公开(公告)号：JP2006165576A

公开(公告)日：2006-06-22

申请号：JP2005353307

申请日：2005-12-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE JONG FREDERICK E ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70516 ,  G03F7/70616

Abstract: PROBLEM TO BE SOLVED: To provide a calibration method for a lithographic projection apparatus that is not substantially affected by temperature variations thereof, and a calibration substrate used for the calibration. SOLUTION: The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate is made of a material having a small thermal expansion coefficient of, for example less than about 1.0×10 -6 K -1 , to reduce deformation thereof due to temperature variations of the substrate. The method for the calibration includes imaging a marker provided on a patterning device onto a target position of the calibration substrate with a beam of radiation, measuring a property of the image of the marker on the calibration substrate, determining any error between the measured property and an expected property based on the marker and operating parameters of the apparatus, and adjusting at least one of the operating parameters of the apparatus to correct the error. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种基本上不受其温度变化影响的光刻投影设备的校准方法和用于校准的校准基板。 解决方案：校准基板包括第一基本上平坦的表面，基本平行于第一表面的第二基本上平坦的表面，以及将第一表面连接到第二表面的边缘。 校准基板由热膨胀系数小，例如小于约1.0×10 -6 / SP> K -1 的材料制成，以减少由于 基板的温度变化。 用于校准的方法包括使用辐射束将设置在图案形成装置上的标记物设置在校准基板的目标位置上，测量校准基板上的标记的图像的性质，确定测量的属性和 基于装置的标记和操作参数的预期属性，以及调整装置的操作参数中的至少一个以校正误差。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006128677A

公开(公告)日：2006-05-18

申请号：JP2005306586

申请日：2005-10-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  VAN MEER ASCHWIN LODEWIJK HEND ,  OTTENS JOOST JEROEN ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: H01L21/67109 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a device provided with a support table for supporting a substrate. SOLUTION: The support table WT includes a plurality of support protrusions 2 that contact the substrate W when used to support the substrate W, and includes a plurality of heat transmission protrusions 3 that never contact the substrate W and are extended towards the substrate W when the substrate W is supported by the protrusions 2 in use. A heat exchange gap containing gas for exchanging the heat with the substrate W is extended between the protrusions 3 and the substrate W. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种设置有用于支撑基板的支撑台的装置。 解决方案：支撑台WT包括多个支撑突起2，其在用于支撑基板W时与基板W接触，并且包括多个不接触基板W并且朝基板延伸的传热突起3 当基板W在使用中由突起2支撑时，W是W。 包含用于与衬底W交换热量的气体的热交换间隙在突起3和衬底W之间延伸。版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005322906A

公开(公告)日：2005-11-17

申请号：JP2005130901

申请日：2005-04-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  MULKENS JOHANNES CATHARINUS HU

IPC: H01L21/027 ,  G03B27/42 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F9/7034 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a method which eliminates the need for a double stage in an immersion exposure divice and enables quick and accurate measurement of height.
SOLUTION: Immersion lithography equipment comprises a single stage, where the height of a substrate is measured, and exposure is performed at the same time; measurement information is stored by a sensor for measuring the height of the substrate, and the stored information is read to control the positioning of the substrate, such that a measured part is moved from a projection optical system underneath the optical axis separated by a predetermined distance.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种在浸没曝光分离中不需要双阶段的方法，并且能够快速和准确地测量高度。 解决方案：浸渍光刻设备包括单个阶段，其中测量基底的高度，同时进行曝光; 测量信息由用于测量基板的高度的传感器存储，并且读取所存储的信息以控制基板的定位，使得测量部分从光轴下方的预定距离的投影光学系统移动 。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2004006690A

公开(公告)日：2004-01-08

申请号：JP2003060642

申请日：2003-01-30

Applicant: ASML NETHERLANDS BV

Inventor： MERTENS JEROEN JOHANNES SOPHIA

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a means of preventing an external contaminant which reaches an optical component of a projection system from entering. SOLUTION: First flows 11 and 12 of purge gas are led into a 1st section 10 sealing the optical component, further a 2nd section surrounding the 1st section 10 is provided outside the 1st section 10, and second flows 16 and 17 of purge gas are led to the space between the 1st and 2nd sections. A surrounding body of the 2nd section forms an additional barrier against the entry of the external contaminant to further reduce the contaminant level of the 1st section. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2009117873A

