SYSTEM FOR PREDICTING REDUCTION IN CONCENTRATION OF A TARGET MATERIAL IN A FLOW OF FLUID
    21.
    发明申请
    SYSTEM FOR PREDICTING REDUCTION IN CONCENTRATION OF A TARGET MATERIAL IN A FLOW OF FLUID 审中-公开
    流体流中目标物质浓度减少预测系统

    公开(公告)号:WO2005084720A1

    公开(公告)日:2005-09-15

    申请号:PCT/CA2005/000364

    申请日:2005-03-10

    Abstract: An ultraviolet fluid treatment system having feedback control using a kinetic model and a reactor model that interact with one another. The kinetic model uses readily measured fluid properties upstream and downstream of a radiation zone to calculate the conversion of a target contaminant as it passes through the fluid treatment system. This obviates the need to measure the contaminant concentration directly, which generally is too slow to permit real-time control. A reactor model relates system operating cost to system operating parameters, such as electrical power consumption and/or rate of oxidant addition, where applicable. The reactor model is linked to the kinetic model and is used to optimize operating cost by adjusting system operating parameters based on a comparison between the conversion obtained from the kinetic model and the overall treatment objectives. A control center, an ultraviolet fluid treatment apparatus, and a method of treating a fluid are also disclosed.

    Abstract translation: 具有使用动力学模型和相互作用的反应器模型的反馈控制的紫外线流体处理系统。 动力学模型使用辐射区上游和下游的容易测量的流体特性来计算目标污染物通过流体处理系统时的转化率。 这避免了直接测量污染物浓度的需要,这通常太慢,无法实时控制。 反应器模型将系统运行成本与系统运行参数(如适用的电力消耗和/或氧化剂添加速率)相关联。 反应器模型与动力学模型相关联,并且用于通过基于从动力学模型获得的转化与总体处理目标之间的比较来调整系统操作参数来优化操作成本。 还公开了一种控制中心,紫外线流体处理装置和处理流体的方法。

    FLUID TREATMENT SYSTEM AND RADIATION SOURCE MODULE FOR USE THEREIN
    22.
    发明申请
    FLUID TREATMENT SYSTEM AND RADIATION SOURCE MODULE FOR USE THEREIN 审中-公开
    流体处理系统及其使用的辐射源模块

    公开(公告)号:WO2004000735A1

    公开(公告)日:2003-12-31

    申请号:PCT/CA2003/000925

    申请日:2003-06-19

    Abstract: A radiation source module comprising a support member, a radiation source assembly connected to the support member, the radiation source assembly comprising at least one elongate radiation source having a source longitudinal axis and a module-to-surface seal disposed on a first elongate surface of the module, the first elongate surface comprising a first longitudinal axis transverse to the source longitudinal axis, the seal operable to provide a substantially fluid tight seal between the first surface and a second surface which is adjacent to the first surface. A fluid treatment system employ the radiation source module is also described.

    Abstract translation: 辐射源模块,包括支撑构件,连接到所述支撑构件的辐射源组件,所述辐射源组件包括至少一个细长辐射源,所述辐射源组件具有源纵向轴线和模块到表面密封件,所述辐射源组件设置在第一细长表面上 所述模块,所述第一细长表面包括横向于所述源纵向轴线的第一纵向轴线,所述密封件可操作以在所述第一表面与邻近所述第一表面的第二表面之间提供基本上流体密封的密封。 还描述了采用辐射源模块的流体处理系统。

    CLEANING FORMULATION AND METHOD OF CLEANING SURFACES
    23.
    发明申请
    CLEANING FORMULATION AND METHOD OF CLEANING SURFACES 审中-公开
    清洁配方和清洁表面的方法

    公开(公告)号:WO2003078559A1

    公开(公告)日:2003-09-25

    申请号:PCT/CA2003/000394

    申请日:2003-03-20

    Abstract: A cleaning formulation comprising a cleaning agent, a particulate clay material and an aqueous carrier. In a preferred embodiment, the formulation has a pH less than about 1.0 and is characterized by: (i) at least a 90% reduction in viscosity at 25°C at a shear rate of up to about 0.10 s -1 , and (ii) a substantially unchanged viscosity for a period of at least 60 days. The cleaning formulation is thixotropic and has a highly desirable combination of acid stability, temperature stability, electrolyte stability and ultraviolet radiation stability.

