公开(公告)号：US20170212429A1

公开(公告)日：2017-07-27

申请号：US15329536

申请日：2015-07-16

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik KOEVOETS ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rogier Hendrikus Magdalena CORTIE ,  Jim Vincent OVERKAMP ,  Patricius Jacobus NEEFS ,  Putra SAPUTRA ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Michael Johannes Hendrika Wilhelmina RENDERS ,  Johan Gertrudis Cornelis KUNNEN ,  Thibault Simon Mathieu LAURENT

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70783 ,  G03F7/70875

Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two- phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.

公开(公告)号：US20160202618A1

公开(公告)日：2016-07-14

申请号：US15078814

申请日：2016-03-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Takeshi KANEKO ,  Robbert Jan VOOGD ,  Gregory Martin Mason CORCORAN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Johan Gertrudis Cornelis KUNNEN ,  Ramin BADIE

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

Abstract translation: 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。