公开(公告)号：JP2008034844A

公开(公告)日：2008-02-14

申请号：JP2007187146

申请日：2007-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  KLAASSEN FRANCISCUS ADRIANUS G

IPC: H01L21/027 ,  G03F9/00 ,  H01L21/68

CPC classification number: G03F7/70716 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To provide a stage unit that is simplified, is further versatile, and has a high accuracy. SOLUTION: The lithographic unit includes an illuminating system that controls a radiation beam, a patterning support that retains a patterning device for patternizing the radiation beam, a substrate support that retains a substrate, a projection system that projects the radiation beam with a pattern, an additional support, and a flexible line assembly that transmits at least any one of current, signal, and fluid. A first portion of the line assembly is extended between a base and the additional support, and a second portion is extended between the additional support and the patterning support or the substrate support. A first motor assembly generates a force in at least one direction and is coupled with any one of the patterning support and the substrate support. A second motor assembly generates a force in at least one direction and is coupled with the additional support. The first motor assembly includes the planar motor. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供简化的，更通用的并且具有高精度的平台单元。 解决方案：光刻单元包括控制辐射束的照明系统，保持用于使辐射束图案化的图案形成装置的图案形成支撑件，保持衬底的衬底支撑件，将辐射束投射到投影系统的投影系统 图案，附加支撑件以及透射电流，信号和流体中的至少任何一个的柔性线组件。 线组件的第一部分在基部和附加支撑件之间延伸，并且第二部分在附加支撑件和图案形成支撑件或基板支撑件之间延伸。 第一电动机组件在至少一个方向上产生力并且与图案形成支撑件和衬底支撑件中的任何一个结合。 第二电动机组件在至少一个方向上产生力并且与附加支撑件相耦合。 第一马达组件包括平面马达。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007258704A

公开(公告)日：2007-10-04

申请号：JP2007062865

申请日：2007-03-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BENSCHOP JOZEF PETRUS HENRICUS ,  BUTLER HANS ,  KEMPER NICOLAAS R ,  KOEK BARTHOLOMEUS H ,  VAN DER MEULEN FRITS ,  VAN DER SCHOOT HERMAN K

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an exposure device in which immersion liquid is not flown out during the time changing a substrate in immersion exposure. SOLUTION: A shutter member 50 is provided while being separated from (preferably at least two) substrate tables WT driven by an actuator 100. Therefore, the shutter member 50 is positioned under a projection system PS, so that a space 11 is enclosed in the same way as in a dummy substrate. In this method, even if the substrate W is moved from the position under the projection system PS, an immersion liquid is left with being contacted to a final element of the projection system PS, so that a final element is avoided from being stained through drying. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种曝光装置，其中在浸没曝光期间改变基板期间，浸没液体不会流出。 解决方案：挡板部件50被设置成与致动器100驱动的（优选至少两个）基板台WT分离。因此，挡板部件50位于投影系统PS的下方，从而空间11为 以与虚拟衬底中相同的方式包围。 在该方法中，即使基板W从投影系统PS下方的位置移动，浸没液体与投影系统PS的最终元件接触，从而避免了最终元件被干燥而染色 。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007208279A

公开(公告)日：2007-08-16

申请号：JP2007065471

申请日：2007-03-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus which minimizes a liquid loss from a supply system during the exposure of ends of a substrate, in liquid immersion exposure. SOLUTION: Liquid is limited by a middle plate 210 located between the liquid supply system and the substrate W. Spaces 222, 215 among the middle plate 210, a transmitted image sensor (TIS) 220, and the substrate W are also filled with the liquid 111. This procedure can be performed by two separated space liquid-supply systems via holes 230, 240, or can be performed by the same space liquid-supply system via the holes 230, 240. Therefore, both the space 215 between the substrate W and the middle plate 210, and the space 225 between the transmitted image sensor 220 and the middle plate 210 are filled with the liquid, so that both the substrate W and the transmitted image sensor can be illuminated under the same condition. A part 200 provides one or a plurality of support surfaces with the middle plate 210 which can be held at a predetermined position by a vacuum source. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其在液浸曝光期间在基片的端部曝光期间使供应系统的液体损失最小化。 解决方案：液体受位于液体供应系统和基板W之间的中间板210的限制。中间板210中的空间222,215，透射图像传感器（TIS）220和基板W也被填充 该过程可以通过两个分离的空间供液系统通孔230,240进行，或者可以经由孔230,240由相同的空间液体供应系统执行。因此，两者之间的空间215 基板W和中间板210以及透射图像传感器220和中间板210之间的空间225被填充液体，从而能够在相同条件下照射基板W和透射图像传感器。 部件200提供一个或多个支撑表面，中间板210可由真空源保持在预定位置。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007088456A

