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    Wetting layers for optical device enhancement
    22.
    发明授权
    Wetting layers for optical device enhancement 有权

    公开(公告)号：US11565489B2

    公开(公告)日：2023-01-31

    申请号：US16253661

    申请日：2019-01-22

    Applicant: Applied Materials, Inc.

    Inventor： Karl J. Armstrong ,  Jinxin Fu ,  Wilson Banez

    IPC: B29D11/00

    Abstract: Embodiments described herein relate to methods and materials for optical device fabrication. In one embodiment, a method of fabricating an optical device is provided. The method includes depositing a dielectric film on a substrate, depositing a wetting layer on the dielectric film, and depositing a metal containing film on the wetting layer. In another embodiment, an optical device is provided. The device includes a substrate, a dielectric film deposited on and contacting the substrate, a wetting layer deposited on and contacting the dielectric film, and a metal containing film deposited on and contacting the wetting layer.

    PVD titanium dioxide formation using sputter etch to halt onset of crystalinity in thick films
    24.
    发明授权
    PVD titanium dioxide formation using sputter etch to halt onset of crystalinity in thick films 有权

    公开(公告)号：US11008647B2

    公开(公告)日：2021-05-18

    申请号：US16258766

    申请日：2019-01-28

    Applicant: Applied Materials, Inc.

    Inventor： Karl Armstrong ,  Jinxin Fu

    IPC: C23C14/08 ,  C23C14/34 ,  C23C14/58 ,  C23C14/00

    Abstract: Embodiments described herein provide methods of forming amorphous or nano-crystalline ceramic films. The methods include depositing a ceramic layer on a substrate using a physical vapor deposition (PVD) process, discontinuing the PVD process when the ceramic layer has a predetermined layer thickness, sputter etching the ceramic layer for a predetermined period of time, and repeating the depositing the ceramic layer using the PVD process, the discontinuing the PVD process, and the sputter etching the ceramic layer until a ceramic film with a predetermined film thickness is formed.

    Measurement system and grating pattern array
    25.
    发明授权
    Measurement system and grating pattern array 有权

    公开(公告)号：US10921721B1

    公开(公告)日：2021-02-16

    申请号：US16596237

    申请日：2019-10-08

    Applicant: Applied Materials, Inc.

    Inventor： Jinxin Fu ,  Yifei Wang ,  Yongan Xu ,  Ludovic Godet

    IPC: G03F7/20 ,  G03F9/00 ,  G01D5/38 ,  G02B5/18

    Abstract: Embodiments of the present disclosure include measurement systems and grating pattern arrays. The measurement systems include multiple subsystems for creating diffraction patterns or magnified real images of grating regions on a substrate. The measurements systems are configured to reflect and transmit light, and the reflected and transmitted beams create diffraction patterns and enlarged images. The diffraction patterns and images provide information on grating pitch and angles of grating regions. Grating pattern arrays disposed on a substrate include main regions and reference regions. The reference regions are used to locate corresponding main regions. The measurement systems do not include a rotating stage, and thus precise control of rotation of a stage is not needed.

    Interference in-sensitive Littrow system for optical device structure measurement
    27.
    发明授权
    Interference in-sensitive Littrow system for optical device structure measurement 有权

    公开(公告)号：US12203747B2

    公开(公告)日：2025-01-21

    申请号：US18408193

    申请日：2024-01-09

    Applicant: Applied Materials, Inc.

    Inventor： Yangyang Sun ,  Jinxin Fu ,  Ludovic Godet

    IPC: G01B11/26

    Abstract: Embodiments described herein provide for devices and methods of measuring a pitch P of optical device structures and an orientation angle ϕ of the optical device structures. One embodiment of the system includes an optical arm coupled to an arm actuator. The optical arm includes a light source. The light source emits a light path operable to be diffracted to the stage. The optical arm further includes a first beam splitter and a second beam splitter positioned in the light path. The first beam splitter directs the light path through a first lens and the second beam splitter directs the light path through a first dove prism and a second lens. The optical arm further includes a first detector operable to detect the light path from the first lens and second detector operable to detect the light path from the second lens.

    Lithography method to form structures with slanted angle
    28.
    发明授权
    Lithography method to form structures with slanted angle 有权

    公开(公告)号：US12153344B2

    公开(公告)日：2024-11-26

    申请号：US18241705

    申请日：2023-09-01

    Applicant: Applied Materials, Inc.

    Inventor： Yongan Xu ,  Jinxin Fu ,  Jhenghan Yang ,  Ludovic Godet

    IPC: G03F7/00 ,  G02B6/122 ,  G02B6/136 ,  H01L21/3065

    Abstract: The present disclosure generally relates to methods of forming optical devices comprising nanostructures disposed on transparent substrates. A first process of forming the nanostructures comprises depositing a first layer of a first material on a glass substrate, forming one or more trenches in the first layer, and depositing a second layer of a second material in the one or more holes to trenches a first alternating layer of alternating first portions of the first material and second portions of the second material. The first process is repeated one or more times to form additional alternating layers over the first alternating layer. Each first portion of each alternating layer is disposed in contact with and offset a distance from an adjacent first portion in adjacent alternating layers. A second process comprises removing either the first or the second portions from each alternating layer to form the plurality of nanostructures.

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