-
公开(公告)号：US20190086824A1
公开(公告)日：2019-03-21
申请号：US16085000
申请日：2017-02-14
Applicant: ASML NETHERLANDS B.V.
IPC: G03F9/00
Abstract: A method of determining positions of marks, the marks comprising periodic structures, at least some of the structures comprising periodic sub-structures, the sub-structures having a smaller period than the structures, the marks formed with positional offsets between the sub-structures and structures, the positional offsets caused by a combination of both known and unknown components, the method comprising illuminating a plurality of the marks with radiation having different characteristics, detecting radiation diffracted by the marks using one or more detectors which produce output signals, discriminating between constituent parts of the signals, the discriminating based on a variation of the signals as a function of spatial positions of the marks on a substrate, selecting at least one of the constituent parts of the signals, and using the at least one selected constituent part, and information relating to differences between the known components, to calculate a corrected position of at least one mark.
-
22.发明申请公开(公告)号：US20180136568A1
公开(公告)日：2018-05-17
申请号：US15788258
申请日：2017-10-19
Applicant: ASML Netherlands B.V.
Inventor： Sander Bas ROOBOL , Simon Gijsbert Josephus MATHIJSSEN
Abstract: Disclosed is an illumination source apparatus comprising a high harmonic generation medium, a pump radiation source and a spatial filter. The pump radiation source emits a beam of pump radiation having a profile comprising no pump radiation in a central region of the beam and excites the high harmonic generation medium so as to generate high harmonic radiation. The pump radiation and the generated high harmonic radiation are spatially separated beyond the focal plane of the beam of pump radiation The spatial filter is located beyond a focal plane of the beam of pump radiation, and blocks the pump radiation. Also disclosed is a method of generating high harmonic measurement radiation optimized for filtration of pump radiation therefrom.
-
23.发明申请公开(公告)号：US20170160075A1
公开(公告)日：2017-06-08
申请号：US15439833
申请日：2017-02-22
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
CPC classification number: G01B11/14 , F25D3/06 , F25D11/003 , F25D23/006 , G01B9/0207 , G03F7/70108 , G03F9/7069 , G03F9/7084 , G03F9/7088
Abstract: An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). An illumination arrangement (940, 962, 964) provides off-axis radiation from at least first and second regions. The first and second source regions are diametrically opposite one another with respect to an optical axis (O) and are limited in angular extent. The regions may be small spots selected according to a direction of periodicity of a mark being measured, or larger segments. Radiation at a selected pair of source regions can be generated by supplying radiation at a single source feed position to a self-referencing interferometer. A modified half wave plate is positioned downstream of the interferometer, which can be used in the position measuring apparatus. The modified half wave plate has its fast axis in one part arranged at 45° to the fast axis in another part diametrically opposite.
-
公开(公告)号：US20160077445A1
公开(公告)日：2016-03-17
申请号：US14787451
申请日：2014-04-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Arie Jeffrey DEN BOEF , Simon Gijsbert Josephus MATHIJSSEN , Patricius Aloysius Jacobus TINNEMANS
CPC classification number: G03F7/70141 , G01B11/272 , G03F9/7069 , G03F9/7088 , G03F9/7092
Abstract: An alignment sensor including an illumination source, such as a white light source, having an illumination grating operable to diffract higher order radiation at an angle dependent on wavelength; and illumination optics to deliver the diffracted radiation onto an alignment grating from at least two opposite directions. For every component wavelength incident on the alignment grating, and for each direction, the zeroth diffraction order of radiation incident from one of the two opposite directions overlaps a higher diffraction order of radiation incident from the other direction. This optically amplifies the higher diffraction orders with the overlapping zeroth orders.
Abstract translation: 一种对准传感器，包括诸如白光源的照明源，具有可操作以以取决于波长的角度衍射高阶辐射的照明光栅; 和照明光学器件，以将衍射辐射从至少两个相反的方向传送到对准光栅上。 对于入射在对准光栅上的每个分量波长，并且对于每个方向，从两个相反方向之一入射的辐射的零级衍射级与从另一方向入射的较高的辐射衍射级重叠。 这种光学放大了具有重叠零级的较高的衍射级。
-
公开(公告)号：US20250147429A1
公开(公告)日：2025-05-08
申请号：US18693337
申请日：2022-09-23
Applicant: ASML NETHERLANDS B.V.
Abstract: A method for determining a measurement setting for measuring a parameter of interest from a target structure on a substrate. The method includes: obtaining first position difference data describing a difference between a position of a first representative target structure position and a position of one or more first features relating to product structure; obtaining optical metrology data relating to optical measurements of the target structure and further relating to a plurality of different measurement settings; and determining the measurement setting from the first position difference data and the optical metrology data such that a measured feature position value obtained from an optical measurement of the target structure using the determined measurement setting is better correlated to a position of the one or more first features.
