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公开(公告)号：US20220283428A1
公开(公告)日：2022-09-08
申请号：US17635907
申请日：2020-08-05
Applicant: ASML Netherlands B.V. , IMEC v.z.w.
Inventor： Luc Roger Simonne HASPESLAGH , Veronique ROCHUS , Guilherme BRONODANI TORRI , Nitesh PANDEY , Sebastianus Adrianus GOORDEN
Abstract: A micromirror array comprises a substrate, a plurality of minors for reflecting incident light and, for each mirror (20) of the plurality of minors, at least one piezoelectric actuator (21) for displacing the minor, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars (24) connecting the minor to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
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公开(公告)号：US20220342199A1
公开(公告)日：2022-10-27
申请号：US17634023
申请日：2020-08-05
Applicant: ASML NETHERLANDS B.V. , IMEC v.z.w.
Inventor： Alexandre HALBACH , Nitesh PANDEY , Sebastianus Adrianus GOORDEN , Veronique ROCHUS , Luc Roger Simonne HASPESLAGH , Guilherme BRONDANI TORRI
Abstract: A micromirror array includes a substrate, a plurality of mirrors for reflecting incident radiation, and for each mirror of the plurality of mirrors, a respective post connecting the substrate to the respective mirror. The micromirror array further includes, for each mirror of the plurality of mirrors, one or more electrostatic actuators connected to the substrate for applying force to the respective post to displace the respective post relative to the substrate, thereby displacing the respective mirror. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
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公开(公告)号：US20240241454A1
公开(公告)日：2024-07-18
申请号：US18619839
申请日：2024-03-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Simon Reinald HUISMAN , Sebastianus Adrianus GOORDEN , Harm Jan Willem BELT , Filippo ALPEGGIANI , Irwan Dani SETIJA , Henricus Petrus Maria PELLEMANS
CPC classification number: G03F9/7019 , G03F7/70633 , G03F7/70641 , G03F7/706839 , G03F7/70725 , G03F9/7049 , G03F9/7088
Abstract: Disclosed is a method for measuring a parameter of interest from a target and associated apparatuses. The method comprises obtaining measurement acquisition data relating to measurement of a target on a production substrate during a manufacturing phase; obtaining a calibration correction database and/or a trained model having been trained on said calibration correction database, operable to correct for effects in the measurement acquisition data; correcting for effects in the measurement acquisition data using first correction data from said calibration correction database and/or using said trained model so as to obtain corrected measurement data and/or a corrected parameter of interest which is/are corrected for at least said effects; and updating said calibration correction data and/or said trained model with said corrected measurement data and/or corrected parameter of interest.
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公开(公告)号：US20240231065A1
公开(公告)日：2024-07-11
申请号：US18441710
申请日：2024-02-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus GOORDEN
CPC classification number: G02B21/0016 , G01N21/9501 , G02B21/002 , G02B21/0036 , G02B21/02 , G02B21/10 , G03F7/70625 , G03F7/70633 , G03F7/706849 , G03F7/706851 , G01N21/95623
Abstract: A dark field metrology device includes an objective lens arrangement and a zeroth order block to block zeroth order radiation. The objective lens arrangement directs illumination onto a specimen to be measured and collects scattered radiation from the specimen, the scattered radiation including zeroth order radiation and higher order diffracted radiation. The dark field metrology device is operable to perform an illumination scan to scan illumination over at least two different subsets of the maximum range of illumination angles; and simultaneously perform a detection scan which scans the zeroth order block and/or the scattered radiation with respect to each other over a corresponding subset of the maximum range of detection angles during at least part of the illumination scan.
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公开(公告)号：US20220397832A1
公开(公告)日：2022-12-15
申请号：US17773384
申请日：2020-10-19
Applicant: ASML Netherlands B.V.
Inventor： Filippo ALPEGGIANI , Henricus Petrus Maria PELLEMANS , Sebastianus Adrianus GOORDEN , Simon Reinald HUISMAN
Abstract: Disclosed is a method of metrology such as alignment metrology. The method comprises obtaining pupil plane measurement dataset at a pupil plane relating to scattered radiation resultant from a measurement of a structure. The method comprises determining a measurement value or correction therefor using the pupil plane measurement dataset and a sensor term relating to sensor optics used to perform said measurement.
