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1.发明授权公开(公告)号：US10267744B2
公开(公告)日：2019-04-23
申请号：US15641579
申请日：2017-07-05
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus Tinnemans , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen
IPC: G02F1/35 , G01N21/47 , G01N21/88 , G01N21/956 , G03F7/20
Abstract: Disclosed is an illumination source for generating measurement radiation for an inspection apparatus. The source generates at least first measurement radiation and second measurement radiation such that the first measurement radiation and the second measurement radiation interfere to form combined measurement radiation modulated with a beat component. The illumination source may be a HHG source. Also disclosed is an inspection apparatus comprising such a source and an associated inspection method.
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公开(公告)号：US10234771B2
公开(公告)日：2019-03-19
申请号：US15487558
申请日：2017-04-14
Applicant: ASML Netherlands B.V.
Inventor： Nan Lin , Arie Jeffrey Den Boef , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Niels Geypen
Abstract: Disclosed is a method of performing a measurement in an inspection apparatus, and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.
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3.发明申请公开(公告)号：US20190003981A1
公开(公告)日：2019-01-03
申请号：US16102178
申请日：2018-08-13
Applicant: ASML Netherlands B.V.
Inventor： Peter Danny Van Voorst , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Sietse Thijmen Van Der Post
IPC: G01N21/88 , G03F7/20 , G01N21/95 , G01N21/956 , H05G2/00
CPC classification number: G01N21/8806 , G01N21/9501 , G01N2021/95676 , G03F7/70616 , G03F7/7065 , H05G2/00 , H05G2/008
Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.
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4.发明授权公开(公告)号：US10133192B2
公开(公告)日：2018-11-20
申请号：US15494056
申请日：2017-04-21
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus Tinnemans , Simon Gijsbert Josephus Mathijssen , Sander Bas Roobol , Nan Lin
Abstract: A structure of interest (T) is irradiated with radiation for example in the x-ray or EUV waveband, and scattered radiation is detected by a detector (19, 274, 908, 1012). A processor (PU) calculates a property such as linewidth (CD) or overlay (OV), for example by simulating (S16) interaction of radiation with a structure and comparing (S17) the simulated interaction with the detected radiation. The method is modified (S14a, S15a, S19a) to take account of changes in the structure which are caused by the inspection radiation. These changes may be for example shrinkage of the material, or changes in its optical characteristics. The changes may be caused by inspection radiation in the current observation or in a previous observation.
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公开(公告)号：US10048596B2
公开(公告)日：2018-08-14
申请号：US15585072
申请日：2017-05-02
Applicant: ASML Netherlands B.V.
Inventor： Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen
Abstract: An method for generating illuminating radiation in an illumination apparatus for use in an inspection apparatus for use in lithographic processes is described. A driving radiation beam is provided that comprises a plurality of radiation pulses. The beam is split into first and second pluralities of driving radiation pulses. Each plurality of driving radiation pulses has a controllable characteristic. The first and second pluralities may be used to generate an illuminating radiation beam with an output wavelength spectrum. The first and second controllable characteristics are controlled so as to control first and second portions respectively of the output wavelength spectrum of the illuminating radiation beam.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20180224753A1
公开(公告)日：2018-08-09
申请号：US15875156
申请日：2018-01-19
Applicant: ASML Netherlands B.V.
Inventor： Simon Gijsbert Josephus MATHIJSSEN , Sander Bas Roobol , Nan Lin , Willem Marie Julia Marcel Coene , ArIe Jeffrey Den Boef
CPC classification number: G03F7/70633 , G01B11/272 , G01N21/4788 , G01N21/956 , G03F7/70525 , G03F7/70625 , G03F7/7085 , G03F9/7069 , G03F9/7088
Abstract: Target structures such as overlay gratings (Ta and Tb) are formed on a substrate (W) by a lithographic process. The first target is illuminated with a spot of first radiation (456a, Sa) and simultaneously the second target is illuminated with a spot of second radiation (456b, Sb). A sensor (418) detects at different locations, portions (460x−, 460x+) of said first radiation that have been diffracted in a first direction by features of the first target and portions (460y−, 460y+) of said second radiation that have been diffracted in a second direction by features of the second target. Asymmetry in X and Y directions can be detected simultaneously, reducing the time required for overlay measurements in X and Y. The two spots of radiation at soft x-ray wavelength can be generated simply by exciting two locations (710a, 710b) in a higher harmonic generation (HHG) radiation source or inverse Compton scattering source.
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7.发明申请公开(公告)号：US20180073992A1
公开(公告)日：2018-03-15
申请号：US15683216
申请日：2017-08-22
Applicant: ASML Netherlands B.V.
Inventor： Peter Danny VAN VOORST , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Sietse Thijmen Van Der Post
CPC classification number: G01N21/8806 , G01N21/9501 , G01N2021/95676 , G03F7/70616 , G03F7/7065 , H05G2/00 , H05G2/008
Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.
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公开(公告)号：US10379448B2
公开(公告)日：2019-08-13
申请号：US15875156
申请日：2018-01-19
Applicant: ASML Netherlands B.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Sander Bas Roobol , Nan Lin , Willem Marie Julia Marcel Coene , Arie Jeffrey Den Boef
Abstract: Target structures such as overlay gratings (Ta and Tb) are formed on a substrate (W) by a lithographic process. The first target is illuminated with a spot of first radiation (456a, Sa) and simultaneously the second target is illuminated with a spot of second radiation (456b, Sb). A sensor (418) detects at different locations, portions (460x−, 460x+) of said first radiation that have been diffracted in a first direction by features of the first target and portions (460y−, 460y+) of said second radiation that have been diffracted in a second direction by features of the second target. Asymmetry in X and Y directions can be detected simultaneously, reducing the time required for overlay measurements in X and Y. The two spots of radiation at soft x-ray wavelength can be generated simply by exciting two locations (710a, 710b) in a higher harmonic generation (HHG) radiation source or inverse Compton scattering source.
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公开(公告)号：US12044951B2
公开(公告)日：2024-07-23
申请号：US17769725
申请日：2020-10-07
Applicant: ASML Netherlands B.V.
Inventor： Wenjie Jin , Nan Lin , Christina Lynn Porter , Petrus Wilhelmus Smorenburg
CPC classification number: G02F1/354 , G02F1/355 , G03F7/70033 , G03F7/706847
Abstract: Disclosed is an illumination source comprising a gas delivery system comprising a gas nozzle. The gas nozzle comprises an opening in an exit plane of the gas nozzle. The gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region. The illumination source is configured to receive a pump radiation having a propagation direction and to provide the pump radiation in the gas flow. A geometry shape of the gas nozzle is adapted to shape a profile of the gas flow such that gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.
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10.发明授权公开(公告)号：US10530111B2
公开(公告)日：2020-01-07
申请号：US15903392
申请日：2018-02-23
Applicant: ASML Netherlands B.V.
Inventor： Sudhir Srivastava , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Nan Lin , Sjoerd Nicolaas Lambertus Donders , Krijn Frederik Bustraan , Petrus Wilhelmus Smorenburg , Gerrit Jacobus Hendrik Brussaard
Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.
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