公开(公告)日：2007-04-05

申请号：JP2006242229

申请日：2006-09-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70825 ,  G03F7/7025

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment constituted such that a pattern is transferred on a substrate from a patterning device. SOLUTION: The equipment comprises a mechanism comprising a movable element ME at least partially produced from a magnetizable material. The movable element is pushed aside to a first position by applying pretension power to the movable element by a pretensioner. The movable element is pushed aside to a second position by producing a magnetic field which applies power to the movable element by permanent magnet PM. The movable element is pushed aside to the second position by producing the magnetic field which applies power to the movable element by coil when energization is carried out in a first direction. A synthetic magnetic field of magnet and the coil applies power larger than the pretention power to the movable element. At least in the second position of the movable element, when energization is carried out in a second direction opposite to a first direction, the total of the pretention power and the power applied by the magnetic field produced by the coil is larger than power applied by the magnet. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供构成为使图案从图案形成装置在基板上转印的光刻设备。 解决方案：设备包括一种机构，其包括至少部分地由可磁化材料制成的可移动元件ME。 通过预紧器向可动元件施加预张力，将可动元件推到第一位置。 通过产生通过永磁体PM向可动元件施加电力的磁场，将可动元件推到第二位置。 通过产生在沿第一方向进行通电时通过线圈向可动元件施加电力的磁场，将可动元件推到第二位置。 磁体和线圈的合成磁场对可移动元件施加大于预制力的功率。 至少在可动元件的第二位置，当在与第一方向相反的第二方向上进行通电时，由线圈产生的预定功率和由磁场产生的磁场施加的功率的总和大于由 磁铁。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006339634A

公开(公告)日：2006-12-14

申请号：JP2006137125

申请日：2006-05-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS

IPC: H01L21/027

CPC classification number: G03F7/70066

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a method of manufacturing a device which avoid or alleviate a heat problem that is caused when a blade of a masking device absorbs a substantial amount of energy from a projected beam upon blocking an emitted beam.
SOLUTION: The masking device MD includes at least one reflective means or reflective blade. The reflective blade is used in a scan direction Y, and includes a mirror-attached blade that moves transversely across a projection beam. The reflective blade provides an effective slit for a mask or reticle MA in the lithography apparatus in a lighting system IL.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备和制造器件的方法，该设备避免或减轻当屏蔽设备的刀片在阻挡时从投影光束吸收大量能量时引起的热问题 发射光束。 掩模装置MD包括至少一个反射装置或反射刮板。 反射式刀片沿扫描方向Y使用，并且包括横向延伸穿过投射光束的反射镜附接的刀片。 反射片在照明系统IL中的光刻设备中为掩模或掩模版MA提供有效的狭缝。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006279044A

公开(公告)日：2006-10-12

申请号：JP2006084505

申请日：2006-03-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER TOORN JAN-GERARD CORNE ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE ,  DRAAIJER EVERT HENDRIK JAN ,  KATE NICOLAAS TEN ,  VAN DER MEULEN FRITS ,  FRENCKEN MARK JOHANNES H ,  HOUKES MARTIJN ,  ARENDS ANTONIUS H ,  CUPERUS MINNE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithography apparatus having an improved positioning method of a liquid supply system. SOLUTION: The lithography apparatus includes a substrate table for holding a substrate, and a projection system for projecting a radiation beam patterned in a target portion of the substrate. The lithography apparatus has a fluid supply system for supplying fluid between the substrate and a final optical element of the projection system, and a positional control system for controlling a position of the fluid supply system. The positional control system is formed such that it is provided with a positional amount of the substrate, adds offset of a position to the positional amount of the substrate and thus determines a desirable position of the fluid supply system, and performs positioning of the fluid supply system based on the desirable position. The positional amount may include all or one of a position of the substrate, a rotational position of the substrate table, and a height function of height of the substrate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有改进的液体供应系统的定位方法的浸没式光刻设备。 解决方案：光刻设备包括用于保持基板的基板台和用于投影图案化在基板的目标部分中的辐射束的投影系统。 光刻设备具有用于在基板和投影系统的最终光学元件之间供应流体的流体供应系统和用于控制流体供应系统的位置的位置控制系统。 位置控制系统形成为使得其具有基板的位置量，将位置的偏移增加到基板的位置量，从而确定流体供应系统的期望位置，并且执行流体供应 系统基于理想的位置。 位置量可以包括基板的位置，基板台的旋转位置和基板的高度的高度函数的全部或者一个。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005197698A

