公开(公告)号：US10976265B2

公开(公告)日：2021-04-13

申请号：US16039764

申请日：2018-07-19

Applicant: ASML Netherlands B.V.

Inventor： Sander Bas Roobol ,  Richard Quintanilha

IPC: G01N21/956 ,  G01N21/47 ,  G03F7/20 ,  G03F9/00 ,  G01N23/2055

Abstract: A detector for detecting diffracted radiation which has been diffracted by a regular structure; said detector comprises: a sensor for sensing at least a portion of said diffracted radiation, said sensor having a first region and a second region; a first coating configured to allow transmission of radiation with wavelengths within a first range of wavelengths; and a second coating configured to allow transmission of radiation with wavelengths within a second range of wavelengths; wherein said first coating coats said first region of said sensor, and said second coating coats said second region of said sensor, and wherein said first and second regions are different regions.

公开(公告)号：US10670974B2

公开(公告)日：2020-06-02

申请号：US16233707

申请日：2018-12-27

Applicant: ASML Netherlands B.V.

Inventor： Gerrit Jacobus Hendrik Brussaard ,  Petrus Wilhelmus Smorenburg ,  Teis Johan Coenen ,  Niels Geypen ,  Peter Danny Van Voorst ,  Sander Bas Roobol

IPC: G03F7/20

Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.

公开(公告)号：US20190155171A1

公开(公告)日：2019-05-23

申请号：US16254896

申请日：2019-01-23

Applicant: ASML Netherlands B.V.

Inventor： Nan LIN ,  Arie Jeffrey Den Boeff ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Niels Geypen

IPC: G03F7/20 ,  G01N21/95 ,  G02F1/355 ,  H01S3/16 ,  G01B11/24 ,  H01S3/00 ,  H01S3/13 ,  G02F1/37

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8845 ,  G02F1/3551 ,  G02F1/37 ,  G03F7/70625 ,  G03F7/70633 ,  H01S3/0092 ,  H01S3/1305 ,  H01S3/1625 ,  H01S3/1636

Abstract: Disclosed is a method of performing a measurement in an inspection apparatus; and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.

公开(公告)号：US10234771B2

公开(公告)日：2019-03-19

申请号：US15487558

申请日：2017-04-14

Applicant: ASML Netherlands B.V.

Inventor： Nan Lin ,  Arie Jeffrey Den Boef ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Niels Geypen

IPC: G03F7/20 ,  G01B11/24 ,  G02F1/355 ,  G02F1/37 ,  H01S3/00 ,  H01S3/13 ,  H01S3/16 ,  G01N21/95

Abstract: Disclosed is a method of performing a measurement in an inspection apparatus, and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.

公开(公告)号：US20190003981A1

公开(公告)日：2019-01-03

申请号：US16102178

申请日：2018-08-13

Applicant: ASML Netherlands B.V.

Inventor： Peter Danny Van Voorst ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Sietse Thijmen Van Der Post

IPC: G01N21/88 ,  G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  H05G2/00

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2021/95676 ,  G03F7/70616 ,  G03F7/7065 ,  H05G2/00 ,  H05G2/008

Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

公开(公告)号：US10133192B2

公开(公告)日：2018-11-20

申请号：US15494056

申请日：2017-04-21

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Simon Gijsbert Josephus Mathijssen ,  Sander Bas Roobol ,  Nan Lin

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/47 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66

Abstract: A structure of interest (T) is irradiated with radiation for example in the x-ray or EUV waveband, and scattered radiation is detected by a detector (19, 274, 908, 1012). A processor (PU) calculates a property such as linewidth (CD) or overlay (OV), for example by simulating (S16) interaction of radiation with a structure and comparing (S17) the simulated interaction with the detected radiation. The method is modified (S14a, S15a, S19a) to take account of changes in the structure which are caused by the inspection radiation. These changes may be for example shrinkage of the material, or changes in its optical characteristics. The changes may be caused by inspection radiation in the current observation or in a previous observation.

公开(公告)号：US10048596B2

公开(公告)日：2018-08-14

申请号：US15585072

申请日：2017-05-02

Applicant: ASML Netherlands B.V.

Inventor： Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F7/20 ,  G02F1/35 ,  G21K5/04 ,  H05G2/00

Abstract: An method for generating illuminating radiation in an illumination apparatus for use in an inspection apparatus for use in lithographic processes is described. A driving radiation beam is provided that comprises a plurality of radiation pulses. The beam is split into first and second pluralities of driving radiation pulses. Each plurality of driving radiation pulses has a controllable characteristic. The first and second pluralities may be used to generate an illuminating radiation beam with an output wavelength spectrum. The first and second controllable characteristics are controlled so as to control first and second portions respectively of the output wavelength spectrum of the illuminating radiation beam.

公开(公告)号：US20180224753A1

公开(公告)日：2018-08-09

申请号：US15875156

申请日：2018-01-19

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus MATHIJSSEN ,  Sander Bas Roobol ,  Nan Lin ,  Willem Marie Julia Marcel Coene ,  ArIe Jeffrey Den Boef

IPC: G03F7/20 ,  G01B11/27

CPC classification number: G03F7/70633 ,  G01B11/272 ,  G01N21/4788 ,  G01N21/956 ,  G03F7/70525 ,  G03F7/70625 ,  G03F7/7085 ,  G03F9/7069 ,  G03F9/7088

Abstract: Target structures such as overlay gratings (Ta and Tb) are formed on a substrate (W) by a lithographic process. The first target is illuminated with a spot of first radiation (456a, Sa) and simultaneously the second target is illuminated with a spot of second radiation (456b, Sb). A sensor (418) detects at different locations, portions (460x−, 460x+) of said first radiation that have been diffracted in a first direction by features of the first target and portions (460y−, 460y+) of said second radiation that have been diffracted in a second direction by features of the second target. Asymmetry in X and Y directions can be detected simultaneously, reducing the time required for overlay measurements in X and Y. The two spots of radiation at soft x-ray wavelength can be generated simply by exciting two locations (710a, 710b) in a higher harmonic generation (HHG) radiation source or inverse Compton scattering source.

公开(公告)号：US20180073992A1

公开(公告)日：2018-03-15

申请号：US15683216

申请日：2017-08-22

Applicant: ASML Netherlands B.V.

Inventor： Peter Danny VAN VOORST ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Sietse Thijmen Van Der Post

IPC: G01N21/88 ,  G03F7/20

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2021/95676 ,  G03F7/70616 ,  G03F7/7065 ,  H05G2/00 ,  H05G2/008

Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

公开(公告)号：US20170322497A1

公开(公告)日：2017-11-09

申请号：US15585072

申请日：2017-05-02

Applicant: ASML Netherlands B.V.

Inventor： Nan LIN ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F7/20 ,  G21K5/04

CPC classification number: G03F7/70575 ,  G02F1/353 ,  G02F2001/354 ,  G02F2201/16 ,  G03F7/2004 ,  G03F7/70033 ,  G03F7/70625 ,  G03F7/70633 ,  G03F2007/2067 ,  G21K5/04 ,  H05G2/00

Abstract: An method for generating illuminating radiation in an illumination apparatus for use in an inspection apparatus for use in lithographic processes is described. A driving radiation beam is provided that comprises a plurality of radiation pulses. The beam is split into first and second pluralities of driving radiation pulses. Each plurality of driving radiation pulses has a controllable characteristic. The first and second pluralities may be used to generate an illuminating radiation beam with an output wavelength spectrum. The first and second controllable characteristics are controlled so as to control first and second portions respectively of the output wavelength spectrum of the illuminating radiation beam.