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公开(公告)号：US20200064731A1
公开(公告)日：2020-02-27
申请号：US16667956
申请日：2019-10-30
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnould Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN-ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号：US20180364561A1
公开(公告)日：2018-12-20
申请号：US16062017
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.
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公开(公告)号：US20220252974A1
公开(公告)日：2022-08-11
申请号：US17728608
申请日：2022-04-25
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willlem-Pieter VOORTHUIJZEN , James Norman WILEY
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号：US20210208500A1
公开(公告)日：2021-07-08
申请号：US17206649
申请日：2021-03-19
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号：US20190056654A1
公开(公告)日：2019-02-21
申请号：US15770175
申请日：2016-10-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Mária PÉTER , Erik Achilles ABEGG , Adrianus Johannes Maria GIESBERS , Johan Hendrik KLOOTWIJK , Maxim Aleksandrovich NASALEVICH , Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
Abstract: Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20190146332A1
公开(公告)日：2019-05-16
申请号：US16247179
申请日：2019-01-14
Applicant: ASML Netherlands B.V.
Inventor： Pieter-Jan VAN ZWOL , Vadim Yevgenyevich BANINE , Jozef Petrus Henricus BENSCHOP , Florian Didier Albin DHALLUIN , Mária PÉTER , Luigi SCACCABAROZZI , Willem Joan VAN DER ZANDE
Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane has one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are within some or all of the additional layers.
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公开(公告)号：US20180239240A1
公开(公告)日：2018-08-23
申请号：US15752302
申请日：2016-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Zomer Silvester HOUWELING , Eric Willem Felix CASIMIRI , Tamara DRUZHININA , JANSSEN Paul , Michael Alfred Josephus KUIJKEN , Martinus Hendrikus Antonius LEENDERS , Sicco OOSTERHOFF , Mária PÉTER , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Beatrijs Louise Marie-Joseph Katrie VERBRUGGE , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
CPC classification number: G03F1/62 , G03F7/70983
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
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公开(公告)号：US20240027893A1
公开(公告)日：2024-01-25
申请号：US18220799
申请日：2023-07-11
Applicant: ASML NETHERLANDS B.V.
Inventor： David Ferdinand VLES , Chaitanya Krishna ANDE , Antonius Franciscus Johannes DE GROOT , Adrianus Johannes Maria GIESBERS , Johannes Joseph JANSSEN , Paul JANSSEN , Johan Hendrik KLOOTWIJK , Peter Simon Antonius KNAPEN , Evgenia KURGANOVA , Marcel Peter MEIJER , Wouter Rogier MEIJERINK , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Raymond OLSMAN , Hrishikesh PATEL , Mária PÉTER , Gerrit VAN DEN BOSCH , Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , Hendrikus Jan WONDERGEM , Aleksandar Nikolov ZDRAVKOV
IPC: G03F1/64
CPC classification number: G03F1/64
Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：US20210181618A1
公开(公告)日：2021-06-17
申请号：US16761683
申请日：2018-11-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter-Jan VAN ZWOL , Adrianus Johannes Maria GIESBERS , Johan Hendrik KLOOTWIJK , Evgenia KURGANOVA , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Leonid Aizikovitsj SJMAENOK , Ties Wouter VAN DER WOORD , David Ferdinand VLES
IPC: G03F1/62
Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.
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公开(公告)号：US20200319546A1
公开(公告)日：2020-10-08
申请号：US16754865
申请日：2018-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Anton Wilhelmus DUYS , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Pieter-Jan VAN ZWOL , David Ferdinand VLES
IPC: G03F1/64
Abstract: A pellicle frame for supporting a pellicle, the frame having a first surface and a second surface opposite the first surface, and a structure provided between the first and the second surfaces, wherein the first and second surfaces and the structure at least partially define at least one volume therebetween that is devoid of the material that forms the frame.
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