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公开(公告)号：US20200089135A1
公开(公告)日：2020-03-19
申请号：US16470905
申请日：2017-11-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus GOORDEN , Nitesh PANDEY , Duygu AKBULUT , Alessandro POLO , Simon Reinald HUISMAN
Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.
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公开(公告)号：US20250060684A1
公开(公告)日：2025-02-20
申请号：US18724286
申请日：2022-12-14
Applicant: ASML Netherlands B.V.
Inventor： Simon Reinald HUISMAN , Sebastianus Adrianus GOORDEN , Stephen ROUX
IPC: G03F9/00
Abstract: A system includes optical devices, reflective devices, a movable reflective device, and a detector. The optical devices are disposed at a first plane and around a axis of the system and receive scattered radiation from targets. The reflective devices are disposed at at least a second plane and around the axis. Each of the reflective devices receives the scattered radiation from a corresponding one of the optical devices. The movable reflective device is disposed along the axis and receives the scattered radiation from each of the reflective devices. The detector receives the scattered radiation from the movable reflective device.
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公开(公告)号：US20250036031A1
公开(公告)日：2025-01-30
申请号：US18716007
申请日：2022-11-17
Applicant: ASML Netherlands B.V.
Inventor： Aniruddha Ramakrishna SONDE , Mahesh Upendra AJGAONKAR , Krishanu SHOME , Simon Reinald HUISMAN , Sebastianus Adrianus GOORDEN , Franciscus Godefridus Casper BIJNEN , Patrick WARNAAR , Sergei SOKOLOV
Abstract: Some embodiments of this disclosure can improve measurement of target mark asymmetry in metrology apparatuses for improving accuracy in measurements performed in conjunction with lithographic processes. For example, a metrology system can include a projection system configured to receive a plurality of diffraction orders diffracted from a target on a substrate. The metrology system can further include a detector array and a waveguide device configured to transmit the plurality of diffraction orders between the projection system and the detector array. The detector array can be configured to detect each of the plurality of diffraction orders spatially separate from other ones of the plurality of diffraction orders.
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公开(公告)号：US20240353761A1
公开(公告)日：2024-10-24
申请号：US18686742
申请日：2022-08-05
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70633 , G03F7/70408 , G03F9/7092
Abstract: Systems, apparatuses, and methods are provided for correcting an alignment measurement or overlay error. An example method can include measuring an observable in response to an illumination of a region of a surface by a radiation beam, such as interference between radiation diffracted from the region. The example method can further include generating a measurement signal indicative of the observable. In some aspects, the measurement signal can include interference fringe pattern data indicative of the measured interference. The example method can further include determining a correction to a measurement value based on measurement signal. Optionally, the correction can include a correction to an alignment measurement of an alignment sensor, a correction to an overlay error of an overlay sensor, or both.
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公开(公告)号：US20240004184A1
公开(公告)日：2024-01-04
申请号：US18037957
申请日：2021-11-08
Applicant: ASML Netherlands B.V.
Inventor： Luc Roger Simonne HASPESLAGH , Nitesh PANDEY , Ties Wouter VAN DER WOORD , Halil Gökay YEGEN , Sebastianus Adrianus GOORDEN , Alexis HUMBLET , Alexander Ludwig KLEIN , Jim Vincent OVERKAMP , Guilherme BRONDANI TORRI , Edgar Alberto OSORIO OLIVEROS
CPC classification number: G02B26/0858 , G03F7/70291 , G03F7/70116 , B81B7/02 , B81B2207/11 , B81B2207/015
Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
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Patent Agency Ranking
公开(公告)号：US20230418168A1
公开(公告)日：2023-12-28
申请号：US18036788
申请日：2021-11-01
Applicant: ASML Netherlands B.V.
