公开(公告)号：US20180364561A1

公开(公告)日：2018-12-20

申请号：US16062017

申请日：2016-12-02

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： David Ferdinand VLES ,  Erik Achilles ABEGG ,  Aage BENDIKSEN ,  Derk Servatius Gertruda BROUNS ,  Pradeep K. GOVIL ,  Paul JANSSEN ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Mária PÉTER ,  Marcus Adrianus VAN DE KERKHOF ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  James Norman WILEY

IPC: G03F1/64 ,  G03F7/20 ,  G03F1/22

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.

公开(公告)号：US20180314150A1

公开(公告)日：2018-11-01

申请号：US15545390

申请日：2016-02-01

Applicant: ASML Netherlands B.V.

Inventor： Derk Servatius Gertruda BROUNS ,  Dennis DE GRAAF ,  Robertus Cornelis Martinus DE KRUIF ,  Paul JANSSEN ,  Matthias KRUIZINGA ,  Arnoud Willem NOTENBOOM ,  Daniel Andrew SMITH ,  Beatrijs Louise Marie-Joseph Katrien VERBRUGGE ,  James Norman WILEY

IPC: G03F1/84 ,  G03F1/22 ,  G03F1/64 ,  G03F1/66 ,  G03F1/42

CPC classification number: G03F1/84 ,  G03F1/22 ,  G03F1/42 ,  G03F1/62 ,  G03F1/64 ,  G03F1/66

Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

公开(公告)号：US20170363969A1

公开(公告)日：2017-12-21

申请号：US15527645

申请日：2015-09-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Marc HAUPTMANN ,  Dylan John David DAVIES ,  Paul JANSSEN ,  Naoko TSUGAMA ,  Richard Joseph BRULS ,  Kornelis Tijmen HOEKERD ,  Edwin Johannes Maria JANSSEN ,  Petrus Johannes VAN DEN OEVER ,  Ronald VAN DER WILK ,  Antonius Hubertus VAN SCHIJNDEL ,  Jorge Alberto VIEYRA SALAS

IPC: G03F7/20 ,  G01N27/61

CPC classification number: G03F7/70616 ,  G01N21/9501 ,  G01N27/61 ,  G01N2021/95676 ,  G03F1/84 ,  G03F7/70508 ,  G03F7/70783 ,  H01L22/12 ,  H01L22/20

Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.