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公开(公告)号：KR100979748B1
公开(公告)日：2010-09-02
申请号：KR1020090114809
申请日：2009-11-25
Applicant: 한국기계연구원
CPC classification number: C01B3/24 , B01J19/088 , C01B2203/0211 , H05H1/24 , Y02E60/50
Abstract: PURPOSE: A plasma reformer for generating hydrogen is provided to limit a domain in which reactive gas stays to a central zone of a plasma jet having a high temperature and to improve hydrogen reforming efficiency by extending residence time of the reactive gas and increasing a conversion rate. CONSTITUTION: A plasma reformer(100) for generating hydrogen comprises: a first electrode part(10) forming a reactive gas inlet passing through a central axis; an insulation part(20) combined with first electrode part; a second electrode part(30) which is combined with the insulation part to surround a part of the first electrode part, forms a discharge space along the central axis, and forms a discharge gas inlet to the radial direction of the discharge space; and a discharge gas injection ring(40) which is installed on the inner part of the second electrode part, is connected to the discharge gas inlet, and converts the discharge gas into eddy current.
Abstract translation: 目的：提供一种用于产生氢气的等离子体重整器，以限制其中反应气体停留在具有高温的等离子体射流的中心区域的区域，并通过延长反应气体的停留时间并提高转化率来提高氢气重整效率 。 构成：用于产生氢的等离子体重整器（100）包括：形成通过中心轴的反应气体入口的第一电极部分（10） 与第一电极部分组合的绝缘部分（20）; 与所述绝缘部组合以包围所述第一电极部的一部分的第二电极部（30）沿着所述中心轴形成放电空间，并且在所述放电空间的径向方向形成放电气体入口; 并且安装在第二电极部分的内部的放电气体注入环（40）连接到放电气体入口，并将放电气体转换成涡流。
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公开(公告)号：KR1020100095127A
公开(公告)日：2010-08-30
申请号：KR1020090014248
申请日：2009-02-20
Applicant: 한국기계연구원
Abstract: PURPOSE: A high temperature and low velocity syringe pump system for solid melting injection is provided to supply pure molten sample into a reactor with a fixed quantity. CONSTITUTION: A high temperature comprises a syringe body(20), a syringe piston(30), a solid sample feeder(50), a drive unit(40) and a controller(60). A vent with a valve discharging melted solid sample is formed on the syringe body. The syringe piston moves side to side along the syringe body. The solid sample feeder supplies solid simple to a feed port which is formed on the syringe body. The drive unit moves the syringe piston side to side. The controller controls the movement of the syringe piston located inside the syringe body.
Abstract translation: 目的：提供用于固体熔融注射的高温和低速注射泵系统，以将固体熔融样品供应到固定量的反应器中。 构成：高温包括注射器主体（20），注射器活塞（30），固体样品进料器（50），驱动单元（40）和控制器（60）。 在注射器主体上形成具有排出熔融固体样品的阀的排气口。 注射器活塞沿注射器主体一侧移动。 固体样品进料器简单地供给到形成在注射器主体上的进料口。 驱动单元将注射器活塞侧移动到一侧。 控制器控制位于注射器体内的注射器活塞的运动。
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公开(公告)号：KR1020100068082A
公开(公告)日：2010-06-22
申请号：KR1020080126778
申请日：2008-12-12
Applicant: 한국기계연구원
Abstract: PURPOSE: A plasma LNT(Lean NOx Trap) system and a plasma reformer are provided to regenerate a storage catalyst in an LNT by supplying a large amount of hydrogen generated by the plasma reformer to the LNT. CONSTITUTION: A plasma LNT system comprises an exhaust pipe(10), an LNT(20), a plasma reformer(30), and a reductant gas feeder(40). The exhaust pipe discharges exhaust gas from an engine. The LNT is embedded with a storage catalyst to absorb nitric oxide included in the exhaust gas and is installed in the exhaust pipe. The plasma reformer generates reductant gas by reforming a fuel through plasma reaction between the fuel and reactive gas. The reductant gas feeder is installed in the exhaust pipe and is connected to the plasma reformer to supply the reductant gas and reduce the nitric oxide from the storage catalyst in the event of a rich-fuel condition in the engine.