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Patent Agency Ranking
公开(公告)号：US20220057718A1
公开(公告)日：2022-02-24
申请号：US17415671
申请日：2019-11-19
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus GOORDEN , Simon Reinald HUISMAN , Sergei SOKOLOV
Abstract: Disclosed is an illumination system for delivering incoherent radiation to a metrology sensor system. Also disclosed is an associated metrology system and method. The illumination system comprises a spatial filter system for selective spatial filtering of a beam of said incoherent radiation outside of a module housing of the metrology sensor system. At least one optical guide is provided for guiding the spatially filtered beam of incoherent radiation to the metrology sensor system, the at least one optical guide being such that the radiation guided has a substantially similar output angle as input angle.
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公开(公告)号：US20190049866A1
公开(公告)日：2019-02-14
申请号：US16069678
申请日：2017-01-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Simon Reinald HUISMAN , Alessandro POLO , Duygu AKBULUT , Sebastianus Adrianus GOORDEN , Arie Jeffrey DEN BOEF
Abstract: In an alignment sensor of a lithographic apparatus, position sensing radiation is delivered to a target (P1). After reflection or diffraction from the target, position sensing radiation is processed to determine a position of the target. Reference radiation interferes with the position sensing radiation) while a relative phase modulation is applied between the reference radiation and the position sensing radiation. The interfering radiation includes a time-varying component defined by the applied phase modulation. The interfering radiation is delivered to two photodetectors in such a way that each photodetector receives said time-varying component in anti-phase to that received at the other photodetector. A difference signal (i(t)) from said photodetectors contains an amplified, low noise version of said time-varying component. This is used in determining the position of the target. Mode matching enhances interference. Surface scattered radiation is rejected.
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公开(公告)号：US20240184215A1
公开(公告)日：2024-06-06
申请号：US18286327
申请日：2022-03-23
Applicant: ASML Netherlands B.V.
Inventor： Jin LIAN , Armand Eugene Albert KOOLEN , Sebastianus Adrianus GOORDEN , Hui Quan LIM
IPC: G03F7/00
CPC classification number: G03F7/70516 , G03F7/70025 , G03F7/70633
Abstract: Disclosed is a method of determining a correction for a measurement of a target and an associated apparatus. The measurement is subject to a target-dependent correction parameter which has a dependence the target and/or a stack on which the target is comprised. The method comprises obtaining first measurement data relating to a measurement of a fiducial target, said first measurement data comprising at least a first and second set of intensity parameter values: and second measurement data relating to a measurement of the fiducial target, the second measurement data comprising a third set of intensity parameter values. A target-invariant correction parameter is determined from said first measurement data and second measurement data. the target-invariant correction parameter being a component of the target-dependent correction parameter which is not dependent on the target and/or a stack: and the correction is determined from said target-in-variant correction parameter.
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9.发明公开公开(公告)号：US20240094641A1
公开(公告)日：2024-03-21
申请号：US18255543
申请日：2021-12-02
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Justin Lloyd KREUZER , Simon Reinald HUISMAN , Sebastianus Adrianus GOORDEN , Filippo ALPEGGIANI
IPC: G03F7/00
CPC classification number: G03F7/70633 , G03F7/706837 , G03F7/706849
Abstract: The system includes a radiation source, a diffractive element, an optical system, a detector, and a processor. The radiation source generates radiation. The diffractive element diffracts the radiation to generate a first beam and a second beam. The first beam includes a first non-zero diffraction order and the second beam includes a second non-zero diffraction order that is different from the first non-zero diffraction order. The optical system receives a first scattered beam and a second scattered radiation beam from a target structure and directs the first scattered beam and the second scattered beam towards a detector. The detector generates a detection signal. The processor analyzes the detection signal to determine a target structure property based on at least the detection signal. The first beam is attenuated with respect to the second beam or the first scattered beam is purposely attenuated with respect to the second scattered beam.
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公开(公告)号：US20240012342A1
公开(公告)日：2024-01-11
申请号：US18035008
申请日：2021-11-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus GOORDEN , Simon Gijsbert Josephus MATHIJSSEN , Leendert Jan KARSSEMEIJER , Manouk RIJPSTRA , Ralph BRINKHOF , Kaustuve BHATTACHARYYA
CPC classification number: G03F9/7046 , G03F7/706831 , G03F7/70625 , G03F7/706837
Abstract: A method for a metrology process, the method includes obtaining first measurement data relating to a first set of measurement conditions and determining a first measurement recipe based on the first measurement data. At least one performance indicator is determined from one or more components of the first measurement data obtained from a component analysis or statistical decomposition. Alternatively, at least one performance indicator is determined from a comparison of one or more first measurement values relating to the first measurement recipe and one or more second measurement values relating to a second measurement recipe, where second measurement recipe is different to the first measurement data and relates a second set of measurement conditions, the second set of measurement conditions being different to the first set of measurement conditions.
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