公开(公告)日：2009-05-28

申请号：JP2009039514

申请日：2009-02-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  LAMBERTUS DONDERS SJOERD NICOL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  HUBERTUS MULKENS JOHANNES C ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide prewetting of a substrate before immersion exposure. SOLUTION: A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：在浸渍曝光之前提供衬底的预润湿。 解决方案：光刻投影设备包括被配置为保持图案形成装置的支撑结构。 图案形成装置被配置成根据期望的图案对辐射束进行图案化。 光刻设备还包括被配置为保持衬底的衬底台。 衬底具有至少部分地涂覆有辐射敏感材料层的表面。 光刻设备还包括配置成将图案化的光束投影到基板的目标部分上的投影系统和液体供应系统。 液体供应系统被配置为在辐射敏感材料层的顶部上提供预润湿液体以预润湿基底，并且被配置为在预润湿基底和至少一部分投影系统之间的空间中提供浸没液体。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008072139A

公开(公告)日：2008-03-27

申请号：JP2007300911

申请日：2007-11-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  MULKENS JOHANNES CATHARINUS HU ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER NET ANTONIUS J ,  DER HAM RONALD V ,  LALLEMANT NICOLAS ,  BECKERS MARCEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus including: an illumination system for adjusting a beam of radiation; and to provide a support structure designed to support a patterning device. SOLUTION: In the lithographic apparatus, a purge hood of a purge system supplies gas to at least a part of a projection system and/or to a purge volume including at least a part of the illumination system; and the purge food floats on a substrate and/or a substrate table by gas bearings. The gas bearings 12 and 14 serves as a coupling device for keeping a gap 22 between each of the gas bearings and a substrate W stable and small by a gas flow control with a control element 26. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，包括：用于调整辐射束的照明系统; 并且提供设计成支撑图案形成装置的支撑结构。 解决方案：在光刻设备中，清洗系统的净化罩向投影系统的至少一部分和/或包括至少一部分照明系统的净化容积供应气体; 并且吹扫食物通过气体轴承漂浮在基板和/或基板台上。 气体轴承12和14用作用于通过控制元件26通过气体流量控制来保持每个气体轴承和基板W之间的间隙22的联接装置。（C）2008年， JPO＆INPIT

公开(公告)号：JP2006191079A

公开(公告)日：2006-07-20

申请号：JP2005376924

申请日：2005-12-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F9/7023 ,  G03F7/70341 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide the method of correcting the exposure parameter of immersion type lithography equipment, and/or a computer program product. SOLUTION: The invention is the method of correcting the exposure parameter of immersion type lithography equipment. In this method, exposure parameter is measured using measuring beam projected via liquid between the projection system of the immersion type lithography equipment and a substrate table. Offset is searched for based on variation in physical property which affects measurement carried out using the measuring beam. Measured exposure parameter is corrected partially at least. There are provided the equipment and the method for measuring the height of an optical element connected to liquid between the projection system of the immersion type lithography equipment and the substrate table. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供校正浸入式光刻设备的曝光参数的方法和/或计算机程序产品。 解决方案：本发明是一种校正浸入式光刻设备的曝光参数的方法。 在这种方法中，曝光参数是通过在浸没型光刻设备的投影系统和衬底台之间通过液体投影的测量光束来测量的。 基于影响使用测量光束进行测量的物理性质的变化来搜索偏移。 测量曝光参数至少部分校正。 提供了在浸没型光刻设备的投影系统和基板台之间测量连接到液体的光学元件的高度的设备和方法。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006165577A