Abstract translation: 目的：提供等离子体LNT（精益NOx捕集阱）系统和等离子体重整器，以通过向LNT提供由等离子体重整器产生的大量氢气来再生LNT中的储存催化剂。 构成：等离子体LNT系统包括排气管（10），LNT（20），等离子体重整器（30）和还原剂气体供给器（40）。 排气管从发动机排出废气。 LNT嵌有储存催化剂，以吸收排气中包含的一氧化氮，并安装在排气管中。 等离子体重整器通过燃料和反应气体之间的等离子体反应重整燃料而产生还原气体。 还原剂气体供给器安装在排气管中，并连接到等离子体重整器，以在发动机处于富油状态的情况下供应还原气体并减少来自储存催化剂的一氧化氮。
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公开(公告)号：KR1020090065810A
公开(公告)日：2009-06-23
申请号：KR1020070133307
申请日：2007-12-18
Applicant: 한국기계연구원
Abstract: An ammonia generation system and a process for the removal of nitrogen oxide are provided to effectively remove nitrogen oxide together with an SCR catalyst by supplying the SCR catalyst to exhaust gas, of which nitrogen oxide to be removed exists. An ammonia generation system for the removal of nitrogen oxide comprises: a nitrogen oxide generator(10) which generates nitrogen oxide by using the air; a burner(20) which removes the oxygen mixed with the nitrogen oxide; a reformer(30) which generates reforming gas mainly including the hydrogen and carbon monoxide by using the fuel and the air; and an ammonia generator(40) which generates ammonia by synthesizing the nitrogen oxide and hydrogen. The nitrogen oxide generator generates gas containing 0-5% of nitrogen oxide by using plasma.
Abstract translation: 提供氨生成系统和除去氮氧化物的方法，通过将SCR催化剂供应到其中需要除去的氮氧化物的废气中，与SCR催化剂一起有效地除去氮氧化物。 用于去除氮氧化物的氨生成系统包括：通过使用空气产生氮氧化物的氮氧化物发生器（10）; 除去与氮氧化物混合的氧气的燃烧器（20）; 重整器（30），其通过使用燃料和空气生成主要包括氢和一氧化碳的重整气体; 和通过合成氮氧化物和氢气生成氨的氨发生器（40）。 氮氧化物发生器通过使用等离子体产生含有0-5％氮氧化物的气体。
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公开(公告)号：KR1020080073412A
公开(公告)日：2008-08-11
申请号：KR1020070011979
申请日：2007-02-06
Applicant: 한국기계연구원
CPC classification number: H01J37/32559 , H01J37/32009 , H01J37/3244 , H01J37/32522 , H01J37/32541 , H01J37/3255 , H05H1/46
Abstract: A remote low temperature plasma reactor is provided to reduce an error rate and improve yield of objects to be processed by intrinsically blocking the generation of secondary pollution material which may be generated from a secondary arc or a connection part. A remote low temperature plasma reactor includes a dielectric material(10) made of ceramic. A plurality of grooves having a shape of U are formed in the dielectric material in a lengthwise direction so as to be separated with a predetermined distance. A metal electrode(20) is coated on a top side of the dielectric material with a predetermined width and a predetermined depth to generate plasma at a wide area. A protective insulation coating material(30) is coated on a surface of the metal electrode to protect and insulate the surface of the metal electrode. A ground electrode groove is formed on a bottom side of the dielectric material. A ground electrode(50) is coated on the ground electrode groove. An insulation coating material(40) is coated on a surface of the ground electrode.
Abstract translation: 提供了一种远程低温等离子体反应器，以通过固有地阻塞可能由二次电弧或连接部分产生的二次污染物质的产生来降低误差率并提高待处理物体的产量。 远程低温等离子体反应器包括由陶瓷制成的电介质材料（10）。 在电介质材料中沿长度方向形成多个具有U形状的凹槽，以便以预定距离分开。 金属电极（20）以预定的宽度和预定的深度涂覆在电介质材料的顶侧上，以在宽的区域产生等离子体。 保护绝缘涂层材料（30）涂覆在金属电极的表面上，以保护和绝缘金属电极的表面。 在电介质材料的底侧形成接地电极槽。 接地电极（50）涂覆在接地电极槽上。 绝缘涂层材料（40）涂覆在接地电极的表面上。
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Patent Agency Ranking
公开(公告)号：KR100746570B1
公开(公告)日：2007-08-06
申请号：KR1020060064708
申请日：2006-07-11
IPC: H01L21/3065
Abstract: A strip remote plasma system for photoresist of a semiconductor wafer and an FPD(Flat Panel Device) substrate and its method are provided to remove effectively the photoresist from the wafer and substrate by supplying directly active radicals and a high temperature water with dissolved active radicals onto the wafer and substrate in a reaction case. A door of a photoresist removing system is opened(S10). A semiconductor wafer is loaded into the photoresist removing system through the door(S20). The door is closed(S30). A high temperature water and a reaction gas are supplied into the photoresist removing system(S40). A power source is applied to plasma electrodes to generate plasma(S50). The plasma and the high temperature water are mixed and heavily concentrated active radicals are generated(S55). Photoresist is removed from the wafer by using the reaction gas, the high temperature water and active radicals(S60). A mixed gas of the reaction gas and the active radicals and the high temperature water are exhausted from the photoresist removing system(S70). Then, the wafer is unloaded from the photoresist removing system.
