公开(公告)号：KR1020130087414A

公开(公告)日：2013-08-06

申请号：KR1020130005329

申请日：2013-01-17

Applicant: 실트로닉 아게

Inventor： 모리요시히로 ,  하이바라테루오 ,  쿠보에츠코 ,  우치베마사시

IPC: H01L21/302

CPC classification number: B08B3/12 ,  B08B3/10

Abstract: PURPOSE: A cleaning device, cleaning equipment, and a cleaning method are provided to prevent the generation of the area of an object to which an ultrasound wave is not directly irradiated. CONSTITUTION: A cleaning tank (2) maintains cleaning solutions (4) for cleaning a substrate (10). A coupling tank (3) maintains an intermediate medium (5). An ultrasound generator (6) irradiates an ultrasound vibration to the cleaning solutions through the intermediate medium. A changing unit (7) changes the difference of a sound speed between the cleaning solutions and the intermediate medium. The changing unit includes a temperature control unit to change the temperature of the intermediate medium.

Abstract translation: 目的：提供清洁装置，清洁设备和清洁方法，以防止产生超声波未直接照射的物体的区域。 构成：清洁槽（2）保持用于清洁基底（10）的清洁溶液（4）。 联接箱（3）保持中间介质（5）。 超声波发生器（6）通过中间介质向清洁溶液照射超声波振动。 改变单元（7）改变清洁溶液和中间介质之间的声速的差异。 改变单元包括用于改变中间介质的温度的温度控制单元。