公开(公告)号：JP3679324B2

公开(公告)日：2005-08-03

申请号：JP2000343934

申请日：2000-11-10

Applicant: エスティーマイクロエレクトロニクスエス.アール.エル.STMicroelectronics S.r.l.

Inventor： マリア ボルネオ アントニオ ,  サリナリ ランフランコ

IPC: G06T5/00 ,  H04N5/21 ,  H04N7/26 ,  H04N7/24

CPC classification number: G06T5/002 ,  G06T5/20 ,  G06T5/50 ,  G06T2207/10016 ,  G06T2207/20182 ,  H04N5/21 ,  H04N19/80

Abstract: A method of filtering noise of digital pictures comprises selecting a first set of pixels (WORKING_WINDOW) constituted by the union of a pixel of the current picture to be filtered (P) and of a second set of pixels temporally and spatially near (PIXEL_NEAR) to said pixel, calculating a certain number (N) of extended sums (SUMkj) of values assumed by as many pre-established weight functions of the intensity of a selected video component (kj) on the first set of pixels (WORKING_WINDOW). The pixels of the second set of pixels near (PIXEL_NEAR) can belong to the current picture or to a preceding picture. Several noise filters for digital pictures implementing the method of the invention are also presented.

公开(公告)号：JP3653595B2

公开(公告)日：2005-05-25

申请号：JP5274994

申请日：1994-02-24

Applicant: エスティーマイクロエレクトロニクスエス.アール.エルSTMicroelectronics S.r.l.

Inventor： エンリコ・マリア・アルフォンソ・ラヴァネリ ,  フラヴィオ・ヴィラ

IPC: H01L21/336 ,  H01L29/10 ,  H01L29/78

CPC classification number: H01L29/7816 ,  H01L29/0878 ,  H01L29/1083 ,  H01L29/66659 ,  Y10S148/126

公开(公告)号：JP2004134763A

公开(公告)日：2004-04-30

申请号：JP2003307928

申请日：2003-08-29

Applicant: Nokia Corp ,  Stmicroelectronics Srl ,  エスティーマイクロエレクトロニクスエス.アール.エルSTMicroelectronics S.r.l. ,  ノキア コーポレイションNokia Corporation

Inventor： ZERBINI SARAH ,  MERASSI ANGELO ,  SPINOLA DURANTE GUIDO ,  DE MASI BIAGIO

IPC: G01P21/00 ,  B81B3/00 ,  G01P1/02 ,  G01P15/06 ,  G01P15/08 ,  G01P15/18 ,  H01H1/00 ,  H01H35/14 ,  H01L29/84

CPC classification number: H01H1/0036 ,  G01P1/023 ,  G01P15/06 ,  G01P15/0802 ,  G01P15/0891 ,  G01P15/18 ,  G01P2015/0814 ,  H01H35/146

Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing an inertial sensor having a failure threshold.
SOLUTION: A process of manufacturing the inertial sensor, having a failure threshold includes the steps of: on the substrate 2 of a semiconductor wafer 1, forming at least one sample element 6 embedded in a sacrificial region 3 and 12; on the sacrificial region 3 and 12, forming a body 18 connected to the sample element 6; and etching the sacrificial region 3 and 12 to free the body 18 and the sample element 6.
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