Inventor： Simon Reinald HUISMAN , Sebastianus Adrianus GOORDEN
CPC classification number: G03F7/70633 , G03F9/7046 , G03F9/7088 , G03F9/7019
Abstract: Disclosed is a metrology system comprising: a pre-alignment metrology tool operable to measure a plurality of targets on a substrate to obtain measurement data; and a processing unit. The processing unit is operable to: process said measurement data to determine for each target at least one position distribution which describes variation of said position value over at least part of said target; and determine a measurement correction from said at least one position distribution which corrects for within-target variation in each of said targets, said measurement correction for correcting measurements performed by an alignment sensor.
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公开(公告)号：US20230229094A1
公开(公告)日：2023-07-20
申请号：US18151334
申请日：2023-01-06
Applicant: ASML Netherlands B.V.
Inventor： Simon Reinald HUISMAN , Arjan Johannes Anton BEUKMAN , Arie Jeffrey DEN BOEF , Sebastianus Adrianus GOORDEN , Nitish KUMAR , Jin LIAN , Zili ZHOU
CPC classification number: G03F9/7065 , G02B26/0833 , G02B27/283 , G03F7/70575 , G03F7/70616
Abstract: Disclosed is an illumination arrangement for spectrally shaping a broadband illumination beam to obtain a spectrally shaped illumination beam. The illumination arrangement comprises a beam dispersing element for dispersing the broadband illumination beam and a spatial light modulator for spatially modulating the broadband illumination beam subsequent to being dispersed. The illumination arrangement further comprises at least one of a beam expanding element for expanding said broadband illumination beam in at least one direction, located between an input of the illumination arrangement and the spatial light modulator; and a lens array, each lens of which for directing a respective wavelength band of the broadband illumination beam subsequent to being dispersed onto a respective region of the spatial light modulator.
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公开(公告)号：US20220342199A1
公开(公告)日：2022-10-27
申请号：US17634023
申请日：2020-08-05
Applicant: ASML NETHERLANDS B.V. , IMEC v.z.w.
Inventor： Alexandre HALBACH , Nitesh PANDEY , Sebastianus Adrianus GOORDEN , Veronique ROCHUS , Luc Roger Simonne HASPESLAGH , Guilherme BRONDANI TORRI
Abstract: A micromirror array includes a substrate, a plurality of mirrors for reflecting incident radiation, and for each mirror of the plurality of mirrors, a respective post connecting the substrate to the respective mirror. The micromirror array further includes, for each mirror of the plurality of mirrors, one or more electrostatic actuators connected to the substrate for applying force to the respective post to displace the respective post relative to the substrate, thereby displacing the respective mirror. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
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公开(公告)号：US20220229278A1
公开(公告)日：2022-07-21
申请号：US17608038
申请日：2020-04-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus GOORDEN
Abstract: A dark field metrology device includes an objective lens arrangement and a zeroth order block to block zeroth order radiation. The objective lens arrangement directs illumination onto a specimen to be measured and collects scattered radiation from the specimen, the scattered radiation including zeroth order radiation and higher order diffracted radiation. The dark field metrology device is operable to perform an illumination scan to scan illumination over at least two different subsets of the maximum range of illumination angles; and simultaneously perform a detection scan which scans the zeroth order block and/or the scattered radiation with respect to each other over a corresponding subset of the maximum range of detection angles during at least part of the illumination scan.
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公开(公告)号：US20200103772A1
公开(公告)日：2020-04-02
申请号：US16611500
申请日：2018-03-06
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus GOORDEN , Simon Reinald HUISMAN , Duygu AKBULUT , Alessandro POLO , Simon Gijsbert Josephus MATHIJSSEN
Abstract: Disclosed is a metrology sensor apparatus and associated method. The metrology sensor apparatus comprises an illumination system operable to illuminate a metrology mark on a substrate with illumination radiation having a first polarization state and an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark. The metrology mark comprises a main structure and changes, relative to the first polarization state, at least one of a polarization state of a first portion of the scattered radiation predominately resultant from scattering by the main structure and a polarization state of a second portion of radiation predominately resultant from scattering by one or more features other than the main structure, such that the polarization state of the first portion of the scattered radiation is different to the polarization state of the second portion of the scattered radiation. The metrology sensor apparatus further comprises an optical filtering system which filters out the second portion of the scattered radiation based on its polarization state.
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