公开(公告)日：2005-07-21

申请号：JP2004375765

申请日：2004-12-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOOGAARTS MARTINUS GODEFRIDUS ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE ,  CUIJPERS MARTINUS AGNES WILLEM ,  KUIT JAN JAAP

IPC: G03F9/00 ,  G01N21/88 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70808 ,  G01N21/8851 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus, which minimizes an effect of gas vibrations or gas pressure changes around an exposure system, which are caused by the actuation of a movable part of the exposure system or of another system in a housing, on the position of a board. SOLUTION: The lithographic projection apparatus includes a position disturbance correcting system, which offsets a disturbance of the position of a board holder 19 holding the board 13. In the apparatus, a space 3 including the exposure system is separated by a holed wall 5 and is separated from a space 4 including another system by a movable wall 10. The space 3, therefore, damps or cuts off the vibrations or pressure changes of the gas. The vibrations of the gas may be offset by a speaker 61. This lithograph apparatus can be employed to provide a novel device manufacturing method. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻投影装置，其使由曝光系统的可移动部分或另一系统的可动部分的致动引起的气体振动或暴露系统周围的气体压力变化的影响最小化 一个房屋，在一个董事会的职位。 解决方案：光刻投影设备包括位置干扰校正系统，其抵消了保持板13的板保持器19的位置的干扰。在该装置中，包括曝光系统的空间3由孔壁分隔开 并且通过可移动壁10与包括另一系统的空间4分离。因此，空间3阻止或切断气体的振动或压力变化。 气体的振动可以被扬声器61抵消。该光刻设备可用于提供新型的器件制造方法。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004342082A

公开(公告)日：2004-12-02

申请号：JP2004062666

申请日：2004-03-05

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BUTLER HANS

IPC: G05D3/12 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To provide a controller particularly of a lithograph device for controlling a position of mass, for instance, a board table (12) by controlling force.
SOLUTION: This controller receives a feedback position signal from the mass (12), and calculates estimated mass m
est from the feedback position signal and the controlling force. Then, the controller accelerates the mass (12) by using the estimated mass m
est and desired mass acceleration, and determines controlling force required for moving it to a desired position.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种控制器，特别是通过控制力来控制质量位置的光刻设备，例如板台（12）。

解决方案：该控制器从质量（12）接收反馈位置信号，并从反馈位置信号和控制力计算估计质量m est 。 然后，控制器通过使用估计质量m est 和期望的质量加速度来加速质量（12），并且确定将其移动到期望位置所需的控制力。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2003109898A

公开(公告)日：2003-04-11

申请号：JP2002225373

申请日：2002-06-28

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  VERBEEK THIJS REIN

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To reduce unnecessary vibration bringing fading of a pattern projected on a target part of a substrate in continuously vibrational movement in a projection system. SOLUTION: The vibrational movement is attained to be measured by a detection means. The detection means generates a motion signal, a control means responds thereto, and at this time the control means generates a control signal. Preferable algorithm used for generating the control signal is based on a method referred to as H infinity. The control signal is given to a drive means. The drive means compensates vibration of a projection lens, thereby improving image formation accuracy of the pattern projected on the substrate.

公开(公告)号：JP2012248832A

公开(公告)日：2012-12-13

申请号：JP2012113908

申请日：2012-05-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  JAN VAN EIJK ,  HOL SVEN ANTOIN JOHAN ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  YAN-SHAN HUANG

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70783 ,  G03F7/70758

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that enables accurate focus positioning of a substrate.SOLUTION: A lithographic apparatus includes: an illumination system configured to adjust a radiation beam; and a support medium constructed to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes: a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system; and a position controller configured to control a position of the substrate table and arranged to drive the positioner and the substrate surface actuator.

Abstract translation: 要解决的问题：提供一种能够准确地定位基板的光刻设备。 光刻设备包括：被配置为调节辐射束的照明系统; 以及支撑介质，其构造成支撑能够在其横截面中赋予辐射束图案以形成图案化的辐射束的图案形成装置。 所述光刻设备还包括：衬底台，其构造成保持衬底; 定位器，其被构造成定位所述衬底台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，被布置成接合面向所述投影系统的所述衬底的表面的一部分; 以及位置控制器，被配置为控制所述基板台的位置并被布置成驱动所述定位器和所述基板表面致动器。 版权所有（C）2013，JPO＆INPIT