RADIATION SOURCE CARTRIDGE AND MODULE CONTAINING SAME
    1.
    发明申请
    RADIATION SOURCE CARTRIDGE AND MODULE CONTAINING SAME 审中-公开
    辐射源盒和包含它的模块

    公开(公告)号:WO2010069072A1

    公开(公告)日:2010-06-24

    申请号:PCT/CA2009/001856

    申请日:2009-12-16

    Abstract: There is disclosed an elongate radiation source cartridge. The cartridge comprises: (i) an elongate radiation source assembly having a proximal portion and distal portion, the distal portion of the elongate radiation source assembly being unsupported, (ii) a housing coupled to the proximal portion of the elongate radiation source assembly, and (iii) a power supply disposed within the housing, the power supply in electrical communication with the elongate radiation source assembly (in certain embodiments the power supply is optional). The elongate radiation source assembly and the housing are in substantial alignment with respect to a longitudinal axis of the elongate radiation source cartridge.

    Abstract translation: 公开了一种细长的辐射源盒。 盒包括:(i)具有近端部分和远端部分的细长辐射源组件,细长辐射源组件的远端部分未被支撑,(ii)耦合到细长辐射源组件的近侧部分的壳体,以及 (iii)设置在壳体内的电源,与细长辐射源组件电连通的电源(在某些实施例中,电源是可选的)。 细长辐射源组件和壳体相对于细长辐射源盒的纵向轴线基本对准。

    FLUID TREATMENT SYSTEM
    2.
    发明申请
    FLUID TREATMENT SYSTEM 审中-公开
    流体处理系统

    公开(公告)号:WO2007071042A1

    公开(公告)日:2007-06-28

    申请号:PCT/CA2006/002084

    申请日:2006-12-21

    CPC classification number: A61L2/10 C02F1/325 C02F2201/004 C02F2303/14

    Abstract: There is described a fluid treatment system which may which may be used with radiation sources that do not require a protective sleeve - e.g., excimer radiation sources. An advantage of the present fluid system treatment is that the radiation sources may be removed from the fluid treatment zone without necessarily having to shut down the fluid treatment system, remove the fluid, break the seals which retain fluid tightness, replace/service radiation source and than reverse the steps. Instead, the present fluid treatment system allows for service/replacement of the radiation sources in the fluid treatment zone during operation of the fluid treatment system.

    Abstract translation: 描述了可以与不需要保护套筒(例如准分子辐射源)的辐射源一起使用的流体处理系统。 本流体系统处理的优点是可以从流体处理区域去除辐射源,而不必关闭流体处理系统,去除流体,破坏保持流体密封性的密封件,更换/使用辐射源和 反转步骤。 相反,本流体处理系统允许在流体处理系统的操作期间对流体处理区域中的辐射源进行维修/更换。

    RADIATION SENSOR DEVICE AND RADIATION SOURCE MODULE CONTAINING SAME
    5.
    发明申请
    RADIATION SENSOR DEVICE AND RADIATION SOURCE MODULE CONTAINING SAME 审中-公开
    辐射传感器装置和包含它的辐射源模块

    公开(公告)号:WO2005031288A1

    公开(公告)日:2005-04-07

    申请号:PCT/CA2004/001701

    申请日:2004-09-29

    Abstract: A radiation sensor device comprising a body portion having an entrance through which radiation may enter the body portion, a radiation detector and an optical filter interposed between the entrance and the radiation detector. The radiation detector is capable of detecting radiation having at least one wavelength in the range of from about 125 nm to about 1100 nm, and comprises: (i) a silicon-containing material comprising an n-doped layer disposed on a pair of p-doped layers, and (ii) a passivation layer disposed on a radiation impingement surface of the silicon­containing material, the passivation layer comprising nitrided silicon dioxide, a metal silicide and mixtures thereof. The optical filter has: (i) an optical transmittance of at least about 40% at a wavelength in the range of from about 175 nm to about 300 nm, and (ii) an optical transmittance of no greater than about 5% at a wavelength greater than about 350 nm.

    Abstract translation: 一种辐射传感器装置,包括具有入射部分的主体部分,辐射可以通过该入口进入主体部分,放射线检测器和插入在入射口和辐射检测器之间的光学滤光器。 辐射检测器能够检测具有在约125nm至约1100nm范围内的至少一个波长的辐射,并且包括:(i)含硅材料,其包含设置在一对p- 掺杂层,以及(ii)设置在所述含硅材料的辐射冲击表面上的钝化层,所述钝化层包括氮化二氧化硅,金属硅化物及其混合物。 光学滤波器具有:(i)在约175nm至约300nm范围内的波长处的至少约40%的光透射率,以及(ii)波长处的光透射率不大于约5% 大于约350nm。