-
Patent Agency Ranking
公开(公告)号：US20250004385A1
公开(公告)日：2025-01-02
申请号：US18684048
申请日：2022-09-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Marc Johannes NOOT , Simon Gijsbert Josephus MATHIJSSEN , Scott Anderson MIDDLEBROOKS , Kaustuve BHATTACHARYYA
Abstract: A method to determine a metrology contribution from statistically independent sources, the method including providing a plurality of contributions from statistically independent sources obtained at a plurality of measurement settings, and determining a metrology contribution from the contributions wherein the metrology contribution is the contribution having least dependence as a function of the measurement settings.
-
27.发明申请公开(公告)号：US20200348605A1
公开(公告)日：2020-11-05
申请号：US16931002
申请日：2020-07-16
Applicant: ASML Netherlands B.V.
Inventor： Simon Gijsbert Josephus MATHIJSSEN , Stefan HUNSCHE , Markus Gerardus Martinus Maria VAN KRAAIJ
Abstract: Disclosed is an inspection apparatus for use in lithography. It comprises a support for a substrate carrying a plurality of metrology targets; an optical system for illuminating the targets under predetermined illumination conditions and for detecting predetermined portions of radiation diffracted by the targets under the illumination conditions; a processor arranged to calculate from said detected portions of diffracted radiation a measurement of asymmetry for a specific target; and a controller for causing the optical system and processor to measure asymmetry in at least two of said targets which have different known components of positional offset between structures and smaller sub-structures within a layer on the substrate and calculate from the results of said asymmetry measurements a measurement of a performance parameter of the lithographic process for structures of said smaller size. Also disclosed are substrates provided with a plurality of novel metrology targets formed by a lithographic process.
-
公开(公告)号：US20180329316A1
公开(公告)日：2018-11-15
申请号：US15756057
申请日：2016-08-23
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Alessandro POLO , Simon Gijsbert Josephus MATHIJSSEN , Patricius Aloysius Jacobus TINNEMANS , Scott Douglas COSTON , Ronan James HAVELIN
Abstract: A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target having a periodic structure. The alignment sensor includes a demultiplexer to demultiplex a number of intensity channels. The demultiplexer includes a number of stages arranged in series and a number of demultiplexing components, each demultiplexing component operable to divide an input radiation beam into two radiation beam portions. The first stage has a first demultiplexing component that is arranged to receive as an input radiation beam an incident radiation beam. Each successive stage is arranged such that it has twice the number of demultiplexing components as a preceding stage, each demultiplexing component of each stage after the first stage receiving as an input one of the radiation beam portions output from a demultiplexing component of the preceding stage.
-
公开(公告)号：US20180329307A1
公开(公告)日：2018-11-15
申请号：US15777162
申请日：2016-11-29
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Ralph BRINKHOF , Simon Gijsbert Josephus MATHIJSSEN , Maikel Robert GOOSEN , Vassili DEMERGIS , Bartolokeus Petrus RIJPERS
CPC classification number: G03F7/70141 , G03F9/7046 , G03F9/7076 , G03F9/7088 , G03F9/7092
Abstract: A method of measuring a position of an alignment target on a substrate using an optical system. The method includes measuring a sub-segmented target by illuminating the sub-segmented target with radiation and detecting radiation diffracted by the sub-segmented target using a detector system to obtain signals containing positional information of the one sub-segmented target. The sub-segmented target has structures arranged periodically in at least a first direction, at least some of the structures including smaller sub-structures, and each sub-segmented target is formed with a positional offset between the structures and the sub-structures that is a combination of both known and unknown components. The signals, together with information on differences between known offsets of the sub-segmented target are used to calculate a measured position of an alignment target which is corrected for the unknown component of the positional offset.
-
30.发明申请公开(公告)号：US20180267411A1
公开(公告)日：2018-09-20
申请号：US15903392
申请日：2018-02-23
Applicant: ASML Netherlands B.V.
Inventor： Sudhir SRIVASTAVA , Sander Bas ROOBOL , Simon Gijsbert Josephus MATHIJSSEN , Nan LIN , Sjoerd Nicolaas Lambertus DONDERS , Krijn Frederik BUSTRAAN , Petrus Wilhelmus SMORENBURG , Gerrit Jacobus Hendrik BRUSSAARD
IPC: G03F7/20
Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.
-
-
-
-
-
-
-
-
-
Search Results
43
records
(took 0.028 seconds)
