公开(公告)号：US10451980B2

公开(公告)日：2019-10-22

申请号：US15490598

申请日：2017-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Koert Stavenga ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

IPC: G03F7/20 ,  H01L21/68 ,  H01L21/687

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

公开(公告)号：US09964861B2

公开(公告)日：2018-05-08

申请号：US15791317

申请日：2017-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Jacobus Johannus Leonardus Hendricus Verspay ,  Hans Jansen ,  Marco Koert Stavenga

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70608 ,  G03F7/70808 ,  G03F7/70858

Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.

公开(公告)号：US20180004100A1

公开(公告)日：2018-01-04

申请号：US15707703

申请日：2017-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Jansen ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Franciscus Johannes Joseph Janssen ,  Anthonie Kuijper

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

公开(公告)号：US09703210B2

公开(公告)日：2017-07-11

申请号：US14584826

申请日：2014-12-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Jansen ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Jan Cornelis Van Der Hoeven ,  Cedric Desire Grouwstra

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

公开(公告)号：US09581914B2

公开(公告)日：2017-02-28

申请号：US14676025

申请日：2015-04-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

IPC: G03B27/52 ,  G03F7/20 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

Abstract translation: 在光刻投影装置中，液体供应系统将液体保持在投影系统和基板之间的空间中。 液体供应系统还可以包括去矿化单元，蒸馏单元，去烃化单元，UV辐射源和/或构造成净化液体的过滤器。 可以提供气体减少装置以减少液体的气体含量。 可以使用添加装置将化学物质添加到液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命的增长可能降低。

公开(公告)号：US20160011522A1

公开(公告)日：2016-01-14

申请号：US14858885

申请日：2015-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Christian Gerardus Norbertus Hendricus Marie CLOIN ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michaël Christiaan Van Der Wekken

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.