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公开(公告)号:US20170212421A1
公开(公告)日:2017-07-27
申请号:US15482526
申请日:2017-04-07
Applicant: ASML NETHERLANDS B.V.
Inventor: Hrishikesh PATEL , Johannes Henricus Wilhelmus JACOBS , Gerardus Adrianus Antonius Maria KUSTERS , Thibault Simon Mathieu LAURENT , Marcio Alexandre Cano MIRANDA , Ruud Hendricus Martinus Johannes BLOKS , Peng FENG , Johan Gertrudis Cornelis KUNNEN
IPC: G03F7/20 , H01L21/67 , G03F7/30 , H01L21/027
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F7/70991 , H01L21/0274 , H01L21/67098 , Y10T29/49
Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
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公开(公告)号:US20190171113A1
公开(公告)日:2019-06-06
申请号:US16270958
申请日:2019-02-08
Applicant: ASML NETHERLANDS B.V.
Inventor: Thibault Simon Mathieu LAURENT , Gerardus Adrianus Antonius Maria KUSTERS , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Raymond Wilhelmus Louis LAFARRE , Koen STEFFENS , Takeshi KANEKO , Robbert Jan VOOGD , Gregory Martin Mason CORCORAN , Ruud Hendrikus Martinus Johannes BLOKS , Johan Gertrudis Cornelis KUNNEN , Ramin BADIE
IPC: G03F7/20
CPC classification number: G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
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公开(公告)号:US20160202618A1
公开(公告)日:2016-07-14
申请号:US15078814
申请日:2016-03-23
Applicant: ASML NETHERLANDS B.V.
Inventor: Thibault Simon Mathieu LAURENT , Gerardus Adrianus Antonius Maria KUSTERS , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Raymond Wilhelmus Louis LAFARRE , Koen STEFFENS , Takeshi KANEKO , Robbert Jan VOOGD , Gregory Martin Mason CORCORAN , Ruud Hendrikus Martinus Johannes BLOKS , Johan Gertrudis Cornelis KUNNEN , Ramin BADIE
IPC: G03F7/20
CPC classification number: G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
Abstract translation: 一种用于支撑衬底支撑区域上的衬底的衬底台,所述衬底台具有至少在衬底支撑区域下方的传热流体通道,以及多个加热器和/或冷却器,以热控制通道中的传热流体 位于基板支撑区域下方的位置。
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