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公开(公告)号:EP2278865A1
公开(公告)日:2011-01-26
申请号:EP10011152.5
申请日:2000-10-11
Applicant: Tessera Interconnect Materials, Inc.
Inventor: Tomo, Ijima , Masayuji, Ohsawa
CPC classification number: H05K3/4647 , H01L21/4857 , H01L21/486 , H01L23/49827 , H01L23/49838 , H01L2224/16 , H01L2224/81192 , H01L2924/01019 , H01L2924/01046 , H01L2924/01067 , H01L2924/01078 , H01L2924/01079 , H01L2924/15311 , H01L2924/3011 , H01L2924/3025 , H05K3/06 , H05K3/062 , H05K3/3457 , H05K3/4038 , H05K3/4614 , H05K3/4652 , H05K2201/0355 , H05K2201/09563 , H05K2203/0369 , H05K2203/0384 , H05K2203/041 , H05K2203/0733 , H05K2203/1189 , H05K2203/1476 , Y10T29/49126 , Y10T29/49137 , Y10T29/49155 , Y10T29/49204 , Y10T29/49222
Abstract: The invention relates to a wiring circuit substrate, comprising: a single layer base member in which are formed:
a first metal layer (51) in which conductor circuit traces are formed, and etched metal protrusions (53) that are electrically connected to said first metal layer; and a second metal layer (54) that is formed on top surfaces of said protrusions, wherein said second metal layer is formed of a solder-plated layer or a solder layer.Abstract translation: 本发明涉及一种布线电路基板,包括:形成有单层基底构件;形成有导体电路迹线的第一金属层(51)和蚀刻金属突起(53),其电连接到所述第一 金属层; 以及形成在所述突起的顶表面上的第二金属层(54),其中所述第二金属层由焊料镀层或焊料层形成。