公开(公告)号：EP3640735A1

公开(公告)日：2020-04-22

申请号：EP18201147.8

申请日：2018-10-18

Applicant: ASML Netherlands B.V.

Inventor： BADR, Elie ,  SHAKAHWAT MILLAT, Shawn ,  MICELI, Giacomo ,  VERMA, Alok

IPC: G03F7/20

Abstract: A method for determining an overlay metric is disclosed comprising obtaining angle resolved distribution spectrum data relating to a measurement of the target structure comprising a symmetrical component. An overlay dependent contour of a feature (820) of said target structure is determined from said angle resolved distribution spectrum data, from which an overlay metric is determined. The method comprises exposing an exposed feature onto a masked layer comprising a mask which defines masked and unmasked areas of the layer, such that a first portion of the exposed feature is exposed on a masked area of said layer and a second portion of the exposed feature is exposed on a non-masked area of said layer, the size of the first portion with respect to the second portion being overlay dependent; and performing an etch step to define an etched feature, the etched feature corresponding to said second portion of the exposed feature.

公开(公告)号：EP3528047A1

公开(公告)日：2019-08-21

申请号：EP18156625.8

申请日：2018-02-14

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh ,  ZHOU, Zili ,  VAN DER ZOUW, Gerbrand ,  DEN BOEF, Arie, Jeffrey ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  KOOLEN, Armand, Eugene, Albert ,  CRAMER, Hugo, Augustinus Joseph ,  HINNEN, Paul, Christiaan ,  VAN WEERT, Martinus, Hubertus, Maria ,  TSIATMAS, Anagnostis ,  WANG, Shu-jin ,  FAGGINGER AUER, Bastiaan, Onne ,  VERMA, Alok

IPC: G03F7/20

Abstract: A inspection apparatus, method, and system associated therewith are described herein. In a non-limiting embodiment, a inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, and the illumination beam being polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization; generate image data representing an image of each of the feature(s) based on the intensity data; and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.