Abstract translation: 提供了用于半导体晶片的光刻胶和FPD（平板设备）衬底的带状远程等离子体系统及其方法，以通过将活性自由基和具有溶解的活性自由基的高温水直接供应到晶片和衬底上来有效去除光刻胶 晶片和衬底在反应情况下。 打开光刻胶去除系统的门（S10）。 通过门将半导体晶片装载到光刻胶去除系统中（S20）。 门关闭（S30）。 将高温水和反应气体供应到光刻胶去除系统（S40）。 将电源施加到等离子体电极以产生等离子体（S50）。 等离子体和高温水混合并产生高度浓缩的活性自由基（S55）。 通过使用反应气体，高温水和活性自由基（S60）将光刻胶从晶片上除去。 反应气体和活性基的混合气体以及高温水从光刻胶去除系统排出（S70）。 然后，从光刻胶去除系统中卸载晶片。
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公开(公告)号：KR100561199B1
公开(公告)日：2006-03-15
申请号：KR1020050111486
申请日：2005-11-21
Applicant: 한국기계연구원
IPC: H05H1/42
Abstract: 본 발명은 플라즈마 반응장치에 관한 것으로서, 반응로의 상부에 플라즈마 반응대를 일시 정체시키기 위한 광역챔버를 형성하여 연속된 플라즈마 반응이 이루어질 수 있도록 하고, 상기 광역챔버 상에 플라즈마 반응대가 정체됨에 따라 생성된 고온 영역에 액상 원료의 흡열을 위한 흡열탱크를 구성하여 공급되는 액상 원료를 미립화 및 기화시켜 혼합성을 높이고 반응특성을 최적화시킴으로써, 반응효율을 높일 수 있음과 동시에, 전극이 반응로 내부에 액상 원료의 유입을 위한 구조를 갖도록 하여 원료의 추가 공급시 관체 등의 추가되는 설비를 최대한 배제시킬 수 있는 플라즈마 반응장치에 관한 것이다.
플라즈마, 반응, 전극, 흡열, 원료Abstract translation: 产生本发明形成用于暂时停滞的等离子体反应区广域室到反应器的顶部，也可以由连续的等离子体反应器中，在广域室的等离子体反应考虑拥塞涉及的等离子体反应器 所述从而优化响应特性得到改善的混合雾化和汽化的液体原料被供应到配置热吸收罐，用于吸收的液体原料在高温区域，在同一时间可以提高反应效率，液体的反应器内的电极 更具体地说，涉及一种等离子体反应器，该等离子体反应器能够在额外提供原料时尽可能多地消除诸如管状体的附加设备。
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公开(公告)号：KR100550467B1
公开(公告)日：2006-02-08
申请号：KR1020050044523
申请日：2005-05-26
Applicant: 한국기계연구원
IPC: H05H1/26
Abstract: 본 발명은 연속 반응구간이 형성된 플라즈마 반응장치에 관한 것으로서, 더욱 상세하게는 반응로와 상기 반응로 내측에 설치되는 전극과의 높은 전압차를 이용하여 플라즈마 반응을 유도하고 스월구조를 형성하여 플라즈마 반응 원료가 회전유동하도록 함으로써 수 초 내에 고온 상태의 반응을 개시할 수 있으며, 촉매를 구비함으로써 플라즈마 반응 후 재차 촉매반응을 일으키도록 할 수 있으며, 반응구간과 촉매구간 또는 제 1차 반응구간과 제 2차 반응구간 및 촉매구간을 구획함으로써 다양한 플라즈마 반응을 유도할 수 있는 연속 반응구간이 형성된 플라즈마 반응장치에 관한 것이다.
