公开(公告)号：EP4354200A1

公开(公告)日：2024-04-17

申请号：EP22200778.3

申请日：2022-10-11

Applicant: ASML Netherlands B.V.

Inventor： TUKKER, Teunis, Willem ,  VAN VOORST, Peter, Danny ,  ZHOU, Zili ,  VAN GREEVENBROEK, Hendrikus, Robertus, Marie

IPC: G02B27/00

CPC classification number: G02B27/0043 ,  G02B27/005 ,  G03F7/706847 ,  G03F7/706849 ,  G03F9/7065 ,  G02B5/1828 ,  G02B26/0808 ,  G02B27/1006

Abstract: An optical arrangement for aberration correction, comprising: a beam dispersing element for spatially dispersing a broadband radiation beam in a first transverse direction; a focusing lens for focusing the broadband radiation beam subsequently to said dispersing, wherein said focusing lens is arranged such that the dispersed broadband radiation beam passes through at least one off-center position of the focusing lens in at least one pass, wherein said off-center position is a position displaced from a center of the focusing lens in a second transverse direction, wherein the first transverse direction and the second transverse direction are mutually perpendicular and parallel to a focal plane of the focusing lens; and at least one aberration compensating lens displaced in the second transverse direction with respect to at least part of the broadband radiation beam so as to substantially compensate for lateral chromatic aberration..

公开(公告)号：EP4279994A1

公开(公告)日：2023-11-22

申请号：EP22174619.1

申请日：2022-05-20

Applicant: ASML Netherlands B.V.

Inventor： WARNAAR, Patrick ,  ZHOU, Zili

IPC: G03F7/20 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956

Abstract: Disclosed is an illumination module for a metrology device. The illumination module comprises a configurable illumination module operable to provide measurement illumination over a configurable range of illumination angles, a grating light valve module (GLV) for controllably configuring a spectral configuration of the measurement illumination; and a controller operable to control the configurable illumination module and the grating light valve module such that the spectral configuration of the measurement illumination is varied in dependence with illumination angle within the range of illumination angles so as to obtain a desired detection condition for detection of diffracted radiation from a diffractive structure resultant from a measurement of the diffractive structure using the measurement illumination.

公开(公告)号：EP4019961A1

公开(公告)日：2022-06-29

申请号：EP20216378.8

申请日：2020-12-22

Applicant: ASML Netherlands B.V.

Inventor： ARABUL, Mustafa Ümit ,  ZHOU, Zili ,  COENE, Willem Marie Julia Marcel ,  VERSCHUREN, Coen Adrianus ,  VAN NEER, Paul Louis Maria Joseph ,  PIRAS, Daniele ,  BLAAK, Sandra ,  KOEK, Wouter, Dick ,  WILLEKERS, Robert Wilhelm

IPC: G01N29/04 ,  G01N29/22 ,  G01N29/24 ,  G01N29/26 ,  G01N29/28 ,  G01N29/34

Abstract: A metrology apparatus for determining one or more parameters of a structure fabricated in or on a semiconductor substrate. The apparatus comprises a transducer array comprising a plurality of transducers positioned in a plane. The plurality of transducers comprises at least one transmitter transducer for emitting acoustic radiation in a frequency range from 1 GHz to 100 GHz towards the structure, and at least one receiver transducer for receiving acoustic radiation reflected and/or diffracted from the structure.

公开(公告)号：EP3779600A1

公开(公告)日：2021-02-17

申请号：EP19191736.8

申请日：2019-08-14

Applicant: ASML Netherlands B.V.

Inventor： ZHOU, Zili ,  ARABUL, Mustafa Ümit ,  VERSCHUREN, Coen Adrianus

IPC: G03F9/00 ,  G01N29/24 ,  B82Y35/00 ,  G03F7/20 ,  G01N29/34 ,  G01Q60/38

Abstract: The disclosure relates to determining information about a target structure formed on a substrate using a lithographic process. In one arrangement, a cantilever probe is provided having a cantilever arm and a probe element. The probe element extends from the cantilever arm towards the target structure. Ultrasonic waves are generated in the cantilever probe. The ultrasonic waves propagate through the probe element into the target structure and reflect back from the target structure into the probe element or into a further probe element extending from the cantilever arm. The reflected ultrasonic waves are detected and used to determine information about the target structure.

公开(公告)号：EP3528047A1

公开(公告)日：2019-08-21

申请号：EP18156625.8

申请日：2018-02-14

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh ,  ZHOU, Zili ,  VAN DER ZOUW, Gerbrand ,  DEN BOEF, Arie, Jeffrey ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  KOOLEN, Armand, Eugene, Albert ,  CRAMER, Hugo, Augustinus Joseph ,  HINNEN, Paul, Christiaan ,  VAN WEERT, Martinus, Hubertus, Maria ,  TSIATMAS, Anagnostis ,  WANG, Shu-jin ,  FAGGINGER AUER, Bastiaan, Onne ,  VERMA, Alok

IPC: G03F7/20

Abstract: A inspection apparatus, method, and system associated therewith are described herein. In a non-limiting embodiment, a inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, and the illumination beam being polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization; generate image data representing an image of each of the feature(s) based on the intensity data; and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.