quartz glass granulate, comprising the method steps of: i.) providing silicon dioxide granules from a silicon dioxide powder produced pyrogenically, ii.) forming a glass melt from said silicon dioxide granules, iii.) forming a quartz glass body from at least one part of the glass melt, and iv.) comminuting the quartz glass body so as to obtain a quartz glass granulate. The invention also relates to a quartz glass granulate obtained using this method. The invention likewise relates to opaque quartz glass bodies obtainable by processing the quartz glass granulate further.

公开(公告)号：EP3002262A1

公开(公告)日：2016-04-06

申请号：EP14187320.8

申请日：2014-10-01

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Sayce, Ian George ,  Trommer, Martin

IPC: C03B19/14 ,  C23C16/44 ,  C03B20/00

CPC classification number: C03B20/00 ,  C03B19/14 ,  C03B19/1415 ,  C03B2201/03 ,  C03B2207/32 ,  C03C3/06 ,  C08G77/04 ,  C23C16/4402

Abstract: Beschrieben wird ein Verfahren zur Herstellung von synthetischem Quarzglas. Darüber hinaus wird eine Polyalkylsiloxanverbindung, die einen Chlorgehalt bis 550 ppb, einen Gehalt an metallischen Verunreinigungen an Chrom und Zink bis 25 ppb und vorzugsweise einen Restfeuchtegehalt bis 150 ppm aufweist, sowie deren Verwendung zur Herstellung von synthetischem Quarzglas. Beschrieben wird ein synthetisches Quarzglas, welches nach dem erfindungsgemäßen Verfahren erhalten wird.

Abstract translation: 一个方面涉及一种用于生产合成石英玻璃的方法。 更完了，一个方面涉及一种聚烷基化合物，其包括相对于氯含量，金属杂质含量，和残留水分，以及它们用于生产合成石英玻璃的使用的某些规格。 所以一个方面涉及一种合成石英玻璃那样能获得gemäß一个实施例的方法。

公开(公告)号：EP2835452A4

公开(公告)日：2016-02-24

申请号：EP14782930

申请日：2014-03-25

Applicant: SHINETSU QUARTZ PROD

Inventor： YAMAGATA SHIGERU

IPC: C30B29/06 ,  C03B20/00 ,  C30B15/10

CPC classification number: C03B19/095 ,  C03B2201/03 ,  C03B2201/04 ,  C30B15/10 ,  C30B29/06 ,  C30B35/002 ,  Y10T117/1032

公开(公告)号：EP2834199A1

公开(公告)日：2015-02-11

申请号：EP13711349.4

申请日：2013-03-20

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： LEHMANN, Walter ,  KAYSER, Thomas

IPC: C03B19/10 ,  C03B20/00 ,  C03B19/09

CPC classification number: C03B20/00 ,  C03B19/095 ,  C03B19/1005 ,  C03B19/107 ,  C03B19/1095 ,  C03B2201/02 ,  C03B2201/03 ,  C03C23/0075

Abstract: The production of quartz glass granules comprises the granulation of pyrogenically produced silicic acid and the formation of a SiO
2 granulate (9), the drying and cleaning of the SiO
2 granulate (9) by heating in an atmosphere containing halogen, and the vitrification of the SiO
2 granulate (9) under a treatment gas which contains at least 30% by volume of helium and/or hydrogen. This process is time-consuming and expensive. In order to provide a method which, starting from a porous SiO
2 granulate (9), allows the cost-effective production of dense, synthetic quartz glass granules suitable for melting bubble-free components of quartz glass, the invention proposes that the cleaning and vitrification of the SiO
2 granulate (9) and a post-treatment of the vitrified quartz glass granules are carried out in each case in a rotary tube (6) of a rotary kiln (1), said rotary tube rotating about a central axis (7), wherein the rotary tube (6) comprises an inner wall made of a ceramic material during vitrification, and wherein the vitrified quartz glass granules are subjected to a post-treatment during a treatment period of at least 10 minutes in an atmosphere which contains less than 20% of helium or hydrogen at a treatment temperature of 300 °C or more.

Abstract translation: 石英玻璃颗粒的生产包括热解产生的硅酸的造粒和SiO 2颗粒的形成（9），通过在含有卤素的气氛中加热来干燥和清洁SiO 2颗粒（9），并且玻璃化 在含有至少30体积％的氦气和/或氢气的处理气体下的SiO 2颗粒（9）。 这个过程耗时且昂贵。 为了提供一种方法，其从多孔SiO 2颗粒（9）开始，允许成本有效地生产适用于熔化石英玻璃的无气泡组分的致密的合成石英玻璃颗粒，本发明提出清洁和 分别在旋转窑（1）的旋转管（6）中进行SiO 2颗粒（9）的玻璃化和玻璃化石英玻璃颗粒的后处理，所述旋转管围绕中心轴 其特征在于，所述旋转管（6）在玻璃化过程中包括由陶瓷材料制成的内壁，并且所述玻璃化石英玻璃颗粒在包含至少10分钟的处理期间的后处理 在300℃或更高的处理温度下小于20％的氦气或氢气。

公开(公告)号：EP2703526A4

公开(公告)日：2014-12-31

申请号：EP13763892

申请日：2013-01-22

Applicant: SHINETSU QUARTZ PROD

Inventor： YAMAGATA SHIGERU

IPC: C30B29/06 ,  C03B20/00 ,  C30B15/10

CPC classification number: C30B15/10 ,  C03B19/095 ,  C03B2201/03 ,  C30B29/06 ,  C30B35/002 ,  Y02P40/57 ,  Y10T117/1032

公开(公告)号：EP1854769B1

公开(公告)日：2012-01-25

申请号：EP06713315.7

申请日：2006-02-08

Applicant: NIKON CORPORATION

Inventor： MIZUGUCHI, Masafumi ,  ABE, Tetsuya

IPC: C03B20/00 ,  C03C3/06 ,  G01N21/64

CPC classification number: G01N21/64 ,  C03B11/08 ,  C03B23/0013 ,  C03B40/02 ,  C03B2201/03 ,  C03C3/06 ,  C03C23/0075 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2203/52 ,  G01N21/6402 ,  Y02P40/57

Abstract: A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method comprising: a step of washing the synthetic silica glass block so that a concentration of copper which is present on the surface of the synthetic silica glass block is 2 ng/cm 2 or less, and so that a concentration of aluminium thereon is 10 ng/cm 2 or less, before accommodating the synthetic silica glass block in the mold; a step of heating high purity carbon powders in which a content of copper is 40 wt.ppb or less and a content of aluminium is 100 wt.ppb or less at a temperature condition of 1200°C to 1900°C; a step of heating the mold at a temperature condition of 1700°C to 1900°C; a step of applying the high purity carbon powders after the heating step on the inner surface of the mold after the heating step, before accommodating the synthetic silica glass block in the mold; and a step of molding the synthetic silica glass block in a predetermined form by pressing the block by means of the pressing portion while heating so as to the temperature of the block can be within a hold temperature range of 1500°C to 1700°C, after accommodating the washed synthetic silica glass block in the mold.