플라즈마, 촉매, 반응로, 연속반응구간Abstract translation: 更具体地说，本发明涉及一种等离子体反应器，其中利用反应炉和布置在反应炉内部的电极之间的高压差引起等离子体反应以形成涡流结构， 和原料能够通过使旋转流以发起在几秒钟的反应的高温条件下，通过提供该催化剂可以是使等离子体反应后的再催化，反应区与催化剂区或第一反应区的第二 以及通过分配反应区和催化剂区能够引起各种等离子体反应的连续反应区。
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公开(公告)号：KR100522166B1
公开(公告)日：2005-10-18
申请号：KR1020050044527
申请日：2005-05-26
Applicant: 한국기계연구원
IPC: H05H1/26
Abstract: 본 발명은 플라즈마 반응장치에 관한 것으로서 더욱 상세하게는 반응로와 상기 반응로 내측에 설치되는 전극과의 높은 전압차를 이용하여 플라즈마 반응을 유도하고 스월구조를 형성하여 반응원인 원료가 회전유동하도록 함으로써 수 초 내에 고온 상태의 반응을 개시할 수 있으며, 격벽구조를 형성하거나 배출구의 직경을 작게 형성시킴으로써 반응물질의 배출을 간섭하여 반응시간을 증대시킴에 따라 반응효율이 향상되는 플라즈마 반응장치에 관한 것이다.
이를 위해 본 발명은 중공의 반응로와; 상기 반응로의 내부에 플라즈마 반응을 위한 방전전압을 생성시키기 위해 상기 반응로의 내벽과 일정거리 이격되는 형태로 상기 반응로의 저면으로 내입되는 전극;을 포함하여 구성되고, 상기 반응로에는 원료의 유입을 위한 원료유입로가 상기 반응로의 벽면에 형성된 유입홀을 매개로 연통되고, 상기 유입홀은 유입되는 원료가 회전류를 형성하며 진행될 수 있도록 경사진 형태로 형성되며, 상기 반응로의 상측에는 상기 반응로의 내부로부터 반응물을 배출시키기 위한 배출구가 형성되되, 상기 배출구는 배출되는 반응물의 흐름이 제한될 수 있도록 그 직경이 상기 반응로의 내경 보다 상대적으로 작게 형성된다.-
公开(公告)号：KR1020020024572A
公开(公告)日：2002-03-30
申请号：KR1020010084294
申请日：2001-12-24
Applicant: (주) 퍼시픽 글로벌 , 한국기계연구원
IPC: B01D53/32
CPC classification number: B01D53/32 , B01D2259/818
Abstract: PURPOSE: A system for treating harmful gases using flat type multiple nonthermal plasma reactor is provided which exposes polluting gas to plasma of high density using a flat type multiple plasma generator made of ceramic material, and applies generation of dielectric heat due to generation of plasma to the gas treatment. CONSTITUTION: The system for treating harmful gases using flat type multiple nonthermal plasma reactor comprises a square or rectangular duct(40); a gas inlet port(11) which is installed on the upper part of the duct(40), and into which a gas is flown; an air filter(or dust collector)(10) which is installed at the backside of the gas inlet port(11) so as to filter the gas flown in; a suction fan or an intake port(20) which is installed at the backside of the air filter(or dust collector)(10), and which sucks in the gas filtered in the air filter(or dust collector)(10); a nonthermal plasma reactor(30) which is formed at the lower part of a bended pipe or duct installed at the rear end of the suction fan or the intake port(20), which generates plasma, and to which a discharging DC power supply unit(50) is adhered; a metallic filter(60) which is formed at the lower pat of the nonthermal plasma reactor(30); plural cartridge shaped catalytic reactor(70) which are formed at the lower part of the metallic filter(60); an inlet fan or a feed fan(80) which is formed at the lower part of the catalytic reactor(70); and a gas exhaust port(81) which is formed on one side surface of the inlet fan or the feed fan(80) so as to exhaust gas.
Abstract translation: 目的：提供一种使用平板式多重非等温电抗器处理有害气体的系统，其使用由陶瓷材料制成的扁平型多等离子体发生器将污染气体暴露于高密度等离子体，并且由于产生等离子体而产生介电热 气体处理。 构成：使用扁平型多重非等离子体反应器处理有害气体的系统包括方形或矩形管道（40）; 气体入口（11），其安装在所述管道（40）的上部，并且气体流入所述入口端口; 空气过滤器（或集尘器）（10），其安装在气体入口（11）的后侧，以便过滤流入的气体; 吸入风扇或吸入口（20），其安装在空气过滤器（或集尘器）（10）的背面，并吸入在空气过滤器（或集尘器）（10）中过滤的气体中。 一个非热等离子体反应器（30），其形成在安装在吸风机或进气口（20）的后端处的弯曲管道或管道的下部，其产生等离子体，并且放电直流电源单元 （50）粘附; 形成在非热等离子体反应器（30）的下部的金属过滤器（60）; 多个筒形催化反应器（70），其形成在金属过滤器（60）的下部; 入口风扇或进料风扇（80），其形成在催化反应器（70）的下部; 和排气口（81），其形成在入口风扇或供给风扇（80）的一个侧面上以排出废气。
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