公开(公告)号：US20210273126A1

公开(公告)日：2021-09-02

申请号：US17257878

申请日：2019-07-18

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Mark B. O'Neill ,  Gary E. Gaides ,  Joseph B. Eckel ,  Aaron K. Nienaber ,  Ronald D. Jesme ,  Mark D. Weigel

IPC: H01L31/054 ,  G02B5/00

Abstract: According to one embodiment, a solar device, comprises one or more photovoltaic cells disposed in an encapsulant and a light control structure including a louver film having a series of louver structures, wherein each louver structure includes one or more groupings of a plurality magnetizable particles aligned at least in a first orientation dispersed in a binding matrix. The light control structure substantially transmits light incident at a first angle and substantially limits transmission of light incident at a second angle. Each louver structure is spaced apart from an adjacent louver structure, wherein each louver structure is substantially aligned in a plane substantially parallel to an adjacent louver structure.

公开(公告)号：US20190153586A1

公开(公告)日：2019-05-23

申请号：US16256627

申请日：2019-01-24

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Mark A. Roehrig ,  Alan K. Nachtigal ,  Mark D. Weigel

IPC: C23C14/08 ,  B05D1/00 ,  B05D3/06 ,  C23C14/12 ,  C23C14/10 ,  C23C14/24 ,  C08J7/04 ,  C23C14/54 ,  C23C14/34 ,  B05D7/04

Abstract: A process for making a barrier film having a substrate, a base polymer layer applied to the substrate, an oxide layer applied to the base polymer layer, and a top coat polymer layer applied to the oxide layer is provided. An optional inorganic layer can be applied over the top coat polymer layer. The top coat polymer layer is formed by vapor depositing and curing cyclic aza-silane and acrylate monomer. The use of a silane co-deposited with an acrylate to form the top coat layer of the barrier films provide for enhanced resistance to moisture and improved peel strength adhesion of the top coat layer to the underlying barrier stack layers.

公开(公告)号：US10038112B2

公开(公告)日：2018-07-31

申请号：US15429649

申请日：2017-02-10

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Mark D. Weigel ,  Mark A. Roehrig ,  Samuel Kidane ,  Michael D. Delmore ,  Tracie J. Berniard

IPC: H01L31/048 ,  H01L31/049 ,  H01L31/032

CPC classification number: H01L31/0481 ,  H01L31/0322 ,  H01L31/049 ,  Y02B10/12 ,  Y02E10/50

Abstract: The present application is directed to an assembly comprising an electronic device, and a multilayer film. The multilayer film comprises a barrier stack adjacent the electronic device; and a weatherable sheet adjacent the barrier stack opposite the electronic device. The assembly additionally comprises a protective layer in contact with the electronic device and the weatherable sheet. The present application allows for the combination of any of the disclosed elements.