    Abstract translation: 一种清洁制剂,其包含清洁剂,颗粒状粘土材料和水性载体。 在优选的实施方案中,制剂具有小于约1.0的pH,其特征在于:(i)在剪切速率高达约0.10s -1的情况下在25℃下至少90%的粘度降低,以及 (ii)至少60天的时间内基本上不变的粘度。 清洗配方是触变性的,具有很好的酸稳定性,温度稳定性,电解液稳定性和紫外线辐射稳定性的组合。

    OPTICAL RADIATION SENSOR DEVICE
    24.
    发明申请
    OPTICAL RADIATION SENSOR DEVICE 审中-公开
    光学辐射传感器设备

    公开(公告)号:WO1995019553A1

    公开(公告)日:1995-07-20

    申请号:PCT/CA1995000020

    申请日:1995-01-13

    Abstract: An optical radiation sensor comprising a housing having an inlet which allows radiation to enter the housing, and further comprising the following elements serially disposed after the inlet in the path of the radiation: attenuating aperture means, filter means and sensor means. The attenuating aperture means reduce the amount of UV radiation on the sensor means and improve the sensors resistance to degradation in a high intensity UV radiation environment. A fluid disinfection system incorporating the sensor is also described.

    Abstract translation: 一种光辐射传感器,包括具有允许辐射进入壳体的入口的壳体,并且还包括以下元件,其串联地布置在辐射路径中的入口之后:衰减孔口装置,过滤装置和传感器装置。 衰减孔径意味着减少传感器装置上的UV辐射量并且改善传感器在高强度紫外线辐射环境中的降解性能。 还描述了结合传感器的流体消毒系统。

    UV DISINFECTION UNIT
    25.
    发明申请
    UV DISINFECTION UNIT 审中-公开
    UV消毒装置

    公开(公告)号:WO1995019188A1

    公开(公告)日:1995-07-20

    申请号:PCT/CA1995000005

    申请日:1995-01-13

    Abstract: A fluid disinfection unit comprising a fluid treatment housing, an electrical supply module and electrical connection means connecting the fluid treatment housing and the electrical supply module; the fluid treatment housing comprising a fluid inlet and a fluid outlet in communication with a reaction chamber, an ultraviolet radiation lamp disposed in the reaction chamber and having a first electrical connection receiving means at a first end thereof and a second end thereof being closed, the second end of the ultraviolet radiation lamp being received and held in place by fixture means; the electrical supply module comprising ballast means and a second electrical connection receiving means; and the electrical connection means comprising lamp receptacle connector means at one end thereof for removable connection to the ultraviolet radiation lamp and electrical connection receiving means for connection to the electrical supply module.

    Abstract translation: 流体消毒单元,包括流体处理壳体,电源模块和连接流体处理壳体和电源模块的电连接装置; 流体处理壳体包括与反应室连通的流体入口和流体出口,设置在反应室中的紫外线辐射灯,并且在其第一端处具有第一电连接接收装置,其第二端被封闭, 紫外线灯的第二端由固定装置接收并保持就位; 所述电源模块包括镇流器装置和第二电连接接收装置; 并且所述电连接装置在其一端包括灯插座连接器装置,用于可拆卸地连接到紫外线灯和用于连接到电源模块的电连接接收装置。

    FLUID TREATMENT SYSTEM AND PROCESS
    26.
    发明申请
    FLUID TREATMENT SYSTEM AND PROCESS 审中-公开
    流体处理系统和流程

    公开(公告)号:WO1994020208A1

    公开(公告)日:1994-09-15

    申请号:PCT/CA1994000125

    申请日:1994-03-04

    Abstract: A fluid treatment system includes one or more radiation sources arranged in an irradiation zone within a treatment zone through which fluid to be treated passes and is irradiated. The irradiation zone has a closed cross section to maintain the fluid within a predefined maximum distance from the radiation source. Preferably, the irradiation zone comprises a reduced cross-sectional area perpendicular to the direction of fluid flow and thus the fluid flow velocity is increased through the irradiation zone. This allows the fluid to enter the treatment zone at relatively low speed, traverse the irradiation zone at high speed and exit the treatment zone again at relatively low speed to minimize the loss of hydraulic head throughout the system. Fluid entering the treatment zone passes through an inlet transition region wherein the cross-sectional area is reduced prior to entering the irradiation zone and fluid exiting the irradiation zone passes through an outlet transition region wherein the cross-sectional area is increased. Each transition region is designed to reduce hydraulic head losses as the fluid flow velocity is increased and decreased. In the irradiation zone, radiation sources are mounted on radiation modules which are arranged to provide improved accessibility for maintenance. The radiation modules may also be provided with cleaning assemblies which are operable to remove materials fouling the radiation sources in situ while the radiation sources are in the irradiation zone.