    ULTRAVIOLET FLUID TREATMENT SYSTEM
    6.
    发明申请
    ULTRAVIOLET FLUID TREATMENT SYSTEM 审中-公开
    ULTRAVIOLET流体处理系统

    公开(公告)号:WO2004033375A1

    公开(公告)日:2004-04-22

    申请号:PCT/CA2003/001473

    申请日:2003-10-06

    CPC classification number: A61L2/10 C02F1/325 C02F2201/3227 C02F2201/324

    Abstract: A fluid treatment system (100) for placement in a flanged pipe fluid conveyance system. The fluid treatment system (100) comprises a flanged ductile iron pipe fitting (105). The ductile iron pipe fitting (105) comprises: a first flanged opening (110) and a second flanged opening (120) in substantial alignment to define a flow axis aligned substantially parallel to a direction of fluid flow (A) through the first opening (110) and the second opening (120); and a third flanged opening (130) comprising a first cover element (155). The first cover element (155) has connected thereto at least one radiation source (150) assembly comprising at least one elongate radiation source having a longitudinal axis substantially transverse to the flow axis. In its preferred form, the fluid treatment system may be advantageously utilized to treat fluid such as water, e.g., municipal waste water, municipal drinking water and the like. The fluid treatment system is particularly advantageous since it utilizes a standard ductile iron pipe fitting (105) and thus, can be readily "spliced" into existing piping systems. This facilitates installation of the system and also allows for a significant lowering of manufacturing costs of the system.

    Abstract translation: 一种用于放置在法兰管道流体输送系统中的流体处理系统(100)。 流体处理系统(100)包括带凸缘的球墨铸铁管件(105)。 球墨铸铁管件(105)包括:第一凸缘开口(110)和第二凸缘开口(120),基本上对准以限定通过第一开口(大致平行于流体流动方向(A))排列的流动轴线 110)和第二开口(120); 和包括第一盖元件(155)的第三凸缘开口(130)。 第一覆盖元件(155)连接有至少一个辐射源(150)组件,其包括至少一个具有基本上横向于流动轴线的纵向轴线的细长辐射源。 在其优选形式中,流体处理系统可以有利地用于处理诸如水的流体,例如城市废水,市政饮用水等。 流体处理系统是特别有利的,因为它使用标准的球墨铸铁管件(105),因此可以容易地“拼接”到现有管道系统中。 这有助于系统的安装,并且还可以显着降低系统的制造成本。

    UV FLUID TREATMENT DEVICE AND METHOD
    7.
    发明申请
    UV FLUID TREATMENT DEVICE AND METHOD 审中-公开
    UV流体处理装置和方法

    公开(公告)号:WO1996011879A1

    公开(公告)日:1996-04-25

    申请号:PCT/CA1995000578

    申请日:1995-10-17

    Abstract: A fluid treatment device comprising a housing for receiving a flow of fluid, the housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, and at least one radiation source module disposed in the fluid treatment zone, the at least one radiation source module comprising a radiation source sealably connected to a leg, the leg sealably mounted to the housing, the radiation source being disposed substantially parallel to the flow of fluid. A method of treating a fluid in a housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, the fluid treatment zone having at least one radiation source disposed therein is also described. The method comprises the steps of: (i) providing a flow of the fluid to the fluid inlet; (ii) feeding the flow of fluid from the fluid inlet to the fluid treatment zone in a manner substantially parallel to the at least one radiation source; (iii) irradiating the flow of fluid in the fluid treatment zone; and (iv) feeding the flow of fluid to the fluid outlet. During the method, the flow of fluid through the fluid inlet, the fluid outlet and the fluid treatment zone is substantially collinear. The fluid treatment device and method are ideally suited (but not limited) to inactivate microorganisms present in water.

    Abstract translation: 一种流体处理装置,包括用于接收流体流的壳体,所述壳体包括流体入口,流体出口,设置在流体入口和流体出口之间的流体处理区,以及设置在流体中的至少一个辐射源模块 所述至少一个辐射源模块包括可密封地连接到腿部的辐射源,所述腿部可密封地安装到所述壳体,所述辐射源被设置为基本上平行于流体流动。 还描述了一种处理壳体中的流体的方法,包括流体入口,流体出口,设置在流体入口和流体出口之间的流体处理区,其中设置有至少一个辐射源的流体处理区。 该方法包括以下步骤:(i)向流体入口提供流体流; (ii)以基本上平行于所述至少一个辐射源的方式将所述流体流体从所述流体入口供给到所述流体处理区; (iii)照射流体处理区中的流体流; 和(iv)将流体流供给流体出口。 在该方法期间,流体通过流体入口,流体出口和流体处理区域的流动基本上共线。 流体处理装置和方法理想地适合(但不限于)灭活水中存在的微生物。

    PROCESS FOR TREATMENT OF A FLUID
    8.
    发明申请
    PROCESS FOR TREATMENT OF A FLUID 审中-公开
    用于治疗流体的方法

