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公开(公告)号：US11378893B2
公开(公告)日：2022-07-05
申请号：US17098073
申请日：2020-11-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Van Meer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC: G03F7/20
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
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公开(公告)号：US10254663B2
公开(公告)日：2019-04-09
申请号：US14882241
申请日：2015-10-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Van Meer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.
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公开(公告)号：US09625835B2
公开(公告)日：2017-04-18
申请号：US14356358
申请日：2012-10-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Manish Ranjan , Carlo Cornelis Maria Luijten , Franciscus Johannes Joseph Janssen , Maksym Chernyshov
CPC classification number: G03F7/70875 , G03F7/70633 , G03F7/70716 , G03F7/70933
Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.
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公开(公告)号：US10935895B2
公开(公告)日：2021-03-02
申请号：US16539487
申请日：2019-08-13
Applicant: ASML Netherlands B.V.
Inventor： Adrianus Hendrik Koevoets , Erik Johan Arlemark , Sander Catharina Reinier Derks , Sjoerd Nicolaas Lambertus Donders , Wilfred Edward Endendijk , Franciscus Johannes Joseph Janssen , Raymond Wilhelmus Louis Lafarre , Leon Martin Levasier , Jim Vincent Overkamp , Nicolaas Ten Kate , Jacobus Cornelis Gerardus Van Der Sanden
IPC: G03B27/52 , G03F7/20 , H01L21/67 , H01L21/683
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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公开(公告)号：US09715179B2
公开(公告)日：2017-07-25
申请号：US14933956
申请日：2015-11-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Siebe Landheer , Marcel Beckers , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Franciscus Johannes Joseph Janssen
CPC classification number: G03F7/70341 , G03B27/52
Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.
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Patent Agency Ranking
公开(公告)号：US20160363873A1
公开(公告)日：2016-12-15
申请号：US15250579
申请日：2016-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans JANSEN , Marco Koert Stavenga , Jacobus Johannus Leonardus Hendricus Verspay , Franciscus Johannes Joseph Janssen , Anthorie Kuijper
IPC: G03F7/20
CPC classification number: G03F7/70858 , G03F7/2041 , G03F7/70341
Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
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公开(公告)号：US11163240B2
公开(公告)日：2021-11-02
申请号：US16809497
申请日：2020-03-04
Applicant: ASML Netherlands B.V.
Abstract: A system for heating an optical component of a lithographic apparatus, the system comprising a heating radiation source, the heating radiation source being configured to emit heating radiation for heating of the optical component, wherein the system is configured to direct the heating radiation emitted by the heating radiation source onto the optical component, a portion of the heating radiation being absorbed by the optical component and another portion of the heating radiation being reflected by optical component, and wherein the system is configured to vary or change a property of the heating radiation emitted by the heating radiation source such that the other portion of the heating radiation that is reflected by the optical component is constant during operation of the lithographic apparatus.
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公开(公告)号：US10268127B2
公开(公告)日：2019-04-23
申请号：US15589705
申请日：2017-05-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniël Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Franciscus Johannes Joseph Janssen
IPC: G03F7/20
Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
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公开(公告)号：US09772565B2
公开(公告)日：2017-09-26
申请号：US15250579
申请日：2016-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Jansen , Marco Koert Stavenga , Jacobus Johannus Leonardus Hendricus Verspay , Franciscus Johannes Joseph Janssen , Anthonie Kuijper
IPC: H01L21/469 , G03F7/20
CPC classification number: G03F7/70858 , G03F7/2041 , G03F7/70341
Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
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公开(公告)号：US09454088B2
公开(公告)日：2016-09-27
申请号：US14885775
申请日：2015-10-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Jansen , Marco Koert Stavenga , Jacobus Johannus Leonardus Hendricus Verspay , Franciscus Johannes Joseph Janssen , Anthonie Kuijper
CPC classification number: G03F7/70858 , G03F7/2041 , G03F7/70341
Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
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