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公开(公告)号:US20200064731A1
公开(公告)日:2020-02-27
申请号:US16667956
申请日:2019-10-30
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor: David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnould Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN-ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号:US20190227445A1
公开(公告)日:2019-07-25
申请号:US16326948
申请日:2017-08-11
Applicant: ASML Netherlands B.V.
Inventor: Frits VAN DER MEULEN , Erik Johan ARLEMARK , Hendrikus Herman Marie COX , Martinus Agnes Willem CUIJPERS , Joost DE HOOGH , Gosse Charles DE VRIES , Paul Comé Henri DE WIT , Sander Catharina Reinier DERKS , Ronald Comelis Gerardus GIJZEN , Dries Vaast Paul HEMSCHOOTE , Christiaan Alexander HOOGENDAM , Adrianus Hendrik KOEVOETS , Raymond Wilhelmus Louis LAFARRE , Alain Louis Claude LEROUX , Patrick Willem Paul LIMPENS , Jim Vincent OVERKAMP , Christiaan Louis VALENTIN , Koos VAN BERKEL , Stan Henricus VAN DER MEULEN , Jacobus Comelis Gerardus VAN DER SANDEN , Harmen Klaas VAN DER SCHOOT , David Ferdinand VLES , Evert Auke Rinze WESTERHUIS
IPC: G03F7/20
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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公开(公告)号:US20180239240A1
公开(公告)日:2018-08-23
申请号:US15752302
申请日:2016-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor: Zomer Silvester HOUWELING , Eric Willem Felix CASIMIRI , Tamara DRUZHININA , JANSSEN Paul , Michael Alfred Josephus KUIJKEN , Martinus Hendrikus Antonius LEENDERS , Sicco OOSTERHOFF , Mária PÉTER , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Beatrijs Louise Marie-Joseph Katrie VERBRUGGE , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
CPC classification number: G03F1/62 , G03F7/70983
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
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