    公开(公告)号:WO1992011915A1

    公开(公告)日:1992-07-23

    申请号:PCT/CA1992000010

    申请日:1992-01-08

    Abstract: A process for treating a fluid comprising at least one chemical contaminant. The process comprises the steps of: (i) contacting the fluid with a particulate adsorbent material; (ii) allowing the adsorbent material to adsorb the chemical contaminant to produce a substantially purified fluid and a contaminant-carrying adsorbent material; (iii) separating the contaminant-carrying adsorbent material from the substantially purified fluid; (iv) contacting the contaminant-carrying adsorbent material with an aqueous slurry of a photocatalytic metal oxide powder in the presence of an electron acceptor and electromagnetic radiation in at least one of ultraviolet and visible regions; (v) allowing the contaminant to decompose to form a product which dissociates from the contaminant-carrying adsorbent to provide a regenerated adsorbent material, the aqueous slurry and the product; (vi) separating and recycling the regenerated adsorbent material to step (i); and (vii) recycling the aqueous slurry to step (iv). The process may be used to remove contaminants from and thereby purify fluids such as water, off-gases from air stripping processes and chimney gases.

    Abstract translation: 一种用于处理包含至少一种化学污染物的流体的方法。 该方法包括以下步骤:(i)使流体与颗粒状吸附材料接触; (ii)允许吸附材料吸附化学污染物以产生基本上纯化的流体和携带污染物的吸附材料; (iii)将含污染物的吸附剂材料与基本上纯化的流体分离; (iv)在电子受体和电磁辐射的存在下,在紫外线和可见光区域中的至少一个中使含污染物的吸附剂材料与光催化金属氧化物粉末的水性浆料接触; (v)允许污染物分解形成与污染物携带吸附剂离解的产物,以提供再生的吸附剂材料,含水浆料和产品; (vi)将再生的吸附材料分离并再循环到步骤(i); 和(vii)将含水浆料再循环到步骤(iv)。 该方法可用于从污染物中除去污染物,从而净化流体,例如水,脱气过程和烟囱气体的废气。

    FLUID TREATMENT SYSTEM
    9.
    发明申请
    FLUID TREATMENT SYSTEM 审中-公开
    流体处理系统

    公开(公告)号:WO2007109895A1

    公开(公告)日:2007-10-04

    申请号:PCT/CA2007/000495

    申请日:2007-03-28

    CPC classification number: C02F1/325 C02F2201/004 C02F2201/3223 C02F2201/326

    Abstract: There is disclosed a fluid treatment device comprising a housing for receiving a flow of fluid. The housing comprises a fluid inlet, a fluid outlet, a closed fluid treatment zone disposed between the fluid inlet and the fluid outlet. Disposed in the housing is at least one elongate radiation source assembly having a longitudinal axis disposed in the fluid treatment zone substantially parallel to a direction of the flow of fluid through the housing. The radiation source assembly comprises an elongate radiation source disposed in a protective sleeve to define a substantially annular passageway. The protective sleeve has opposed open ends configured to permit heat to exit the passageway and the housing through at least one of the opposed open ends of the sleeve.

    Abstract translation: 公开了一种流体处理装置,其包括用于接收流体流的壳体。 壳体包括流体入口,流体出口,设置在流体入口和流体出口之间的封闭流体处理区。 设置在壳体中的至少一个细长辐射源组件具有设置在流体处理区域中的纵向轴线,该纵向轴线基本上平行于通过壳体的流体流动的方向。 辐射源组件包括设置在保护套筒中以限定大致环形通道的细长辐射源。 保护套具有相对的开口端,其构造成允许热量通过套筒的相对开口端中的至少一个离开通道和壳体。

    ULTRAVIOLET RADIATION LAMP AND SOURCE MODULE AND TREATMENT SYSTEM CONTAINING SAME
    10.
    发明申请
    ULTRAVIOLET RADIATION LAMP AND SOURCE MODULE AND TREATMENT SYSTEM CONTAINING SAME 审中-公开
    ULTRAVIOLET辐射灯和源模块及其处理系统

    公开(公告)号:WO2006122394A1

    公开(公告)日:2006-11-23

    申请号:PCT/CA2006/000763

    申请日:2006-05-15

    CPC classification number: H01J61/52 C02F1/32 C02F2201/004 H01J61/20

    Abstract: The present invention relates to an ultraviolet radiation lamp. The lamp comprises: (i) a substantially sealed cavity comprising a mercury-containing material; and (ii) a heating unit disposed exteriorly with respect to the cavity. The heating unit is disposed in contact with a first portion of the cavity comprising the mercury- containing material. The heating unit has adjustable heat output.

    Abstract translation: 本发明涉及紫外线辐射灯。 灯包括:(i)包含含汞材料的基本上密封的空腔; 和(ii)相对于空腔设置在外部的加热单元。 加热单元设置成与包含含汞材料的空腔的第一部分接触。 加热单元具有可调节的热量输出。

Patent Agency Ranking