公开(公告)号：KR1020120130968A

公开(公告)日：2012-12-04

申请号：KR1020110049091

申请日：2011-05-24

Applicant: 삼성전자주식회사

Inventor： 한일영 ,  권재성 ,  박상욱 ,  김원근

IPC: H01L21/50

CPC classification number: H01L21/67115 ,  H01L21/67178 ,  H01L21/6719 ,  H05B6/80 ,  H01L21/50 ,  H01L21/64 ,  H01L21/67

Abstract: PURPOSE: An apparatus for manufacturing a semiconductor is provided to maintain a cleaning period to be long by absorbing microwaves which are reflected from a processing chamber. CONSTITUTION: A chamber comprises a bottom plane, a sidewall, and a cover(20). An irradiation unit(180) is located inside the chamber. A substrate mounting unit(30) is arranged between the bottom plane and the irradiation unit. An irradiation tube is formed into a disk shape with an opening lower side. A center hole passes through the center of the irradiation tube.

Abstract translation: 目的：提供一种用于制造半导体的装置，通过吸收从处理室反射的微波来保持清洁周期较长。 构成：室包括底平面，侧壁和盖（20）。 照射单元（180）位于室内。 衬底安装单元（30）布置在底平面和照射单元之间。 照射管形成为具有开口下侧的盘状。 中心孔穿过照射管的中心。