    Abstract translation: 流体处理系统包括布置在处理区域内的照射区域中的一个或多个辐射源,通过该处理区域照射待处理的流体。 照射区域具有封闭的横截面,以将流体保持在与辐射源预定的最大距离内。 优选地,照射区域包括垂直于流体流动方向的减小的横截面面积,因此流体流速通过照射区域增加。 这允许流体以相对低的速度进入处理区域,以高速穿过照射区域,并以相对低的速度再次离开处理区域,以最小化整个系统中液压头的损失。 进入处理区的流体通过入口过渡区,其中在进入照射区之前横截面积减小,并且离开照射区的流体通过其横截面积增加的出口过渡区。 每个过渡区域被设计成随着流体流速的增加和减小而减小液压头损失。 在照射区域中,辐射源安装在辐射模块上,辐射模块被布置成提供改进的维护可达性。 辐射模块还可以设置有清洁组件,其可操作以在放射源处于照射区域的同时移除原位污染辐射源的材料。

    RADIATION SENSOR DEVICE AND FLUID TREATMENT SYSTEM CONTAINING SAME
    29.
    发明申请
    RADIATION SENSOR DEVICE AND FLUID TREATMENT SYSTEM CONTAINING SAME 审中-公开
    辐射传感器装置和含有相同的流体处理系统

    公开(公告)号:WO2006002522A1

    公开(公告)日:2006-01-12

    申请号:PCT/CA2005/000994

    申请日:2005-06-27

    Abstract: The invention relates to a radiation sensor device comprising a housing, a radiation sensor secured with respect to a first portion of the housing and a heat pipe in thermal communication with the first portion of the housing, the heat pipe being configured to transfer heat from portion of the house to a second portion of the housing remote from the first portion of the housing. The heat pipe may be used advantageously to transport or transfer heat away from the sensor components of the device to an area remote therefrom. The heat pipe can be used to transfer heat at a rate that is thousands of times higher than copper. The radiation sensor device may be used in an ultraviolet radiation fluid treatment system such as an ultraviolet radiation water disinfection system.

    Abstract translation: 本发明涉及一种辐射传感器装置,其包括壳体,相对于壳体的第一部分固定的辐射传感器和与壳体的第一部分热连通的热管,该热管被配置为将热量从部分 的房屋的第二部分远离壳体的第一部分。 热管可以有利地用于将热量从设备的传感器部件传送或传递到远离其的区域。 热管可用于以比铜高出数千倍的速度传递热量。 辐射传感器装置可用于紫外线辐射水处理系统,例如紫外线辐射水消毒系统。

    FLUID TREATMENT SYSTEM
    30.
    发明申请
    FLUID TREATMENT SYSTEM 审中-公开
    流体处理系统

    公开(公告)号:WO2005100251A1

    公开(公告)日:2005-10-27

    申请号:PCT/CA2005/000561

    申请日:2005-04-15

    Abstract: There is disclosed a water treatment appliance, particularly for on-the-counter treatment of potable water. The appliance comprises: a base unit comprising a pump, a housing and a cooling unit for chilling water in the housing; a removable water reservoir engageable with the housing; a control panel comprising a water dispensing switch;an outlet for dispensing treated water from the fluid treatment system; and a treatment cartridge removably disposed in the housing. The treatment cartridge comprises a first chamber and a second chamber in communication with one another. The first chamber is in communication with the housing and has disposed therein a filter element. The second chamber is in communication with the outlet and has disposed therein an ultraviolet radiation lamp.

    Abstract translation: 公开了一种水处理设备,特别是用于对饮用水的处理。 该器具包括:基座单元,包括泵,壳体和用于冷却壳体中的水的冷却单元; 与所述壳体接合的可移除水储存器; 控制面板,包括水分配开关;用于从流体处理系统分配经处理的水的出口; 以及可拆卸地设置在所述壳体中的处理盒。 处理盒包括彼此连通的第一室和第二室。 第一室与壳体连通并且在其中设置有过滤元件。 第二室与出口连通并且在其中设置有紫外线辐射灯。

Patent Agency Ranking