Abstract:
A manufacturing method of a surface plasmonic color filter includes the steps of: (a) forming a metal film on a substrate; (b) forming a photosensitive layer on the metal layer; (c) forming a periodical nono hole array on the photosensitive layer by emitting a laser interference pattern on the photosensitive layer; (d) etching the metal film by using the nano hole array on the photosensitive layer to form another nano hole array on the metal film; and (e) removing the photosensitive layer with the nano hole array from the metal film with the nano hole array and forming a dielectric layer on the metal layer with the nano hole array.
Abstract:
A manufacturing method of a surface plasmonic color filter includes: a step (a) of forming a photonic crystal structure on a substrate; a step (b) of forming a first dielectric layer on the photonic crystal structure; a step (c) of forming a metal film on the first dielectric layer; a step (d) of forming a photosensitive layer on the metal film; a step (e) of forming a nano-hole array having periodicity on the photosensitive layer by irradiating laser interference patterns on the photosensitive layer; a step (f) of forming a nano-hole array on the metal film by etching the metal film using the nano-hole array of the photosensitive layer; and a step (g) of removing the photosensitive layer having the nano-hole array from the metal film on which the nano-hole array is formed and forming a second dielectric layer including the same dielectric substance as the dielectric substance included in the first dielectric layer on the metal film on which the nano-hole array is formed. The cutoff wavelength band of the photonic crystal structure is different from the pass wavelength band of the nano-hole array.