公开(公告)日：2006-06-22

申请号：JP2005353343

申请日：2005-12-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  LAMBERTUS DONDERS SJOERD NICOL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MERTENS JEROEN JOHANNES SOPHIA ,  HUBERTUS MULKENS JOHANNES C ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To take countermeasures against the influence of a liquid in an immersion lithographic apparatus. SOLUTION: The lithographic apparatus includes a supporting structure MT for supporting a pattern providing device MA. The pattern providing device provides a pattern to a radiation beam PB in accordance with a desired pattern. The lithographic apparatus further includes a substrate table WT for supporting a substrate; a projection system PL for projecting a pattern-provided beam to a target portion of the substrate W; a measurement system for measuring a parameter of (a) the substrate table, (b) the substrate, (c) an image projected by the projection system and (d) a combination of any of (a)-(c); and a liquid supplying system for supplying a liquid to a space between the substrate and the projection system. The lithographic apparatus is also includes a shield arranged near one part of the measurement system, and shielding the part of the measurement system from the liquid. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：针对浸没式光刻设备中液体的影响采取对策。 解决方案：光刻设备包括用于支撑图案提供装置MA的支撑结构MT。 图案提供装置根据期望的图案向辐射束PB提供图案。 光刻设备还包括用于支撑衬底的衬底台WT; 用于将图案提供的光束投影到基板W的目标部分的投影系统PL; 用于测量（a）衬底台的参数的测量系统，（b）衬底，（c）由投影系统投影的图像和（d）（a） - （c）中任一个的组合; 以及用于将液体供应到基板和投影系统之间的空间的液体供应系统。 光刻设备还包括设置在测量系统的一部分附近的屏蔽，并且将测量系统的一部分与液体隔离。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006165572A

公开(公告)日：2006-06-22

申请号：JP2005353110

申请日：2005-12-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MARIA HENNUS PIETER R ,  MERTENS JEROEN JOHANNES SOPHIA ,  CORNELUS HENDRIK SMULDERS PATR ,  SMITS PETER

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment which can efficiently seal a liquid between different regions of a substrate table.
SOLUTION: The substrate table is provided with a cover plate 100 which is arranged above a main body MB of the substrate table. The cover plate 100 which has is a flat and continuous upper surface can be applied to a local region type liquid feed system. The upper surface of the cover plate 100 is approximately the same plane as the upper surface of a substrate W. A sealing projection 200 may be formed to reduce or prevent liquid to enter a recess between a substrate support SS and the main body MB of the substrate table. The sealing projection 200 connects the interior edge of the cover plate 100 and the upper surface of the substrate support SS.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供能够有效地密封衬底台的不同区域之间的液体的光刻设备。 解决方案：衬底台设置有盖板100，盖板100布置在衬底台的主体MB的上方。 具有平坦且连续的上表面的盖板100可以施加到局部区域型的液体供给系统。 盖板100的上表面与基板W的上表面大致相同。可以形成密封突起200以减少或防止液体进入基板支撑件SS和主体MB之间的凹部 底物台。 密封突起200连接盖板100的内部边缘和基板支撑件SS的上表面。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006165570A

公开(公告)日：2006-06-22

申请号：JP2005352933

申请日：2005-12-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  LAMBERTUS DONDERS SJOERD NICOL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  HUBERTUS MULKENS JOHANNES C ,  STREEFKERK BOB

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide prewetting of a substrate before immersion exposure.
SOLUTION: A lithographic projection apparatus includes a supporting structure configured so as to hold a pattern forming device. This pattern forming device is configured so as to form a pattern on a radiation beam in accordance with a desired pattern. This lithographic apparatus further includes a substrate table configured so as to hold a substrate. This substrate has a surface coated at least partially with a radiation sensitive material. This lithographic apparatus further includes a projection system configured so as to project a pattern-formed beam on a target portion of the substrate, and a liquid supplying system. This liquid supplying system is configured so as to supply a prewetting liquid onto the layer of the radiation sensitive material to previously wet the substrate, and configured so as to supply an immersion liquid to a space between the previously wet substrate and at least one part of the projection system.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：在浸渍曝光之前提供衬底的预润湿。 解决方案：光刻投影装置包括构造成保持图案形成装置的支撑结构。 该图案形成装置被配置为根据期望的图案在辐射束上形成图案。 该光刻设备还包括被配置为保持衬底的衬底台。 该基底具有至少部分地用辐射敏感材料涂覆的表面。 该光刻设备还包括投影系统，该投影系统被配置为将图案形成的光束投影到基板的目标部分上，以及液体供应系统。 该液体供应系统被配置为将预润湿液体提供到辐射敏感材料层上，以预先润湿基底，并且构造成将浸入液体供应到先前湿底物与至少一部分 投影系统。 版权所有（C）2006，JPO＆NCIPI